Educaiton and Control of Nano-topography Mechanism in Ultrafine Fabrication
Project/Area Number |
21760584
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Single-year Grants |
Research Field |
Material processing/treatments
|
Research Institution | Osaka University |
Principal Investigator |
|
Project Period (FY) |
2009 – 2011
|
Project Status |
Completed (Fiscal Year 2011)
|
Budget Amount *help |
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2010: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2009: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
|
Keywords | 材料・加工処理 / リソグラフィ / 量子ビーム / ナノ材料 / 半導体超微細化 |
Research Abstract |
Polymer structure effects on the dissolution kinetics and deprotection reaction were investigated to understand inherent extreme ultraviolet(EUV) resist characteristics. Also, the evaluation of resist profile for EUV chemically amplified resists was performed by using PROLITH and parameters obtained with EUV exposure tool. We could obtain EUV resist design for next generation lithography.
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Report
(4 results)
Research Products
(16 results)