• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Innovation in atomically controlled engineering of plasma etching technology with builiding a collaborative environment for theory, computation, and measurement

Research Project

Project/Area Number 21H01073
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Review Section Basic Section 14030:Applied plasma science-related
Research InstitutionNagoya University

Principal Investigator

Sekine Makoto  名古屋大学, 低温プラズマ科学研究センター, 特任教授 (80437087)

Co-Investigator(Kenkyū-buntansha) 堤 隆嘉  名古屋大学, 低温プラズマ科学研究センター, 講師 (50756137)
石川 健治  名古屋大学, 低温プラズマ科学研究センター, 教授 (60417384)
Project Period (FY) 2021-04-01 – 2024-03-31
Project Status Completed (Fiscal Year 2023)
Budget Amount *help
¥18,200,000 (Direct Cost: ¥14,000,000、Indirect Cost: ¥4,200,000)
Fiscal Year 2023: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2022: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2021: ¥14,820,000 (Direct Cost: ¥11,400,000、Indirect Cost: ¥3,420,000)
Keywordsプラズマエッチング / ハイドロフロオロカーボン / シリコン酸化膜 / コインシデンス分光 / プラズマ / エッチング / 電子衝突反応 / 電子衝突解離
Outline of Research at the Start

次代電子情報ナノシステムの作製において,微細加工・プラズマエッチングの1原子1分子レベルの反応プロセス制御『アトミックスケールエンジニアリング』が要求される.プラズマエッチングの反応過程をⅠ)気相中反応,Ⅱ)活性種輸送,Ⅲ)表面反応の3段階に階層化し,理論-計算-実験を統合した研究基盤を構築するアプローチを探索しながら,プラズマと表面の相互作用の『アトミックスケールエンジニアリング』を学問体系化し,次代イノベーション電子情報デバイスの創出に貢献する基盤技術を開拓する.

Outline of Final Research Achievements

In this study, we aim to establish a hierarchical analysis scheme by dividing the reaction process into three stages: (1) reaction in the gas phase, (2) active species transport, and (3) surface reaction. For each of these reactions, we have developed a theory in principle. We have conducted simulation prediction using computational science, and demonstrated verification experiments by subdividing the reaction into elementary processes. Also we have performed etching processes that can handle mass production. We have conducted a kinetic analysis of the progress of the interaction between the plasma and the surface, in order to build a research foundation integrating theory, computation, and experiment. We have systematized "atomic scale engineering" of plasma-surface interactions and pioneered fundamental technologies that will contribute to the creation of the next generation of innovative electronic information devices.

Academic Significance and Societal Importance of the Research Achievements

人類及び地球の繁栄のための持続的な開発を推進する上で,電子情報ナノシステムの発展は欠かせない.システムを構成する集積回路・センサ・アクチュエータなどの素子の作製は,微細加工・プラズマエッチングが基盤技術となり,現在1原子1分子レベルの反応プロセス制御『アトミックスケールエンジニアリング』が要求されるにもかかわらず,プラズマエッチング技術の開発には,試行錯誤が繰り返され,理論に基づく予測や原理に則した革新的な技術が創出されているとは言い難い.このような背景から,エッチング反応の原理的な解明が必要である.

Report

(4 results)
  • 2023 Annual Research Report   Final Research Report ( PDF )
  • 2022 Annual Research Report
  • 2021 Annual Research Report
  • Research Products

    (115 results)

All 2024 2023 2022 2021 Other

All Journal Article (27 results) (of which Int'l Joint Research: 4 results,  Peer Reviewed: 27 results,  Open Access: 6 results) Presentation (84 results) (of which Int'l Joint Research: 72 results,  Invited: 15 results) Remarks (4 results)

  • [Journal Article] <i>In situ</i> atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching2024

    • Author(s)
      Tsutsumi Takayoshi、Asano Atsuki、Kondo Hiroki、Ishikawa Kenji、Sekine Makoto、Hori Masaru
    • Journal Title

      Journal of Vacuum Science &amp; Technology A

      Volume: 42 Issue: 3 Pages: 032603-032603

    • DOI

      10.1116/6.0003432

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Dissociative properties of C<sub>4</sub>F<sub>6</sub> obtained using computational chemistry2024

    • Author(s)
      Hayashi Toshio、Ishikawa Kenji、Sekine Makoto、Hori Masaru
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 63 Issue: 4 Pages: 04SP26-04SP26

    • DOI

      10.35848/1347-4065/ad3166

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Low-temperature growth at 225°C and characterization of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition2024

    • Author(s)
      Minh Ngo Quang、Van Nong Ngo、Oda Osamu、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Vacuum

      Volume: 224 Pages: 113180-113180

    • DOI

      10.1016/j.vacuum.2024.113180

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Nitrogen admixture effects on growth characteristics and properties of carbon nanowalls2024

    • Author(s)
      Christy Peter Raj Dennis、Van Nong Ngo、Britun Nikolay、Minh Ngo Quang、Nguyen Thi-Thuy-Nga、Kondo Hiroki、Oda Osamu、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Thin Solid Films

      Volume: 795 Pages: 140322-140322

    • DOI

      10.1016/j.tsf.2024.140322

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Plasma-Driven Sciences: Exploring Complex Interactions at Plasma Boundaries2024

    • Author(s)
      Ishikawa Kenji、Koga Kazunori、Ohno Noriyasu
    • Journal Title

      Plasma

      Volume: 7 Issue: 1 Pages: 160-177

    • DOI

      10.3390/plasma7010011

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching2024

    • Author(s)
      Ishikawa Kenji、Nguyen Thi-Thuy-Nga、Aoki Yuta、Sato Hiroyasu、Kawakami Junichi、Tsuno Shuji、Hsiao Shih-Nan、Hori Masaru
    • Journal Title

      Applied Surface Science

      Volume: 645 Pages: 158876-158876

    • DOI

      10.1016/j.apsusc.2023.158876

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF62023

    • Author(s)
      Yoshie Taito、Ishikawa Kenji、Nguyen Thi-Thuy-Nga、Hsiao Shih-Nan、Tsutsumi Takayoshi、Sekine Makoto、Hori Masaru
    • Journal Title

      Applied Surface Science

      Volume: 638 Pages: 157981-157981

    • DOI

      10.1016/j.apsusc.2023.157981

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases2023

    • Author(s)
      Hsiao Shih-Nan、Sekine Makoto、Ishikawa Kenji、Iijima Yuki、Ohya Yoshinobu、Hori Masaru
    • Journal Title

      Applied Physics Letters

      Volume: 123 Issue: 21 Pages: 1-4

    • DOI

      10.1063/5.0173553

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Gas-phase study of the behavior of trimethyl gallium and triethyl gallium by optical emission spectroscopy and quadrupole mass spectroscopy for the growth of GaN by REMOCVD (radical-enhanced metalorganic chemical vapor deposition)2023

    • Author(s)
      Dhasiyan Arun Kumar、Jayaprasad Swathy、Amalraj Frank Wilson、Shimizu Naohiro、Oda Osamu、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: SN Pages: SN1019-SN1019

    • DOI

      10.35848/1347-4065/acfd34

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Manipulation of etch selectivity of silicon nitride over silicon dioxide to a-carbon by controlling substrate temperature with a CF4/H2 plasma2023

    • Author(s)
      Hsiao Shih-Nan、Britun Nikolay、Nguyen Thi-Thuy-Nga、Tsutsumi Takayoshi、Ishikawa Kenji、Sekine Makoto、Hori Masaru
    • Journal Title

      Vacuum

      Volume: 210 Pages: 111863-111863

    • DOI

      10.1016/j.vacuum.2023.111863

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] GaN damage-free cyclic etching by sequential exposure to Cl2 plasma and Ar plasma with low Ar+ ion energy at substrate temperature of 400°C2023

    • Author(s)
      Nakamura Shohei、Tanide Atsushi、Kimura Takahiro、Nadahara Soichi、Ishikawa Kenji、Oda Osamu、Hori Masaru
    • Journal Title

      Journal of Applied Physics

      Volume: 133 Issue: 4 Pages: 043302-043302

    • DOI

      10.1063/5.0131685

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Nitrogen Atom Density Measurements in NAGDIS-T Using Vacuum Ultraviolet Absorption Spectroscopy2022

    • Author(s)
      Ryosuke Nishio, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori, Noriyasu Ohno
    • Journal Title

      Plasma and Fusion Research

      Volume: 17 Issue: 0 Pages: 1201004-1201004

    • DOI

      10.1585/pfr.17.1201004

    • NAID

      130008144833

    • ISSN
      1880-6821
    • Year and Date
      2022-01-21
    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies2022

    • Author(s)
      Kambara Makoto、Kawaguchi Satoru、Lee Hae June、Ikuse Kazumasa、Hamaguchi Satoshi、Ohmori Takeshi、Ishikawa Kenji
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: SA Pages: SA0803-SA0803

    • DOI

      10.35848/1347-4065/ac9189

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Journal Article] Dry etching of ternary metal carbide TiAlC via surface modification using floating wire-assisted vapor plasma2022

    • Author(s)
      Nguyen Thi-Thuy-Nga、Shinoda Kazunori、Hamamura Hirotaka、Maeda Kenji、Yokogawa Kenetsu、Izawa Masaru、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Scientific Reports

      Volume: 12 Issue: 1 Pages: 20394-20394

    • DOI

      10.1038/s41598-022-24949-1

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Dissociation channels of c-C4F8 to C2F4 in reactive plasma2022

    • Author(s)
      Hayashi Toshio、Ishikawa Kenji、Iwayama Hiroshi、Sekine Makoto、Hori Masaru
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Issue: 10 Pages: 106006-106006

    • DOI

      10.35848/1347-4065/ac895e

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy2022

    • Author(s)
      Takeda Keigo、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Reviews of Modern Plasma Physics

      Volume: 6 Issue: 1 Pages: 13-13

    • DOI

      10.1007/s41614-022-00075-3

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis2022

    • Author(s)
      Kurokawa Jumpei、Kondo Hiroki、Tsutsumi Takayoshi、Ishikawa Kenji、Sekine Makoto、Hori Masaru
    • Journal Title

      Vacuum

      Volume: 205 Pages: 111351-111351

    • DOI

      10.1016/j.vacuum.2022.111351

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process2022

    • Author(s)
      Sahu Bibhuti Bhusan、Nakane Kazuya、Ishikawa Kenji、Sekine Makoto、Tsutsumi Takayoshi、Gohira Taku、Ohya Yoshinobu、Ohno Noriyasu、Hori Masaru
    • Journal Title

      Physical Chemistry Chemical Physics

      Volume: 24 Issue: 22 Pages: 13883-13896

    • DOI

      10.1039/d2cp00289b

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Low‐temperature reduction of SnO 2 by floating wire‐assisted medium‐pressure H2/Ar plasma2022

    • Author(s)
      Nguyen Thi‐Thuy‐Nga、Sasaki Minoru、Hsiao Shih‐Nan、Tsutsumi Takayoshi、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Plasma Processes and Polymers

      Volume: 19 Issue: 6 Pages: 2100209-2100209

    • DOI

      10.1002/ppap.202100209

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride2022

    • Author(s)
      Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Yuko Hanaoka, Masaru Izawa, Kenji Ishikawa, Masaru Hori
    • Journal Title

      Journal of Vacuum Science &amp; Technology B

      Volume: 40 Issue: 2 Pages: 022201-022201

    • DOI

      10.1116/6.0001660

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 先端デバイス構造を実現する超絶ドライエッチング技術の最前線 はじめに2021

    • Author(s)
      竹田圭吾,石川健治
    • Journal Title

      プラズマ核融合学会誌

      Volume: 97 Pages: 508-510

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 先端デバイス構造を実現する超絶ドライエッチング技術の最前線 おわりに2021

    • Author(s)
      竹田圭吾,石川健治
    • Journal Title

      プラズマ核融合学会誌

      Volume: 97 Pages: 534-536

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス2021

    • Author(s)
      堤隆嘉,石川健治,近藤博基,関根誠,堀勝
    • Journal Title

      プラズマ核融合学会誌

      Volume: 97 Pages: 517-521

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures2021

    • Author(s)
      Shih‐Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
    • Journal Title

      Plasma Processes and Polymers

      Volume: 18 Issue: 11 Pages: 2100078-2100078

    • DOI

      10.1002/ppap.202100078

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure2021

    • Author(s)
      R H J Vervuurt, B Mukherjee, K Nakane, T Tsutsumi, M Hori, N Kobayashi
    • Journal Title

      Langmuir

      Volume: 37 Issue: 43 Pages: 12663-12672

    • DOI

      10.1021/acs.langmuir.1c02036

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] On the Etching Mechanism of Highly Hydrogenated SiN Films by CF4/D2 Plasma: Comparison with CF4/H22021

    • Author(s)
      Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
    • Journal Title

      Coatings

      Volume: 11 Issue: 12 Pages: 1535-1535

    • DOI

      10.3390/coatings11121535

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Ar/SF6 plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation and secondary electron emission2021

    • Author(s)
      Shigeyuki Takagi, Suguru Kawamura, Makoto Sekine
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Issue: SA Pages: SA1009-SA1009

    • DOI

      10.35848/1347-4065/ac1eab

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Presentation] Cryogenic Atomic Layer Etching of Silicon Nitride Alternating Surface Modification with HF Purge and Ar Plasma2024

    • Author(s)
      Shih-Nan Hsiao, Makoto Sekine, Yuki Iijima and Masaru Hori
    • Organizer
      ISPlasma2024/IC-PLANTS2024/APSPT-13, 2024/3/3-3/7, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Determination of ground state atomic concentrations during etching process2024

    • Author(s)
      Michael K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, and N. Britun
    • Organizer
      ISPlasma2024/IC-PLANTS2024/APSPT-13, 2024/3/3-3/7, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Selective Etching of SiO2 and SiN over Polycrystalline Si Using PF3/H2 Plasmas2024

    • Author(s)
      Chih-Yu Ma, Shih-Nan Hsiao, Michael K. T. Mo, Nikolay Britun, Makoto Sekine and Masaru Hori
    • Organizer
      ISPlasma2024/IC-PLANTS2024/APSPT-13, 2024/3/3-3/7, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Atomic layer etching of platinum with sequential exposure to high -density oxygen/argon plasma and formic acid vapor at low temperature2024

    • Author(s)
      Thi-Thuy-Nga Nguyen, Daijiro Akagi, Toshiyuki Uno, Takeshi Okato, Kenji Ishikawa, and Masaru Hori
    • Organizer
      ISPlasma2024/IC-PLANTS2024/APSPT-13, 2024/3/3-3/7, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring2023

    • Author(s)
      S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, and M. Hori Y Iijima, R. Suda, Y. Kihara
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Hydrofluorocarbon Molecule Dissociation through Photoeoctron-Photoion Coincidence (PEPICO) Studies2023

    • Author(s)
      Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori and Kenji Ishikawa,
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature2023

    • Author(s)
      Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura,Y. Iijima, K. Matsushima and M. Hori
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Dissociative properties of C4F6 obtained using computational chemistry2023

    • Author(s)
      T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Simultaneous measurements of F, O and H ground state atom density in an industry-grade etching plasma2023

    • Author(s)
      M. K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, and N. Britun
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching2023

    • Author(s)
      Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, and K. Ishikawa
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching2023

    • Author(s)
      K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, and K. Ishikawa
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma2023

    • Author(s)
      T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, and M. Hori
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] A mechanism for cryogenic etching of SiO2 using CF4/H2 and HF plasmas based on in-situ monitoring techniques2023

    • Author(s)
      Shih-Nan Hsiao, Yusuke Imai, Makoto Sekine, Nikolay Britun, Michael K. T. Mo, Yuki Iijima, Ryutaro Suda, Yoshinobu Ohya, Yoshihide Kihara, and Masaru Hori
    • Organizer
      36th International Microprocesses and Nanotechnology Conference (MNC 2023), 2023/11/14-17, Sapporo, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Surface reactions during atomic layer etching of platinum by high-density nitrogen-oxygen plasma and organic acid vapor2023

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      AAPPS-DPP2023, 2023/11/12-17, Nagoya, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Plasma Etching Technology Next Milestone of Assurance Energy and Environment2023

    • Author(s)
      Kenji Ishikawa
    • Organizer
      Advanced Metallization Conference 2023 32nd Asian Session (ADMETA Plus 2023)
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Surface reactions during atomic layer etching of platinum by high-density nitrogen-oxygen plasma and organic acid vapor2023

    • Author(s)
      Thi-Thuy-Nga Nguyen, Daijiro Akagi, Toshiyuki Uno, Takeshi Okato, Kenji Ishikawa, and Masaru Hori
    • Organizer
      AVS 69th International Symposium and Exhibition (AVS 69), 2023/11/5-10, Portland, USA
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] A pseudo-wet plasma etching mechanism for SiO2 at cryogenic temperature using hydrogen fluoride gas with in-situ surface monitoring2023

    • Author(s)
      Shih-Nan Hsiao, Makoto Sekine, Yuki Iijima, Ryutaro Suda, Yoshinobu Ohya, Yoshihide Kihara, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
    • Organizer
      AVS 69th International Symposium and Exhibition (AVS 69), 2023/11/5-10, Portland, USA
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism2023

    • Author(s)
      Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori,
    • Organizer
      AVS 69th International Symposium and Exhibition (AVS 69), 2023/11/5-10, Portland, USA
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF62023

    • Author(s)
      Taito Yoshie, Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Takayoshi Tsutsumi, Makoto Sekine, and Masaru Hori
    • Organizer
      13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), 2023/11/5-8, Busan, Korea
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Unravelling Dissociation of Hydrofluorocarbon Molecules through Photoelectron-Photoion Coincidence (PEPICO) Studies2023

    • Author(s)
      Tran Trung Nguyen, Kenji Ishikawa, Toshio Hayashi, Hiroshi Iwayama, Shih-Nan Hsiao, Makoto Sekine, and Masaru Hori
    • Organizer
      13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), 2023/11/5-8, Busan, Korea
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] On the mechanism of high-speed SiO2 etching using hydrogen fluoride-contained plasmas at cryogenic temperature2023

    • Author(s)
      Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Michael Kin-Ting Mo, Yusuke Imai, Takayoshi Tsusumi, Kenji Ishikawa, Yuki Iijima, Masahiko Yokoi, Ryutaro Suda, Yoshihide Kihara and Masaru Hori
    • Organizer
      Global Plasma Forum in Aomori , 2023/10/15-18, Aomori, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Simultaneous measurements of F, O and H ground state atom density in an industry-grade etching plasma2023

    • Author(s)
      M. K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, and N. Britun
    • Organizer
      Global Plasma Forum in Aomori , 2023/10/15-18, Aomori, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis2023

    • Author(s)
      Shih-Nan Hsiao, Makoto Sekine, Takayoshi Tsutsumi, Kenji Ishikawa, Manabu Iwata, Maju Tomura, Yuki Iijima, Taku Gohira, Keiichi Matsushima, Yoshinobu Ohya, Masaru Hori
    • Organizer
      The 76th Annual Gaseous Electronics Conference (GEC76), 2023/10/9-13, Michigan, USA
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Non-Halogen Plasma for Selective Removal of Titanium Compounds Applied in Advanced Atomic Layer Etching2023

    • Author(s)
      Thi-Thuy-Nga Nguyen, K. Shinoda, S. Hsiao, H. Hamamura, Maeda, K. Yokogawa, M. Izawa, K. Ishikawa, M. Hori
    • Organizer
      23rd International Conference on Atomic Layer Deposition, 10th International Atomic Layer Etching Workshop (ALD/ALE2023), 2023/7/23-26, Washington, USA
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Frontiers of Plasma Etching Technology for Advanced Semiconductor Devices2023

    • Author(s)
      Kenji Ishikawa
    • Organizer
      International Conference on Phenomena in Ionized Gases ICPIG XXXV , 2023/7/10-14, the Netherland
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Atomic layer etching of SiN films with CF4/H2 surface modification and H2/N2 plasma exposure2023

    • Author(s)
      Shih-Nan Hsiao, Makoto Sekine1 and Masaru Hori
    • Organizer
      International Conference on Phenomena in Ionized Gases ICPIG XXXV , 2023/7/10-14, the Netherland
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films2023

    • Author(s)
      Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      25th International Symposium on Plasma Chemistry (ISPC25), 2023/5/21-26, Kyoto, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har2023

    • Author(s)
      Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 ), 2023/4/16-21, Okinawa, Japan
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Plasma-driven science for emerging plasma-processing technologies2023

    • Author(s)
      Kenji Ishikawa, Hiromasa Tanaka, Hirokazu Hara, Shin-ichi Kondo, Masafumi Ito, Kazunori Koga, Masaharu Shiratani, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Non-halogen plasma etching of metal gate TiAlC2023

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Etching silicon oxide, silicon nitride, and polysilicon films in CH2FCHF2 hydrofluorocarbon plasma2023

    • Author(s)
      Trung-Nguyen Tran,Thi-Thuy-Nga Nguyen,Kenji Ishikawa, Shih-Nan Hsiao,Toshio Hayashi,Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Contribution analysis of process parameters in plasma-enhanced chemical vapor deposition of amorphous carbon2023

    • Author(s)
      Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Characterization of plasmas and polymerized hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas2023

    • Author(s)
      Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Study on plasma process using adsorbed C7F14 as an etchant2023

    • Author(s)
      Kohei Masuda,Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao,Takayoshi Tsutsumi,Hiroki Kondo, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Self-limited fluorination of electron-beam-irradiated GaN surface2023

    • Author(s)
      Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Positive and negative ion behaviors in DC-imposed Ar/SF6 pulsed plasma2023

    • Author(s)
      Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, S-N. Hsaio, Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] In situ monitoring surface structure during hydrofluorocarbon assisted atomic layer etching of silicon nitride using CF4/H2 and H2 plasmas2023

    • Author(s)
      Shih-Nan Hsiao, Makoto Sekine and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Plasma medicine and plasma bio related phenomena2022

    • Author(s)
      Kenji Ishikawa
    • Organizer
      2022 MRS Spring Meeting & Exhibit
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Passivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma2022

    • Author(s)
      Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Organizer
      2022 MRS Spring Meeting & Exhibit
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Nanoscale etching technologies for nitrides and carbides2022

    • Author(s)
      Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      Second Meeting of the NTC Technical Committee on Emerging Plasma Nanotechnologies
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Study of etching process using CHF3 gas condensed layer in cryogenic region2022

    • Author(s)
      Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
    • Organizer
      1st International Workshop on Plasma Cryogenic Etching Processes (PlaCEP2022)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Surface Modification for Atomic Layer Etching of TiAlC Using Floating Wire-Assisted Liquid Vapor Plasma at Medium Pressure2022

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, H. Hamamura, Kenji Maeda, K. Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Plasma-Assisted Thermal-Cyclic Etching of Silicon Germanium Selective to Germanium2022

    • Author(s)
      Kazunori Shinoda, H. Hamamura, Kenji Maeda, Masaru Izawa, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, and Masaru Hori
    • Organizer
      22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Area-Selective Atomic Layer Etching of SiO2 Using Silane Coupling Agent2022

    • Author(s)
      A. Osonio, Takayoshi Tsutsumi, Nagoya B. Mukherjee, R. Borude, N. Kobayashi, M. Hori
    • Organizer
      22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas2022

    • Author(s)
      Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      22ND INTERNATIONAL VACUUM CONGRESS IVC-22
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition2022

    • Author(s)
      Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, and Masaru Hori
    • Organizer
      22ND INTERNATIONAL VACUUM CONGRESS IVC-22
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials2022

    • Author(s)
      Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
    • Organizer
      5th International Union of Material Research Societies, International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM 2022)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process2022

    • Author(s)
      Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI
    • Organizer
      5th International Union of Material Research Societies, International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM 2022)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Plasma-based in situ functionalization based on functional nitrogen science2022

    • Author(s)
      Kenji Ishikawa, Masaru Hori, and Toshiro Kaneko
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Biological effects of the combination with low temperature plasmas and nanoparticles-platinum and gold2022

    • Author(s)
      Takashi Kondo, Kenji Ishikawa, Hiromasa Tanaka, Masaru Hori, Shinya Toyokuni, and Masaaki Mizuno
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature2022

    • Author(s)
      Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Damage mitigation in atomic layer etching of GaN by cyclic exposure of BCl3 gas and F2 added Ar plasma at high substrate temperature2022

    • Author(s)
      Shohei Nakamura, Atsushi Tanide, Masafumi Kawagoe, Soichi Nadahara, Kenji Ishikawa, Osamu Oda, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Plasma-assisted thermal-cyclic atomic-layer etching for selective removal of thin films2022

    • Author(s)
      Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Deposition mechanism of hydrogenated amorphous carbon film by C3H6/H2 mixture gas plasma2022

    • Author(s)
      Hiroki Kondo, Jumpei Kurokawa, Takayoshi Tsutsumi, Makoto Sekine, Kenji Ishikawa, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Highly efficient exosome capture by carbon nanowalls template2022

    • Author(s)
      Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias2022

    • Author(s)
      Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Topographically-selective Atomic Layer Etching of SiO2 using fluorine-containing plasma2022

    • Author(s)
      Airah P Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma2022

    • Author(s)
      H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      242nd ECS Meeting
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Impact of Bias Power and Oxygen Addition on Selective Dry Etching of TiAlC over TiN Using N2/H2-based Plasmas2022

    • Author(s)
      Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, and Masaru Hori
    • Organizer
      AVS 68th International Symposium & Exhibition
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Selective Dry Etching of TiAlC over TiN using N2/H2 Plasma Chemistry2022

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      AVS 68th International Symposium & Exhibition
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Nanoscale Dry Processes for Controlling Atomic Layer Reactions and Fabrication of High-Aspect-Ratio Features2022

    • Author(s)
      Kenji Ishikawa, Thi-Thuy-Nga Nguye, Takayoshi Tsutsumi, S-N Hsaio, Makoto Sekine, and Masaru Hori
    • Organizer
      Korean International Semiconductor Conference on Manufacturing Technology 2022 (KISM 2022)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma2022

    • Author(s)
      A.Osonio, T.Tsutsumi, B.Mukherjee, R.Borude, N.Kobayashi, M.Hori
    • Organizer
      43rd International Symposium on Dry Process Symposium (DPS 2022)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing2022

    • Author(s)
      Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI
    • Organizer
      32nd Anuual Meeting on Material Researh Society of Japan (MRS-J)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma2022

    • Author(s)
      Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI
    • Organizer
      32nd Anuual Meeting on Material Researh Society of Japan (MRS-J)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas2022

    • Author(s)
      Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
    • Organizer
      International Symposium on Semiconductor Manufacturing (ISSM 2022)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] High-Aspect-Ratioエッチングのナノスケール制御の技術進歩2022

    • Author(s)
      石川健治
    • Organizer
      プラズマプロセスを”あやつる”~半導体ドライエッチングの最新技術~
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長させたカーボンナノウォールのモフォロジー制御2022

    • Author(s)
      橋本 拓海、近藤 博基、石川 健治、堤 隆嘉、関根 誠、平松 美根男、堀 勝
    • Organizer
      The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)
    • Related Report
      2021 Annual Research Report
  • [Presentation] 窒化ガリウムの基板昇温時サイクルエッチング特性2022

    • Author(s)
      南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝
    • Organizer
      第69回応用物理学会春季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] Ar/F2プラズマとBCl3の交互供給によるAlGaN原子層エッチングでの組成比制御2022

    • Author(s)
      中村 昭平、谷出 敦、木村 貴弘、灘原 壮一、石川 健治、小田 修、堀 勝
    • Organizer
      第69回応用物理学会春季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響2022

    • Author(s)
      吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝
    • Organizer
      第69回応用物理学会春季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] C3H6/H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係2022

    • Author(s)
      黒川 純平、光成 正、近藤 博基、堤 隆嘉、関根 誠、石川 健治、堀 勝
    • Organizer
      第69回応用物理学会春季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] 高アスペクトホールエッチングにおけるストライエーションの形成メカニズム2022

    • Author(s)
      大村 光広、橋本 惇一、足立 昂拓、近藤 祐介、石川 勝朗、阿部 淳子、酒井 伊都子、林 久貴、関根 誠、堀 勝
    • Organizer
      第69回応用物理学会春季学術講演会
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] Plasma etching2021

    • Author(s)
      Kenji Ishikawa
    • Organizer
      Advanced Metallization Conference 2021
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Floating wire assisted plasma with vapor injection of liquid mixtures for etching titanium compounds2021

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      67th AVS International Symposium and Exhibition
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] In-situ analysis of surface reactions for plasma-assisted thermal-cyclic atomic layer etching of tantalum nitride2021

    • Author(s)
      Kazunori Shinoda, M. Hasegawa, H. Hamamura, K. Maeda, K. Yokogawa, M. Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      67th AVS International Symposium and Exhibition
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches2021

    • Author(s)
      Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
    • Organizer
      42nd International Symposium on Dry Process (DPS)
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Random forest model for property control of plasma deposited hydrogenated amorphous carbon films2021

    • Author(s)
      Junpei Kurokawa, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Organizer
      42nd International Symposium on Dry Process (DPS)
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Atomic layer etching of GaN using F2-added Ar plasma removal of BCl3 modified layer at high temperature2021

    • Author(s)
      Shohei Nakamura Atsushi Tanide, Takahiro Kimura, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori
    • Organizer
      42nd International Symposium on Dry Process (DPS)
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Optical transmission of carbon nanowalls from ultra-violet region to infra-red region2021

    • Author(s)
      Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori
    • Organizer
      Material Research Meeting (MRM 2020)
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 広がるプラズマ材料科学:半導体からバイオまで2021

    • Author(s)
      石川健治
    • Organizer
      MRM forum 2021
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] 原子層エッチングの反応素過程とその設計、制御2021

    • Author(s)
      石川 健治, Nguyen Thi-Thuy-Nga, 堤 隆嘉, 蕭 世男, 近藤 博基, 関根 誠, 堀 勝
    • Organizer
      第82回秋季応用物理学会
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] 窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測2021

    • Author(s)
      南 吏玖, 石川 健治, 堤 隆嘉, 近藤 博基, 関根 誠, 小田 修, 堀 勝
    • Organizer
      第82回秋季応用物理学会
    • Related Report
      2021 Annual Research Report
  • [Presentation] Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動2021

    • Author(s)
      吉江 泰斗, 堤 隆嘉, 石川 健治, 堀 勝
    • Organizer
      第82回秋季応用物理学会
    • Related Report
      2021 Annual Research Report
  • [Presentation] C3H6 / H2プラズマを用いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響2021

    • Author(s)
      黒川 純平, 光成 正, 堤 隆嘉, 近藤 博基, 関根 誠, 石川 健治, 堀 勝
    • Organizer
      第82回秋季応用物理学会
    • Related Report
      2021 Annual Research Report
  • [Remarks] 堀・石川研究室

    • URL

      https://horilab.nuee.nagoya-u.ac.jp/

    • Related Report
      2022 Annual Research Report
  • [Remarks] 名古屋大学低温プラズマ科学研究センター

    • URL

      https://www.plasma.nagoya-u.ac.jp/

    • Related Report
      2022 Annual Research Report
  • [Remarks] 堀・石川研究室

    • URL

      https://horilab.nuee.nagoya-u.ac.jp

    • Related Report
      2021 Annual Research Report
  • [Remarks] 低温プラズマ科学研究センター

    • URL

      https://www.plasma.nagoya-u.ac.jp

    • Related Report
      2021 Annual Research Report

URL: 

Published: 2021-04-28   Modified: 2025-01-30  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi