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Study on nanoscale chemical reactions and reaction sites using quantum beams

Research Project

Project/Area Number 22246128
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field Nuclear engineering
Research InstitutionOsaka University

Principal Investigator

KOZAWA Takahiro  大阪大学, 産業科学研究所, 教授 (20251374)

Co-Investigator(Kenkyū-buntansha) YANG Jinfeng  大阪大学, 産業科学研究所, 准教授 (90362631)
KOBAYASHI Kazuo  大阪大学, 産業科学研究所, 助教 (30116032)
YAMAMOTO Hiroki  大阪大学, 産業科学研究所, 助教 (00516958)
Project Period (FY) 2010 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥34,320,000 (Direct Cost: ¥26,400,000、Indirect Cost: ¥7,920,000)
Fiscal Year 2012: ¥6,370,000 (Direct Cost: ¥4,900,000、Indirect Cost: ¥1,470,000)
Fiscal Year 2011: ¥13,260,000 (Direct Cost: ¥10,200,000、Indirect Cost: ¥3,060,000)
Fiscal Year 2010: ¥14,690,000 (Direct Cost: ¥11,300,000、Indirect Cost: ¥3,390,000)
Keywords放射線 / X 線 / 粒子線 / 半導体超微細化 / シミュレーション工学 / 計算物理 / 放射線、X線、粒子線
Research Abstract

In the high-volume production lines of semiconductor devices, high-resolution and high-throughput manufacturing has been achieved through the combination of expensive high-quality quantum beam and inexpensive low-quality thermal energy. In this study, nanoscale chemical reactions and reaction sites were investigated by using state-of-the-art quantum beams such as electron beam, laser, extreme ultraviolet (EUV) radiation, and X-ray. On the basis of the obtained knowledge, Monte Carlo simulation code was developed.

Report

(4 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Annual Research Report
  • 2010 Annual Research Report
  • Research Products

    (27 results)

All 2013 2012 2011 2010 Other

All Journal Article (20 results) (of which Peer Reviewed: 20 results) Presentation (6 results) Remarks (1 results)

  • [Journal Article] Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified ExtremeUltraviolet Resists2013

    • Author(s)
      T. Kozawa and T. Hirayama
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 52巻 Issue: 4R Pages: 46502-46502

    • DOI

      10.7567/jjap.52.046502

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in ExtremeUltraviolet Lithography2013

    • Author(s)
      Y. Komuro, H. Yamamoto, Y. Utsumi, K. Ohomori, and T. Kozawa
    • Journal Title

      Appl. Phys. Express

      Volume: 6巻 Issue: 1 Pages: 14001-14001

    • DOI

      10.7567/apex.6.014001

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2013

    • Author(s)
      T. Kozawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 52巻 Issue: 1R Pages: 16501-16501

    • DOI

      10.7567/jjap.52.016501

    • NAID

      210000141741

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified ExtremeUltraviolet Resists2012

    • Author(s)
      T. Kozawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 51巻 Issue: 12R Pages: 126501-126501

    • DOI

      10.1143/jjap.51.126501

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Stochastic Effect of Acid Catalytic Chain Reaction in Chemically Amplified Extreme Ultraviolet Resists2012

    • Author(s)
      T. Kozawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 51巻 Issue: 11R Pages: 116503-116503

    • DOI

      10.1143/jjap.51.116503

    • NAID

      40019496245

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Resist Properties Required for 6.67nm Extreme Ultraviolet Lithography2012

    • Author(s)
      T. Kozawa and A. Erdmann
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 51巻 Issue: 10R Pages: 106701-106701

    • DOI

      10.1143/jjap.51.106701

    • NAID

      40019456428

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser2012

    • Author(s)
      K. Okamoto, T. Kozawa, K. Oikawa, T. Hatsui, M. Nagasono, T. Kameshima, T. Togashi, K. Tono, M. Yabashi, H. Kimura, Y. Senba, H. Ohashi, R. Fujiyoshi, and T. Sumiyoshi
    • Journal Title

      Appl. Phys. Express

      Volume: 5巻 Issue: 9 Pages: 96701-96701

    • DOI

      10.1143/apex.5.096701

    • NAID

      40019425422

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2012

    • Author(s)
      T. Kozawa
    • Journal Title

      J. Photopolym. Sci. Technol

      Volume: 25巻 Pages: 625-631

    • NAID

      130004833489

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation2012

    • Author(s)
      T. Kozawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 51巻 Issue: 8R Pages: 86504-86504

    • DOI

      10.1143/jjap.51.086504

    • NAID

      40019395627

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists2012

    • Author(s)
      T. Kozawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 51巻 Issue: 6S Pages: 06FC01-06FC01

    • DOI

      10.1143/jjap.51.06fc01

    • NAID

      210000140711

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2012

    • Author(s)
      T. Kozawa
    • Journal Title

      J. Photopolym. Sci. Technol.

      Volume: 25 Pages: 625-631

    • NAID

      130004833489

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Effect of Acid Generator Decomposition during Exposure on Acid Image Quality of Chemically Amplified Extreme Ultraviolet Resists2011

    • Author(s)
      T. Kozawa and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 50巻 Issue: 7R Pages: 76505-76505

    • DOI

      10.1143/jjap.50.076505

    • NAID

      40018915999

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Assessment and Extendibility of Chemically Amplified Resists for Extreme Ultraviolet Lithography: Consideration of Nanolithography beyond 22nm Half-Pitch2011

    • Author(s)
      T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 50巻 Issue: 7R Pages: 76503-76503

    • DOI

      10.1143/jjap.50.076503

    • NAID

      40018915997

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist2011

    • Author(s)
      T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 50巻 Issue: 12R Pages: 126501-126501

    • DOI

      10.1143/jjap.50.126501

    • NAID

      40019141217

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists2010

    • Author(s)
      T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 49巻 Issue: 3R Pages: 36506-36506

    • DOI

      10.1143/jjap.49.036506

    • NAID

      40017033747

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography2010

    • Author(s)
      T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 49巻 Issue: 6R Pages: 66504-66504

    • DOI

      10.1143/jjap.49.066504

    • NAID

      40017176043

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies2010

    • Author(s)
      K. Okamoto, M. Tanaka, T. Kozawa, and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 49巻 Issue: 10R Pages: 106501-106501

    • DOI

      10.1143/jjap.49.106501

    • NAID

      40017341248

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists2010

    • Author(s)
      T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 49 Pages: 36506-36506

    • NAID

      40017033747

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography2010

    • Author(s)
      T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 49 Pages: 66504-66504

    • NAID

      40017176043

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies2010

    • Author(s)
      K.Okamoto, M.Tanaka, T.Kozawa, S.Tagawa
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 49 Pages: 106501-106501

    • NAID

      40017341248

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Presentation] Resist properties required for 6.67 nm extreme ultraviolet lithography2012

    • Author(s)
      T. Kozawa
    • Organizer
      10th Fraunhofer IISB Lithography Simulation Workshop
    • Place of Presentation
      Hersbruck, Germany
    • Year and Date
      2012-09-21
    • Related Report
      2012 Annual Research Report 2012 Final Research Report
  • [Presentation] Status and Challenge of Chemically Amplified Resists for Extreme Ultraviolet Lithography2012

    • Author(s)
      T. Kozawa
    • Organizer
      2012 International Workshop on EUVL
    • Place of Presentation
      Maui, Hawaii, USA
    • Year and Date
      2012-06-06
    • Related Report
      2012 Annual Research Report 2012 Final Research Report
  • [Presentation] Theoretical study of 11-nm-fabrication using 6.67-nm EUV lithography2011

    • Author(s)
      T. Kozawa, and A. Erdmann
    • Organizer
      9th Fraunhofer IISB Lithography Simulation Workshop
    • Place of Presentation
      Hersbruck, Germany
    • Year and Date
      2011-09-16
    • Related Report
      2012 Final Research Report
  • [Presentation] Theoretical study of 11-nm-fabrication using 6.67-nm EUV lithography2011

    • Author(s)
      T.Kozawa, A.Erdmann
    • Organizer
      9TH Fraunhofer IISB Lithography simulation Workshop
    • Place of Presentation
      Hersbruck, Germany
    • Year and Date
      2011-09-16
    • Related Report
      2011 Annual Research Report
  • [Presentation] Analysis of Chemical Reactions Induced in Chemically Amplified Extreme Ultraviolet Resists2010

    • Author(s)
      T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
    • Organizer
      European Symposium of Photopolymer Science
    • Place of Presentation
      Mulhouse, France
    • Year and Date
      2010-11-30
    • Related Report
      2012 Final Research Report
  • [Presentation] Analysis of Chemical Reactions Induced in Chemically Amplified Extreme Ultraviolet Resists2010

    • Author(s)
      T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
    • Organizer
      European Symposium of Photopolymer Science
    • Place of Presentation
      Mulhouse(France)
    • Year and Date
      2010-11-30
    • Related Report
      2010 Annual Research Report
  • [Remarks]

    • URL

      http://www.sanken.osaka-u.ac.jp/labs/bms/

    • Related Report
      2012 Final Research Report

URL: 

Published: 2010-08-23   Modified: 2019-07-29  

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