Development and application of a holographic method for the analysis of interfaces with atomic resolution using X-ray CTR scattering
| Project/Area Number |
22360018
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | The University of Tokyo |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
SHIRASAWA Tetsuro 東京大学, 物性研究所, 助教 (80451889)
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| Project Period (FY) |
2010 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥19,370,000 (Direct Cost: ¥14,900,000、Indirect Cost: ¥4,470,000)
Fiscal Year 2012: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2011: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2010: ¥13,260,000 (Direct Cost: ¥10,200,000、Indirect Cost: ¥3,060,000)
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| Keywords | X線回折 / 表面・界面 / 位相問題 / ホログラフィ / 放射光 / 超薄膜 / トポロジカル絶縁体 / 結晶成長 / 放射線 / 直接法 / CTR散乱 |
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| Research Abstract |
A new method for obtaining the interface structure of ultra-thin films on substrates from the analysis of X-Ray CTR scattering has been developed with a holographic method and iterative phase retrieval methods. In the method, inter-atomic layer distances, electron density and its distribution in each atomic layer are obtained for ultra-thin films on substrate. The results give valuable information on electronic states and crystal growth mechanisms.
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Report
(4 results)
Research Products
(53 results)
