Resist pattern replication using EUV interference lithography for 20 nm and below

• Project/Area Number: 22360146
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: University of Hyogo
• Principal Investigator: WATANABE Takeo 兵庫県立大学, 高度産業科学技術研究所, 准教授 (70285336)
• Co-Investigator(Kenkyū-buntansha): KINOSHITA Hiroo 兵庫県立大学, 高度産業科学技術研究所, 教授 (50285334) ; HARADA Tetsuo 兵庫県立大学, 高度産業科学技術研究所, 助授 (30451636)
• Research Collaborator: SHIONO Daiju 東京応化工業株式会社
• Project Period (FY): 2010 – 2012
• Project Status: Completed (Fiscal Year 2012)
• Budget Amount: ¥19,110,000 (Direct Cost: ¥14,700,000、Indirect Cost: ¥4,410,000); Fiscal Year 2012: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000); Fiscal Year 2011: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000); Fiscal Year 2010: ¥14,040,000 (Direct Cost: ¥10,800,000、Indirect Cost: ¥3,240,000)
• Keywords: 微細プロセス技術 / 極端紫外線リソグラフィ / 干渉露光 / レジスト / 半導体微細加工 / 化学増幅系 / 感度 / line edge roughness / EUVリソグラフィ / 半導体 / 微細加工技術 / レジス / 干渉霞光

Research Abstract

Resist pattern of 15 nm line and space was replicated using EUV interference lithographic tool which was developed at the BL9B beamline of the NewSUBARU synchrotron radiation facility. The fabrication of the transmission grating for 1X nm resist pattern replication was succeeded. Furthermore, the resist chemical reaction study for increasing sensitivity and decreasing line width roughness, base resin selection of polymer and monomer, and photoacid generator selection were carried out.

Research Products

• [Journal Article] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy (2012)
  • Author(s): Takeo Watanabe, Yuichi Haruyama, Daiju Shiono, Kazuya Emura, Takuro Urayama, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 25 Pages: 569-574
  • NAID: 130004833480
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] Extreme Ultraviolet (EUV)-Resist Material Based on Noria (Water Wheel-like Macrocycle) Derivatives with Pendant Alkoxyl and Adamantyl Ester Groups (2012)
  • Author(s): Hiroto Kudo, Nobumitsu Niina, Tomoharu Sato, Hiroaki Oizumi, Toshiro Itani, Takuro Miura, Takeo Watanabe and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 25 Pages: 587-592
  • NAID: 130004833483
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] Comparison of Resist Outgassing Characterization between High Power EUV and EB (2012)
  • Author(s): Norihiko Sugie, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 25 Pages: 617-624
  • NAID: 130004833488
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] EUV リソグラフィ研究開発センターにおけるリソグラフィ開発 (2012)
  • Author(s): 渡邊健夫、原田哲男、木下博雄
  • Journal Title: クリーンテクノロジー Volume: 22 Pages: 1-5
• [Journal Article] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy (2012)
  • Author(s): Takeo Watanabe
  • Journal Title: J. Photopolymer Sci. Technol Volume: 25 Pages: 569-574
  • NAID: 130004833480
  • Peer Reviewed
• [Journal Article] Extreme Ultraviolet (EUV)-Resist Material Based on Noria (Water Wheel-like Macrocycle) (2012)
  • Author(s): Hiroto Kudo
  • Journal Title: J. Photopolymer Sci. Technol Volume: 25 Pages: 587-592
  • Peer Reviewed
• [Journal Article] Comparison of Resist Outgassing Characterization between High Power EUV and EB (2012)
  • Author(s): Norihiko Sugie
  • Journal Title: J. Photopolymer Sci. Technol Volume: 25 Pages: 617-624
  • Peer Reviewed
• [Journal Article] Development of interference lithography for 22 nm node and below (2011)
  • Author(s): Yasuyuki Fukushima, Yuya Yamaguchi, Takafumi Iguchi, Takuro Urayama, Tetsuo Harada, Takeo Watanabe and Hiroo Kinoshita
  • Journal Title: Microelectric Engineering Volume: 88 Pages: 1944-1947
  • Peer Reviewed
• [Journal Article] Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below (2011)
  • Author(s): Yuya Yamaguchi, Yasuyuki Fukushima, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys. Volume: 50
  • NAID: 210000070661
  • Peer Reviewed
• [Journal Article] In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU (2011)
  • Author(s): Naohiro Matsuda, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Hiroaki Oizumi, and Toshiro Itani
  • Journal Title: Jpn. J. Appl. Phys. Volume: 50
  • NAID: 210000070653
  • Peer Reviewed
• [Journal Article] EUV Interference Lithography for 1X nm (2011)
  • Author(s): Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 681-686
  • NAID: 130004833387
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] elationships between EUV resist outgassing and contamination deposition at Selete (2011)
  • Author(s): Hiroaki Oizumi, Kazuyuki Matsumaro, Satoshi Nomura, Julius Joseph Santillan, Toshiro Itani, Takeo Watanabe, Naohiro Matsuda, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: Proc. SPIE Volume: 7969
• [Journal Article] EUV Interference Lithography for 1Xnm (2011)
  • Author(s): Takuro Urayama, et al
  • Journal Title: J.Photopolymer Sci.Technol. Volume: 23 Pages: 681-686
  • Peer Reviewed
• [Journal Article] In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU (2011)
  • Author(s): Naohiro Matsuda, et al
  • Journal Title: Jpn.J.Appl.Phys. Volume: 50
  • Peer Reviewed
• [Journal Article] Transmission Grating Fabrication for Replicating Resist Patterns of 20nm and Below (2011)
  • Author(s): Yuya Yamaguchi, et al
  • Journal Title: Jpn.J.Appl.Phys. Volume: 50
  • Peer Reviewed
• [Journal Article] Development of interference lithography for 22nm node and below (2011)
  • Author(s): Yasuyuki Fukushima, et al
  • Journal Title: Microelectric Engineering Volume: 88 Pages: 1944-1947
  • Peer Reviewed
• [Journal Article] Development of Extreme Ulytaviolet Interference Lithography System (2010)
  • Author(s): Y. Fukushima, Naqoki. Sakagami, Teruhiko Kimura, Yoshito Kamaji, Takafumi Iguchi, Y. Yamaguchi, Masaki Tada, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys. Volume: 49
  • Peer Reviewed
• [Journal Article] Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing LWR (2010)
  • Author(s): Daiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys. Volume: 49
  • Peer Reviewed
• [Journal Article] Fabrication process of EUV -IL transmission grating (2010)
  • Author(s): Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 681-386
  • NAID: 130004464852
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] EUV interference lithography for 22 nm node and below (2010)
  • Author(s): Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 673-680
  • NAID: 130004464851
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22 nm Resolution (2010)
  • Author(s): aiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 649-656
  • NAID: 130004464848
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] EUVレジスト材料開発の現状と将来展望について、先端リソグラフィの展望 (2010)
  • Author(s): 渡邊健夫、木下博雄
  • Journal Title: 第19回光反応・電子用材料研究会講座 講演予稿集、高分子学会 Pages: 14-17
  • Peer Reviewed
• [Journal Article] EUV interference lithography for 22 nm node and below (2010)
  • Author(s): Yasuyuki Fukushima, et al.
  • Journal Title: J.Photopolymer Sci.Technol Volume: Vol.23 Pages: 673-680
  • Peer Reviewed
• [Journal Article] Fabrication process of EL TV-IL transmission grating (2010)
  • Author(s): Yuya Yamaguchi, et al.
  • Journal Title: J.Photopolymer Sci.Technol Volume: Vol.23 Pages: 681-686
  • Peer Reviewed
• [Presentation] Contamination Evaluation Tool by an In-situ Spectroscopic Ellipsometer with an Exposure of High Power EUV (Invited talk) (2012)
  • Author(s): Takeo Watanabe, Masaki Tada, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Isamu Takagi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
  • Organizer: Technical Working Group of EUV Resist Outgassing
  • Place of Presentation: Brussels Convention Center, Brussels, Belgium
  • Year and Date: 2012-09-30
• [Presentation] レジストへのEUV光照射によるin-situカーボン膜厚測定 (2012)
  • Author(s): 渡邊健夫, 他
  • Organizer: 第25回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: 鳥栖市民文化会館・中央公民館(佐賀県鳥栖市)
  • Year and Date: 2012-01-09
• [Presentation] EUVマスク上欠陥転写特性評価用プログラム位相欠陥の製作 (2012)
  • Author(s): 山口裕也, 他
  • Organizer: 第25回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: 鳥栖市民文化会館・中央公民館(佐賀県鳥栖市)
  • Year and Date: 2012-01-09
• [Presentation] EUV干渉露光による1Xnmパタン創生 (2012)
  • Author(s): 浦山拓郎, 他
  • Organizer: 第25回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: 鳥栖市民文化会館・中央公民館(佐賀県鳥栖市)
  • Year and Date: 2012-01-09
• [Presentation] EUVL 研究開発センターにおけるEUV レジストの開発(基調講演)、アドバンスト・テクノロジー・プログラム(ATP)、新材料開発最前線、微細パターン化技術 (2012)
  • Author(s): 渡邊健夫、原田哲男、木下博雄
  • Organizer: 日本化学会第93春季年会(2013)
  • Place of Presentation: 立命館大学びわこ・くさつキャンパス
• [Presentation] Recent Activities on EUVL in NewSUBARU (Invited talk) (2012)
  • Author(s): Hiroo Kinoshia, Takeo Watanabe, and Tetsuo Harada
  • Organizer: 24th Microprocesses and Nanotechnology Conference
  • Place of Presentation: Kobe Meriken Park Oriental Hotel, Kobe, Hyogo, Japan
• [Presentation] 極端紫外線リソグラフィ技術開発の現状と今後の展望(招待講演) (2012)
  • Author(s): 渡邊健夫、原田哲男、木下博雄
  • Organizer: リソグラフィセミナー(I)、セミフォーラムジャパン2012
  • Place of Presentation: グランキューブ大阪(大阪市)
• [Presentation] EUVレジストの開発 ～20nm以下のパターン形成をめざして～ (招待講演) (2011)
  • Author(s): 渡邊健夫
  • Organizer: 第3回リソグラフィ次世代技術調査専門委員会
  • Place of Presentation: 日本交通協会 特別談話室、東京
  • Year and Date: 2011-09-16
• [Presentation] 極端紫外線干渉露光による1Xnm級レジストパタン形成 (2011)
  • Author(s): 浦山拓郎, 他
  • Organizer: 第72回応用物理学会学術講演会
  • Place of Presentation: 山形大学(山形県山形市)
  • Year and Date: 2011-08-30
• [Presentation] 極端紫外線干渉露光による1Xnm級レジストパタン形成 (2011)
  • Author(s): 浦山拓郎, 他
  • Organizer: 精密工学会2011年度関西地方定期学術講演会
  • Place of Presentation: 兵庫県立大学(兵庫県)
  • Year and Date: 2011-06-30
• [Presentation] EUV Interference Lithography for 1Xnm (2011)
  • Author(s): Takuro Urayama, et al
  • Organizer: The 28^<th> International Conference of Photopolymer Science and Technology
  • Place of Presentation: 千葉大学(千葉市稲毛区)
  • Year and Date: 2011-06-22
• [Presentation] EUVL toward 16nm and below (2011)
  • Author(s): Takeo Watanabe
  • Organizer: The 28^<th> International Conference of Photopolymer Science and Technology
  • Place of Presentation: 千葉大学(千葉市稲毛区)(Invited)
  • Year and Date: 2011-06-22
• [Presentation] EUV R&D Status in Japan (2011)
  • Author(s): Takeo Watanabe, et al
  • Organizer: 2011 International Workshop on EUV Lithography
  • Place of Presentation: Maui, Hawaii, USA(Invited)
  • Year and Date: 2011-06-16
• [Presentation] EUV Interference Lithography for 1Xnm (2011)
  • Author(s): Takeo Watanabe, et al
  • Organizer: 2011 International Workshop on EUV Lithography
  • Place of Presentation: Maui, Hawaii, USA
  • Year and Date: 2011-06-15
• [Presentation] EUVL研究開発センターにおける研究開発 (2011)
  • Author(s): 渡邊健夫
  • Organizer: セミフォーラムジャパン2011
  • Place of Presentation: グランキューブ大阪(大阪市北区)(招待講演)
  • Year and Date: 2011-05-31
• [Presentation] EUV干渉露光装置を用いたレジストパタン形成 (2011)
  • Author(s): 浦山拓郎, 他
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学
  • Year and Date: 2011-03-24
• [Presentation] EUVリソグラフィ-研究開発センターにおけるリソグラフィー開発 (2011)
  • Author(s): 渡邊健夫
  • Organizer: 日本化学会第91春季年会
  • Place of Presentation: 神奈川工科大学
  • Year and Date: 2011-03-24
• [Presentation] EUV干渉露光によるレジストパタン形成 (2011)
  • Author(s): 浦山拓郎, 他
  • Organizer: 第24回放射光学会年会
  • Place of Presentation: つくば
  • Year and Date: 2011-01-10
• [Presentation] EUV Interference Lithography for 1X nm (2011)
  • Author(s): Takeo Watanabe, Yuya Yamaguchi, Takuro Urayama, Naohiro Matsuda, Tetsu Harada and Hiroo Kinosita
  • Organizer: 2011 International Workshop on EUV Lithography
  • Place of Presentation: Makena Beach and Golf Resort, Maui, Hawaii, USA
• [Presentation] EUVL toward 16 nm and below (Invited), Interational Panel Symposium (2011)
  • Author(s): Takeo Watanabe
  • Organizer: The 28th International Conference of Photopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
• [Presentation] EUV Interference Lithography for 1X nm (2011)
  • Author(s): Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
  • Organizer: The 28th International Conference ofPhotopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
• [Presentation] EUVL研究開発センターにおける研究開発(招待講演) 、微細化ブレイクセミナー(I) (2011)
  • Author(s): 渡邊健夫
  • Organizer: セミフォーラムジャパン2011
  • Place of Presentation: グランキューブ大阪(大阪市)
• [Presentation] EUV リソグラフィ-研究開発センターにおけるリソグラフィー開発(招待講演)、アドバンスト・テクノロジー・プログラム(ATP) (2011)
  • Author(s): 渡邊健夫、 原田哲男、 木下博雄
  • Organizer: 次世代リソグラフィ、日本化学会第91 春季年会
  • Place of Presentation: 神奈川大学(神奈川)
• [Presentation] Fabrication of transmission grating for replication of 20 nm node resist pattern (2010)
  • Author(s): Yuya Yamaguchi, et al.
  • Organizer: 22^<th> Microprocesses and Nanotechnology Conference
  • Place of Presentation: 小倉リーガロイアルホテル
  • Year and Date: 2010-11-12
• [Presentation] 20nm EUV干渉露光用透過型回折格子の製作 (2010)
  • Author(s): 山口裕也, 他
  • Organizer: 平成22年第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学文教キャンパス
  • Year and Date: 2010-09-14
• [Presentation] 極端紫外線干渉露光によるレジストパタン形成 (2010)
  • Author(s): 福島靖之, 他
  • Organizer: 平成22年第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学文教キャンパス
  • Year and Date: 2010-09-14
• [Presentation] EUV interference lithography for 22 nm node and below (2010)
  • Author(s): Yasuyuki Fukushima, et al.
  • Organizer: The 27^<th> international Conference of Photopolymer Science and Technology
  • Place of Presentation: 千葉大学けやき会館(千葉市)
  • Year and Date: 2010-06-23
• [Presentation] Fabrication process of EUV-IL transmission grating (2010)
  • Author(s): Yuya Yamaguchi, et al.
  • Organizer: The 27^<th> international Conference of Photopolymer Science and Technology
  • Place of Presentation: 千葉大学けやき会館(千葉市)
  • Year and Date: 2010-06-23
• [Presentation] Fabrication process of EUV-IL transmission grating (2010)
  • Author(s): Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
  • Organizer: The 27th International Conference of Photopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
• [Presentation] EUV interference lithography for 22 nm node and below (2010)
  • Author(s): Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
  • Organizer: The 27th International Conference of Photopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
• [Presentation] 吸収分光法を用いたEUVレジストの反応解析例
  • Author(s): 渡邊健夫
  • Organizer: EUV産業利用報告会
  • Place of Presentation: じばさんビル3F, 兵庫県立大学産学連携機構会議室（兵庫県姫路市）
  • Invited
• [Presentation] 極端紫外線リソグラフィー研究開発センターの23年度成果報告
  • Author(s): 木下博雄
  • Organizer: 先端技術セミナー
  • Place of Presentation: イーグレ姫路（兵庫県姫路市）
  • Invited
• [Presentation] EUV用低分子レジストの開発
  • Author(s): 塩谷英昭
  • Organizer: 先端技術セミナー
  • Place of Presentation: イーグレ姫路（兵庫県姫路市）
• [Presentation] 水―オクタノール分配係数とネガ型レジスト感度の相関調査
  • Author(s): 落合ゆみ
  • Organizer: 先端技術セミナー
  • Place of Presentation: イーグレ姫路（兵庫県姫路市）
• [Presentation] 高出力EUV光および電子線を用いたレジストアウトガスの評価
  • Author(s): 高橋年哉
  • Organizer: 先端技術セミナー
  • Place of Presentation: イーグレ姫路（兵庫県姫路市）
• [Presentation] EUV resist research at the Center for EUVL
  • Author(s): Takeo Watanabe
  • Organizer: International Advanced Nanopatterning Materials and Processes Workshop 2012
  • Place of Presentation: Waseda Univ. Int. Conference Center (Tokyo)
  • Invited
• [Presentation] Development of the Novel Evaluation Tool with an In-situ Ellipsometer for the Thickness Measurement of the Contamination Originated by the High Power EUV Irradiation on EUV Resist
  • Author(s): Takeo Watanabe
  • Organizer: 2012 International Workshop on EUV Lithography
  • Place of Presentation: Maui Sheraton Beach and Resort (Hawaii, USA)
• [Presentation] Chemical Reaction Analysis based on the SR Absorption Spectroscopy for the High Sensitive EUV Resist
  • Author(s): Takeo Watanabe
  • Organizer: 2012 International Workshop on EUV Lithography
  • Place of Presentation: Maui Sheraton Beach and Resort (Hawaii, USA
• [Presentation] 極端紫外線リソグラフィ技術開発の現状と今後の展望(招待講演)
  • Author(s): 渡邊健夫
  • Organizer: セミフォーラムジャパン2012、リソグラフィセミナー(I)
  • Place of Presentation: グランキューブ大阪（大阪市）
  • Invited
• [Presentation] EUV Interference Lithography for 1X nm
  • Author(s): Takuro Urayama
  • Organizer: NGL2012
  • Place of Presentation: 東京工業大学大岡山キャンパス（東京都）
• [Presentation] 1Xnm級EUVレジストの開発 〜精密な光反応制御への挑戦〜
  • Author(s): 渡邊健夫
  • Organizer: 兵庫県立大学シンポジウム
  • Place of Presentation: イーグレ姫路（兵庫県姫路市）
• [Presentation] Contamination Evaluation Tool by an In-situ Spectroscopic Ellipsometer with an Exposure of High Power EUV (Invited)
  • Author(s): Takeo Watanabe
  • Organizer: Technical Working Group of EUV Resist Outgassing, IEUVI
  • Place of Presentation: Brussels Convention Center (Brussels, Belgium)
  • Invited
• [Presentation] The Mitigation of EUV Resist for the High Sensitivity and the Effect of Acid Diffusion for LWR on the basis of the Chemical Reaction Analysis
  • Author(s): Takeo Watanabe
  • Organizer: 2012 EUVL International Symposium
  • Place of Presentation: Brussels Convention Center (Brussels, Belgium)
• [Presentation] The Analytical Mitigation of EUV Resist for the High Sensitivity and the Low LWR using SR Absorption Spectroscopy
  • Author(s): Takeo Watanabe
  • Organizer: 24th Microprocesses and Nanotechnology Conference
  • Place of Presentation: Kobe Merikepark Oriental Hotel (Kobe, Hyogo)
• [Presentation] ニュースバルにおける極端紫外光リソグラフィー研究
  • Author(s): 木下博雄
  • Organizer: ニュースバルシンポジウム
  • Place of Presentation: 東京ステーションコンファレンス サビタワー（東京都）
  • Invited
• [Presentation] 環状オリゴマーを基盤とした分子レジスト材料の開発
  • Author(s): 工藤宏人
  • Organizer: EUV産業利用報告会
  • Place of Presentation: じばさんびる（兵庫県姫路市）
• [Presentation] EUV用低分子レジストの開発
  • Author(s): 柏村 孝
  • Organizer: EUV産業利用報告会
  • Place of Presentation: じばさんびる（兵庫県姫路市）
• [Presentation] EUVリソグラフィ用ネガ型レジストの開発
  • Author(s): 越後雅敏
  • Organizer: EUV産業利用報告会
  • Place of Presentation: じばさんびる（兵庫県姫路市）
• [Presentation] EUVL 研究開発センターにおけるEUV レジストの開発(基調講演)
  • Author(s): 渡邊健夫
  • Organizer: アドバンスト・テクノロジー・プログラム(ATP)、新材料開発最前線
  • Place of Presentation: 立命館大学びわこ・くさつキャンパス（滋賀県草津市）
  • Invited
• [Presentation] EUVレジストの高感度化について
  • Author(s): 渡邊健夫
  • Organizer: 2013年 第60回応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大（神奈川県厚木市）
• [Book] レジストプロセスの最適化テクニック、～微細化・トラブル解消のための工程別対策および材料技術～ (2011)
  • Author(s): 渡邊健夫
  • Total Pages: 557
  • Publisher: 情報機構
• [Book] レジストプロセスの最適化テクニック (2011)
  • Author(s): 渡邊健夫, 他
  • Publisher: 情報機構
• [Remarks]
  • URL: http://www.lasti.u-hyogo.ac.jp/sr-nanotechnology/index.html
• [Remarks] 兵庫県立大学高度産業科学技術研究所放射光ナノ光学研究室
  • URL: http://www.lasti.u-hyogo.ac.jp/sr-nanotechnology/index.html
• [Remarks]
  • URL: http://www.lasti.u-hyogo.ac.jp/sr-nanotechnology/index.html
• [Remarks]
  • URL: http://www.lasti.u-hyogo.ac.jp/sr-nanotechnology/index.html