Fabrication of photovoltaic cells using amorphous carbon films
Project/Area Number |
22360302
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Material processing/treatments
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Research Institution | Tokyo Institute of Technology |
Principal Investigator |
OHTAKE Naoto 東京工業大学, 大学院・理工学研究科, 教授 (40213756)
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Project Period (FY) |
2010 – 2012
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Project Status |
Completed (Fiscal Year 2012)
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Budget Amount *help |
¥16,380,000 (Direct Cost: ¥12,600,000、Indirect Cost: ¥3,780,000)
Fiscal Year 2012: ¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2011: ¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2010: ¥7,800,000 (Direct Cost: ¥6,000,000、Indirect Cost: ¥1,800,000)
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Keywords | プラズマ処理・レーザー加工 / アモルファス炭素 / 太陽電池 / プラズマ処理 / ダイヤモンド / 二酸化炭素排出削減 / DLC |
Research Abstract |
This report describes fabrication of doped amorphous carbon films and its application to photovoltaic cells. Pulse magnetron sputtering method was used to deposit amorphous carbon films. Nitrogen, antimony and boron were used as the dopants, because nitrogen and antimony are 15-group elements, and boron is 13-group element. Annealing process was utilized to reduce defect density of amorphous carbon films. Deposited films were annealed under Ar and H2 plasma atmosphere. Annealed amorphous carbon films with antimony of 1.0 [mol%] under H2 plasma atmosphere at 900 [℃] showed band gap of 2.63 [eV] and dangling bond density of as low as 3.0×10^16 [cm-3]. This value is as same as amorphous silicon films. Finally, photovoltaic cell consisting of amorphous carbon was fabricated. It was found that the cell generates Voc of 20~49.0 mV,and Isc of0.01uA.
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Report
(4 results)
Research Products
(14 results)
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[Presentation] Synthesis of Antimony Doped Amorphous Carbon Films2012
Author(s)
Hiroaki Okuyama, Mai Takashima, Hiroki Akasaka, Naoto Ohtake
Organizer
11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials),Abstracts of 11th APCPST & 25th SPSM, The 11th Committee on APCPST,The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science
Place of Presentation
Kyoto University (Kyoto)
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