| Budget Amount *help |
¥19,500,000 (Direct Cost: ¥15,000,000、Indirect Cost: ¥4,500,000)
Fiscal Year 2012: ¥6,240,000 (Direct Cost: ¥4,800,000、Indirect Cost: ¥1,440,000)
Fiscal Year 2011: ¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000)
Fiscal Year 2010: ¥8,320,000 (Direct Cost: ¥6,400,000、Indirect Cost: ¥1,920,000)
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| Research Abstract |
Process for nano-capacitors to be used in DRAMs and FeRAMs using supercritical CO2 (scCO2) was developed. Organic metal compounds were dissolved into scCO2 and reacted to form thin films on a heated substrate. This process, Supercritical Fluid Deposition, SCFD, was used to deposit Ru, Pt, and SrRuO3 as an electrode. TiO2, SrTiO3, and BiTiO3 were also deposited as a high-dielectric constant material and ferroelectric material. The developed processes showed excellent step coverage like as the conventional processes of CVD/ALD with lower deposition temperature.
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