| Project/Area Number |
22510132
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Microdevices/Nanodevices
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| Research Institution | Toyama Industrial Technology Center, |
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Principal Investigator |
NABESAWA Hirofumi 富山県工業技術センター, 中央研究所, 主任研究員 (50416145)
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| Co-Investigator(Kenkyū-buntansha) |
SEKI Minoru 千葉大学, 工学(系)研究科(研究院), 教授 (80206622)
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| Project Period (FY) |
2010 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2012: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2010: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
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| Keywords | プラズマ加工 / マイクロ・ナノデバイス / 反応性イオンエッチング / ポリマー / ポリマー微細加工 / コロイダルリソグラフィー |
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| Research Abstract |
n this study, we have developed the novel reactive ion etching (RIE) method to control polymer surface morphology in the wide range from smooth surface to grassy surface. It is found that the morphology is closely related to micromask concentration. Then, micro/nano array structure was formed on the polymer surface by using a combination of the RIE and colloidal lithography (CL) to prepare ordered particle monolayer as etching mask. Finally, a nanocone array structure on a PMMA was applied to protein chip, and the structure was effective for protein detection because of its large surface area.
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