Development of optics for future EUV astronomy
| Project/Area Number |
22540248
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Astronomy
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| Research Institution | The University of Tokyo |
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Principal Investigator |
YOSHIKAWA Ichiro 東京大学, 大学院・理学系研究科, 准教授 (10311169)
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| Project Period (FY) |
2010 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2012: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2011: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2010: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
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| Keywords | EUV / 極端紫外線 / 多層膜反射鏡 / 紫外線天文学 / EUV天文学 / 星間風 / 惑星間空間 / 極端紫外光 |
|---|
| Research Abstract |
I have manufactured two multilayer mirrors. One has a pair of 40 Y２O３/Al layers and the other has a pair of 20 Mg/SiC layers. I concluded that (1) An Mg/SiC mirror has about twice higher reflectivity than that of Mo/Si, but (2) it decreases the performance under the atmosphere, (3) a Y2O3/Al multilayer mirror has higher reflectivity at 30.4nm than that of Mo/Si, furthermore (4) it can reduce the reflectivity at 58.4nm to one-fifth in comparison with Mo/Si pairs. The Y2O3/Al multilayer has enough capability to use space-borne instrument in the near-future.
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Report
(4 results)
Research Products
(13 results)
