| Project/Area Number |
22560025
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | University of the Ryukyus |
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Principal Investigator |
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| Project Period (FY) |
2010 – 2012
|
| Project Status |
Completed (Fiscal Year 2012)
|
| Budget Amount *help |
¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
Fiscal Year 2012: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2011: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2010: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
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| Keywords | 内部応力 / 電析薄膜 / 動的スケーリング / 金電析 / 潜伏時間 / 応力振動 / その場観察 / スケーリング / 活性化エネルギー / べき乗則 / ノイズ / 応力緩和 / パルス電析 / 緩和機構 / 電気めっき / 薄膜 |
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| Research Abstract |
In the framework of dynamic scaling theory, the internal stress deposited by a pulse current technique is found to be described by the relaxation in which process adatoms on the film surface move to reduce the grain boundary energy. In addition, using a concept of the quenched noise that acts as obstacles that impede the movement of the adatom, the order parameter becomes dependent on the content of additives and the internal stress is found to comprise two terms, one dependent on the additive content and the other independent of the additive content. In-situ observation of the time-dependent internal stress reveals the presence of incubation time in which no internal stress occurs and the oscillatory behavior of the internal stress that approaches a fixed value.
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