High speed deposition of zinc oxide film using atmospheric pressure glow discharge
| Project/Area Number |
22560113
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Kagawa University |
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Principal Investigator |
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| Project Period (FY) |
2010 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2012: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2011: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2010: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
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| Keywords | ナノ・マイクロ加工 / 大気圧低温プラズマ / 成膜方法 / 酸化亜鉛 / 大気圧プラズマ / 誘電体バリア放電 / グロー放電 / 透明導電性薄膜 / 大気圧CVD / 有機錯体材料 / ガス流れ / 大面積成膜 |
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| Research Abstract |
Transparent conductive thin films used for a liquid crystal display or a solar cell etc. have to fabricated in large area with low cost system. Therefore, I generated coldplasma under atmospheric pressure, and developed the deposition system of Zinc oxide films. For fabricating thin films uniformly in large area, slit width was expanded into 100 mm. The uniform films were fabricated. The subject remained about improvement in deposition rate.
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Report
(4 results)
Research Products
(42 results)
