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Development of analysis technique for ultra-shallow junction in next generation MOSFET by MEIS-TOF-ERDA

Research Project

Project/Area Number 22560295
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionOsaka University

Principal Investigator

ABO Satoshi  大阪大学, 極限量子科学研究センター, 助教 (60379310)

Co-Investigator(Kenkyū-buntansha) TAKAI Mikio  大阪大学, 極限量子科学研究センター, 教授 (90142306)
WAKAYA Fujio  大阪大学, 極限量子科学研究センター, 准教授 (60240454)
Project Period (FY) 2010 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2012: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2010: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Keywords組成分析 / 飛行時間計測 / 弾性反跳粒子検出法 / Time-of-Flight (TOF) / Elastic Recoil Detection Analysis (ERDA) / 中エネルギーイオンビーム / 軽元素分析 / イオンプローブ / ERDA(弾性反跳粒子計測法) / TOF(飛行時間計測) / 低エネルギーイオン注入 / トロイダル静電アナライザ / SSRM / TEA(トロイダル静電アナライザ) / SSRM(走査型拡がり抵抗顕微鏡)
Research Abstract

An elastic recoil detection analysis (ERDA) technique with a toroidal electrostatic analyzer (TEA) for an energy analysis and a time-of-flight (TOF) technique for a mass separation was developed for an analysis of the ultra shallow junction in shrunk semiconductor devices required in the international technology roadmap for semiconductors (ITRS). Three standard samples were measured with the developed medium energy ion scattering (MEIS)-TOF-ERDA system with high mass resolution and high count yield. The results indicate that the depth resolution required in the ITRS can be realized by the developed MEIS-TOF-ERDA.

Report

(4 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Annual Research Report
  • 2010 Annual Research Report
  • Research Products

    (19 results)

All 2012 2011 2010

All Journal Article (6 results) (of which Peer Reviewed: 6 results) Presentation (13 results)

  • [Journal Article] Active Dopant Profiling of Ultra Shallow Junction Annealed with Combination of Spike Lamp and Laser Annealing Processes using Scanning Spreading Resistance Microscopy2012

    • Author(s)
      Satoshi Abo, Naoya Ushigome, Hidenori Osae, Toshiaki Iwamatsu, Hidekazu Oda, Fujio Wakaya, Mikio Takai
    • Journal Title

      Proceedings of the 19th International Conference on Ion Implantation Technology (IIT 2012) AIP Conference Proceedings

      Volume: 1946 Pages: 164-166

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Time of flight elastic recoil detection analysis with toroidal electrostatic analyzer for ultra shallow dopant profiling2012

    • Author(s)
      Satoshi Abo, Hidemasa Horiuchi, Fujio Wakaya, Gabor Battistig, Tivadar Lohner, Mikio Takai
    • Journal Title

      Surface and Interface Analysis

      Volume: 44 Pages: 732-735

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Active Dopant Profiling of Ultra Shallow Junction Annealed with Combination of Spike Lamp and Laser Annealing Processes using Scanning Spreading Resistance Microscopy2012

    • Author(s)
      Satoshi Abo
    • Journal Title

      AIP Conference Proceedings

      Volume: 1496 Pages: 164-166

    • DOI

      10.1063/1.4766515

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Time of flight elastic recoil detection analysis with toroidal electrostatic analyzer for ultra shallow dopant profiling2012

    • Author(s)
      Satoshi Abo, Hidemasa Horiuchi, Fujio Wakaya, Gabor Battistig, Tivadar Lohnera, Mikio Takai
    • Journal Title

      Surface and Interface Analysis

      Volume: (On-line) Issue: 6 Pages: 732-735

    • DOI

      10.1002/sia.4878

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Local Resistance Profiling of Ultra Shallow Junction Annealed with Combination of Spike Lamp and Laser Annealing Processes using Scanning Spreading Resistance Microscope2010

    • Author(s)
      Satoshi Abo, Kazuhisa Nishikawa, Naoya Ushigome, Fujio Wakaya, Toshiaki Iwamatsu, Hidekazu Oda, Mikio Takai
    • Journal Title

      Proceedings of 18th International Conference on Ion Implantation Technology (IIT2010) AIP Conference Proceedings

      Volume: 1321 Pages: 229-232

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Local Resistance Profiling of Ultra Shallow Junction Annealed with Combination of Spike Lamp and Laser Annealing Processes using Scanning Spreading Resistance Microscope2010

    • Author(s)
      Satoshi Abo, Kazuhisa Nishikawa, Naoya Ushigome, Fujio Wakaya, Toshiaki Iwamatsu, Hidekazu Oda, Mikio Takai
    • Journal Title

      Proceedings of 18th International Conference on Ion Implantation Technology (IIT 2010)

      Pages: 229-232

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Presentation] 静電型分析器を用いたTOF-ERDA による極浅原子分布分析技術の開発2012

    • Author(s)
      李沛, 堀内英完, 阿保智, 若家冨士男, 高井幹夫
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学・松山大学
    • Related Report
      2012 Final Research Report
  • [Presentation] Active dopant profiling of ultra shallow junction annealed with combination of spike lamp and laser annealing processes using scanning spreading resistance microscopy2012

    • Author(s)
      Satoshi Abo, Naoya Ushigome, Hidenori Osae, Fujio Wakaya, Toshiaki Iwamatsu, Hidekazu Oda, Mikio Takai
    • Organizer
      19th International Conference on Ion Implantation Technology
    • Place of Presentation
      19th International Conference on Ion Implantation Technology
    • Related Report
      2012 Final Research Report
  • [Presentation] Active dopant profiling of ultra shallow junction annealed with combination of spike lamp and laser annealing processes using scanning spreading resistance microscopy2012

    • Author(s)
      Satoshi Abo
    • Organizer
      19th International Conference on Ion Implantation Technology
    • Place of Presentation
      Valladolid, Spain
    • Related Report
      2012 Annual Research Report
  • [Presentation] 静電型分析器を用いたTOF-ERDAによる極浅原子分布分析技術の開発2012

    • Author(s)
      李 沛
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛県松山市
    • Related Report
      2012 Annual Research Report
  • [Presentation] SSRMを用いた極浅接合の活性化不純物の深さ分布評価2012

    • Author(s)
      押 秀徳
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛県松山市
    • Related Report
      2012 Annual Research Report
  • [Presentation] Time of flight elastic recoil detection analysis with toroidal electrostatic analyzer for ultra shallow dopant profiling2011

    • Author(s)
      Satoshi Abo, Hidemasa Horiuchi, Fujio Wakaya, Gabor Battistig, Tivadar Lohner, Mikio Takai
    • Organizer
      8th International Symposium on Atomic Level Characterization for New Materials and Devices
    • Place of Presentation
      Seoul, Republic of Korea
    • Related Report
      2012 Final Research Report
  • [Presentation] Time of flight elastic recoil detection analysis with toroidal electrostatic analyzer for ultra shallow dopant profiling2011

    • Author(s)
      Satoshi Abo, Hidemasa Horiuchi, Fujio Wakaya, Gabor Battistig, Tivadar Lohnera, Mikio Takai
    • Organizer
      8th International Symposium on Atomic Level Characterizations for New Materials and Devices '11
    • Place of Presentation
      Seoul, Republic of Korea
    • Related Report
      2011 Annual Research Report
  • [Presentation] SSRMを用いたスパイクアニールとレーザアニールの組み合わせによる不純物活性化の比較2010

    • Author(s)
      牛込直弥, 西川和久, 阿保智, 若家冨士勇, 岩松俊明, 尾田秀一, 高井幹夫
    • Organizer
      第71回 応用物理学会学術講演会
    • Place of Presentation
      長崎大学
    • Year and Date
      2010-09-16
    • Related Report
      2010 Annual Research Report
  • [Presentation] TEAを用いたTOF-ERDAによる極浅原子分析法の開発研究2010

    • Author(s)
      堀内英完, 阿保智, 若家冨士男, 高井幹夫
    • Organizer
      第71回 応用物理学会学術講演会
    • Place of Presentation
      長崎大学
    • Year and Date
      2010-09-15
    • Related Report
      2010 Annual Research Report
  • [Presentation] Local Resistance Profiling of Ultra Shallow Junction Annealed with Combination of Spike Lamp and Laser Annealing Processes using Scanning Spreading Resistance Microscope2010

    • Author(s)
      Satoshi Abo, Kazuhisa Nishikawa, Naoya Ushigome, Fujio Wakaya, Toshiaki Iwamatsu, Hidekazu Oda, Mikio Takai
    • Organizer
      18th International Conference on Ion Implantation Technology (IIT 2010)
    • Place of Presentation
      京都大学
    • Year and Date
      2010-06-07
    • Related Report
      2010 Annual Research Report
  • [Presentation] TEA を用いた TOF-ERDA による極浅原子分析法の開発研究2010

    • Author(s)
      堀内英完, 阿保智, 若家冨士男, 高井幹夫
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学
    • Related Report
      2012 Final Research Report
  • [Presentation] SSRM を用いたスパイクアニールとレーザアニールの組み合わせによる不純物活性化の比較2010

    • Author(s)
      牛込直弥, 西川和久, 阿保智, 若家冨士男 , 岩松俊明 , 尾田秀一 , 高井幹夫
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学
    • Related Report
      2012 Final Research Report
  • [Presentation] Local Resistance Profiling of Ultra Shallow Junction Annealed with Combination of Spike Lamp and Laser Annealing Processes using Scanning Spreading Resistance Microscope2010

    • Author(s)
      Satoshi Abo, Kazuhisa Nishikawa, Naoya Ushigome, Fujio Wakaya, Toshiaki Iwamatsu, Hidekazu Oda, Mikio Takai
    • Organizer
      18th International Conference on Ion Implantation Technology
    • Place of Presentation
      Kyoto, Japan
    • Related Report
      2012 Final Research Report

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Published: 2010-08-23   Modified: 2019-07-29  

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