Enhancement of liquid cluster ion beam intensity for application in semiconductor industry

• Project/Area Number: 22560329
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: Kyoto University
• Principal Investigator: RYUTO Hiromichi 京都大学, 工学(系)研究科(研究院), 講師 (20392178)
• Co-Investigator(Kenkyū-buntansha): TAKAOKA H. Gikan 京都大学, 工学(系)研究科(研究院), 教授 (90135525) ; TAKEUCHI Mitsuaki 京都大学, 工学(系)研究科(研究院), 助教 (10552656)
• Project Period (FY): 2010 – 2012
• Project Status: Completed (Fiscal Year 2012)
• Budget Amount: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000); Fiscal Year 2012: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000); Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000); Fiscal Year 2010: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
• Keywords: 微細プロセス技術 / 液体クラスター / シリコン / アセトン / 半導体基板加工 / 酸化膜形成 / エタノール / 照射損傷 / 半導体加工 / クラスター

Research Abstract

The liquid cluster ion beam apparatus was modified to realize applications of the liquid cluster ion beam technique in the industry such as the semiconductor industry. An intense water cluster ion beam with a beam current density of approximately 3 μA/cm2was obtained. The sputtering yields of silicon and PMMA induced by water cluster ions were large. The modification of the apparatus enabled the usage of acetone as the cluster source material. An acetone cluster ion beam was produced without using helium as a support gas. The sputtering yield of silicon induced by the irradiation of an acetone cluster ion beam was large.

Research Products

• [Journal Article] Irradiation effects of ethanol cluster ion beam on mica surface (2013)
  • Author(s): H. Ryuto, Y. Ohmura, M. Takeuchi, G. H. Takaoka
  • Journal Title: Trans. MRS-J Volume: 38 Pages: 93-96
  • NAID: 130005004202
  • Peer Reviewed
• [Journal Article] Irradiation effects of water cluster ion beam on PMMA surface (2013)
  • Author(s): H. Ryuto, G. Ichihashi, M. Takeuchi, G. H. Takaoka
  • Journal Title: Vacuum Volume: 87 Pages: 119-122
  • Peer Reviewed
• [Journal Article] Irradiation Effects of Ethanol Cluster Ion Beam on Mica Surface (2013)
  • Author(s): H. Ryuto
  • Journal Title: Trans. Mat. Res. Soc. Japan Volume: 38 Pages: 93-96
  • NAID: 130005004202
  • Peer Reviewed
• [Journal Article] Surface irradiation and materials processing using polyatomic cluster ion beams (2012)
  • Author(s): G. H. Takaoka, H. Ryuto, M. Takeuchi
  • Journal Title: J. Mater. Res Volume: 27 Pages: 806-821
  • NAID: 120003988356
  • Peer Reviewed
• [Journal Article] Surface irradiation and materials processing using polyatomic cluster ion beams (2012)
  • Author(s): G.H.Takaoka
  • Journal Title: J.Mater.Res. Volume: 27 Issue: 5 Pages: 806-821
  • DOI: 10.1557/jmr.2011.426
  • NAID: 120003988356
  • Peer Reviewed
• [Journal Article] Micro-pattering of Si (100) surfaces by ethanol cluster ion beans (2011)
  • Author(s): G.H.Takaoka
  • Journal Title: Surface & Coatings Technology Volume: 206 Issue: 5 Pages: 869-873
  • DOI: 10.1016/j.surfcoat.2011.04.051
  • Peer Reviewed
• [Journal Article] Chemical erosion and sputtering of solid surfaces with liquid cluster ions (2011)
  • Author(s): G.H.Takaoka
  • Journal Title: Surface & Coatings Technology Volume: 206 Issue: 5 Pages: 845-848
  • DOI: 10.1016/j.surfcoat.2011.03.108
  • NAID: 120003573884
  • Peer Reviewed
• [Journal Article] Surface Processing by Polyatomic Cluster Ion Beams (2011)
  • Author(s): G.H.Takaoka
  • Journal Title: e-Journal of Surface Science and Nanotechnology Volume: 9 Pages: 168-172
  • DOI: 10.1380/ejssnt.2011.168
  • NAID: 130004439268
  • ISSN: 1348-0391
  • Peer Reviewed
• [Journal Article] Chemical Modification of Solid Surfaces at Nano-level by Water Cluster Ion Irradiation (2011)
  • Author(s): G.H.Takaoka
  • Journal Title: e-Journal of Surface Science and Nanotechnology Volume: 9 Pages: 163-167
  • DOI: 10.1380/ejssnt.2011.163
  • NAID: 130004439269
  • ISSN: 1348-0391
  • Peer Reviewed
• [Journal Article] Chemical modification of silicon rubber by oxygen cluster and monomerion beams (2010)
  • Author(s): H.Ryuto
  • Journal Title: Trans.MRS-J Volume: 35 Pages: 781-784
  • Peer Reviewed
• [Journal Article] High-rate sputtering of Si and SiO_2 with atomically flat surfaces by using ethanol cluster ion beams (2010)
  • Author(s): G.H.Takaoka
  • Journal Title: Trans.MRS-J Volume: 35 Pages: 777-780
  • Peer Reviewed
• [Journal Article] Interaction between ethanol cluster ion beam and silicon surface (2010)
  • Author(s): H.Ryuto
  • Journal Title: Vacuum Volume: 84 Pages: 1419-1422
  • Peer Reviewed
• [Journal Article] Low-temperature formation of silicon dioxide films by oxygen cluster ion beam assisted deposition (2010)
  • Author(s): H.Ryuto
  • Journal Title: Thin Solid Films Volume: 518
  • Peer Reviewed
• [Journal Article] Surface processing and modification of polymers by water cluster ion beam (2010)
  • Author(s): H.Ryuto
  • Journal Title: AIP CP1321, Ion Implantation Technology 2010 Pages: 310-313
  • Peer Reviewed
• [Journal Article] Fabrication of impregnated-electrode-type polyatomic ion source with ion is liquid (2010)
  • Author(s): M.Takeuchi
  • Journal Title: AIP CP1321, Ion Implantation Technology 2010 Pages: 456-459
  • Peer Reviewed
• [Journal Article] Application of liquid cluster ion beams in surface processing (2010)
  • Author(s): H.Ryuto
  • Journal Title: Proceedings of IPAC'10 Pages: 133-135
• [Journal Article] Carbon implantation by polyatomic ion source of organic liquids (2010)
  • Author(s): M.Takeuchi
  • Journal Title: Proceedings of IPAC'10 Pages: 136-138
• [Journal Article] 多原子分子イオンビームによるシリコン表面照射効果 (2010)
  • Author(s): 竹内光明
  • Journal Title: 信学技報IEICE Technical Report Volume: SDM2010-197 Pages: 69-72
  • NAID: 110008676031
• [Presentation] 水クラスターイオンビームのクラスターサイズ分析及び分離 (2013)
  • Author(s): 山口 英樹
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大学
• [Presentation] 高分子基板に対するアセトンクラスターイオンビームの照射効果 (2013)
  • Author(s): 角元 友樹
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大学
• [Presentation] 多原子分子クラスターイオンのHOPG及びマイカ表面への照射効果 (2013)
  • Author(s): 大村 祐貴
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大学
• [Presentation] 多原子分子クラスターイオンビームの固体表面に対する照射効果 (2012)
  • Author(s): 大村祐貴
  • Organizer: 第59回応用物理学会関係連合講演会
  • Place of Presentation: 東京
  • Year and Date: 2012-03-17
• [Presentation] Improved set-up to reveal cluster ion beam induced luminescence (2012)
  • Author(s): Francesco Musumeci
  • Organizer: 第59回応用物理学会関係連合講演会
  • Place of Presentation: 東京
  • Year and Date: 2012-03-16
• [Presentation] 水クラスターイオンとシリコン基板の表面反応 (2012)
  • Author(s): 市橋岳
  • Organizer: 第59回応用物理学会関係連合講演会
  • Place of Presentation: 東京
  • Year and Date: 2012-03-16
• [Presentation] Acetone cluster ion beam irradiation on solid surfaces (2012)
  • Author(s): H. Ryuto, Y. Kakumoto, S. Itozaki, M. Takeuchi, G. H. Takaoka
  • Organizer: 25th International Conference on Atomic Collisions in Solids
  • Place of Presentation: Kyoto
• [Presentation] Surface reaction between water cluster ion and silicon surface (2012)
  • Author(s): H. Ryuto, G. Ichihashi, M. Takeuchi, G. H. Takaoka
  • Organizer: 25th International Conference on Atomic Collisions in Solids
  • Place of Presentation: Kyoto
• [Presentation] Irradiation effects of ethanol cluster ion beam on mica surface (2012)
  • Author(s): H. Ryuto, Y. Ohmura, M. Takeuchi, G. H. Takaoka
  • Organizer: International Union of Material Research Societies-International Conference on Electronic Materials 2012
  • Place of Presentation: Yokohama
• [Presentation] 超音速自由噴流法で生成したアセトンクラスターイオンビームのビーム特性 (2012)
  • Author(s): 龍頭啓充、糸崎俊介、角元友樹、竹内光明、高岡義寛
  • Organizer: ナノ学会第10回大会
  • Place of Presentation: 大阪
• [Presentation] Acetone Cluster Ion Beam Irradiation on Solid Surfaces (2012)
  • Author(s): H. Ryuto
  • Organizer: 25th International Conference on Atomic Collisions in Solids
  • Place of Presentation: Kyoto
• [Presentation] Surface Reaction between Water Cluster Ion and Silicon Substrate (2012)
  • Author(s): H. Ryuto
  • Organizer: 25th International Conference on Atomic Collisions in Solids
  • Place of Presentation: Kyoto
• [Presentation] Irradiation Effects of Ethanol Cluster Ion Beam on Mica Surface (2012)
  • Author(s): H. Ryuto
  • Organizer: International Union of Material Research Societies - International Conference on Electronic Materials 2012
  • Place of Presentation: Yokohama
• [Presentation] 酸素クラスターイオンビーム援用蒸着法によるZnOx薄膜の作製 (2012)
  • Author(s): 福島 大貴
  • Organizer: 第73回応用物理学会学術講演会
  • Place of Presentation: 愛媛大学、松山大学
• [Presentation] 酸素モノマー・クラスターイオンビーム照射による高分子基板の表面改質 (2012)
  • Author(s): 辻中 諒
  • Organizer: 第73回応用物理学会学術講演会
  • Place of Presentation: 愛媛大学、松山大学
• [Presentation] アセトンクラスターイオンビームの固体表面照射効果 (2012)
  • Author(s): 角元 友樹
  • Organizer: 第73回応用物理学会学術講演会
  • Place of Presentation: 愛媛大学、松山大学
• [Presentation] 多原子分子クラスターイオンのHOPG表面照射効果 (2012)
  • Author(s): 大村 祐貴
  • Organizer: 第73回応用物理学会学術講演会
  • Place of Presentation: 愛媛大学、松山大学
• [Presentation] 超音速自由噴流法で生成したアセトンクラスターイオンビームのビーム特性 (2012)
  • Author(s): 龍頭 啓充
  • Organizer: ナノ学会第10回大会
  • Place of Presentation: 大阪大学
• [Presentation] Preliminary Results on Cluster Ion Beam Induced Luminescence (C. I. B. I. L.) (2012)
  • Author(s): Francesco Musumeci
  • Organizer: ナノ学会第10回大会
  • Place of Presentation: 大阪大学
• [Presentation] 水クラスターイオンビーム照射によるPMMA基板のマイクロパターニング (2011)
  • Author(s): 市橋岳
  • Organizer: 第72回応用物理学会学術講演会
  • Place of Presentation: 山形
  • Year and Date: 2011-09-02
• [Presentation] 多原子分子クラスターイオン照射痕のAFM観察2 (2011)
  • Author(s): 大村祐貴
  • Organizer: 第72回応用物理学会学術講演会
  • Place of Presentation: 山形
  • Year and Date: 2011-09-02
• [Presentation] 酸素イオンビーム照射によるポリイミド基板の表面改質 (2011)
  • Author(s): 古谷健悟
  • Organizer: 第72回応用物理学会学術講演会
  • Place of Presentation: 山形
  • Year and Date: 2011-09-01
• [Presentation] Temperature dependent irradiation effects of polyatomic cluster ion beam on silicon surface (2011)
  • Author(s): H.Ryuto
  • Organizer: The Eleventh International Symposium on Sputtering & Plasma Processes, ISSP 2011
  • Place of Presentation: 京都
  • Year and Date: 2011-07-07
• [Presentation] Irradiation effects of water cluster ion beam on PMMA surface (2011)
  • Author(s): H.Ryuto
  • Organizer: The Eleventh International Symposium on Sputtering & Plasma Processes, ISSP 2011
  • Place of Presentation: 京都
  • Year and Date: 2011-07-07
• [Presentation] アセトンクラスターの生成 (2011)
  • Author(s): 糸崎俊介
  • Organizer: 第58回応用物理学関連連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-25
• [Presentation] 多原子分子クラスターイオンのシリコン基板表面に対する照射効果の基板温度依存性 (2011)
  • Author(s): 向井寛
  • Organizer: 第58回応用物理学関連連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-25
• [Presentation] 水クラスターイオンビーム照射によるアクリル基板のスパッタリング (2011)
  • Author(s): 市橋岳
  • Organizer: 第58回応用物理学関連連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-25
• [Presentation] ポリイミド基板への酸素クラスターイオンビーム照射効果 (2011)
  • Author(s): 古谷健悟
  • Organizer: 第58回応用物理学関連連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-25
• [Presentation] 酸素クラスターイオンビーム援用蒸着法により作製したSiOx薄膜の表面分析 (2011)
  • Author(s): 福島大貴
  • Organizer: 第58回応用物理学関連連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-25
• [Presentation] H. Ryuto, H. Mukai, M. Takeuchi, G. H. Takaoka (2011)
  • Author(s): H. Ryuto, H. Mukai, M. Takeuchi, G. H. Takaoka
  • Organizer: The Eleventh International Symposium on Sputtering & Plasma Processes
  • Place of Presentation: Kyoto
• [Presentation] Irradiation effects of water cluster ion beam on PMMA surface (2011)
  • Author(s): H. Ryuto, G. Ichihashi, M. Takeuchi, G. H. Takaoka
  • Organizer: The Eleventh International Symposium on Sputtering & Plasma Processes
  • Place of Presentation: Kyoto
• [Presentation] シリコン表面へのエタノールクラスターイオン照射効果の基板温度依存性 (2011)
  • Author(s): 龍頭啓充、向井寛、大村祐貴、 竹内光明、高岡義寛
  • Organizer: ナノ学会第9回大会
  • Place of Presentation: 札幌
• [Presentation] エタノールクラスターを用いたシリコン基板表面加工 (2011)
  • Author(s): 龍頭啓充、向井寛、大村祐貴、 竹内光明、高岡義寛
  • Organizer: ナノ学会第9回大会
  • Place of Presentation: 札幌
• [Presentation] 多原子分子イオンビームによるシリコン表面照射効果 (2010)
  • Author(s): 竹内光明
  • Organizer: 電子情報通信学会12月度シリコン材料・デバイス(SDM)研究会
  • Place of Presentation: 京都大学(京都市)
  • Year and Date: 2010-12-17
• [Presentation] Chemical Modification of Solid Surfaces at Nano-level by Water Cluster Ion Irradiation (2010)
  • Author(s): G.H.Takaoka
  • Organizer: The 6th International Workshop on Nano-scale Spectroscopy and Nanotechnology
  • Place of Presentation: 神戸大学(神戸市)
  • Year and Date: 2010-10-27
• [Presentation] Surface Processing by Polyatomic Cluster Ion Beams (2010)
  • Author(s): G.H.Takaoka
  • Organizer: The 6th International Workshop on Nano-scale Spectroscopy and Nanotechnology
  • Place of Presentation: 神戸大学(神戸市)
  • Year and Date: 2010-10-26
• [Presentation] エタノールクラスターイオンビームのガラス表面への照射効果 (2010)
  • Author(s): 糸崎俊介
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-16
• [Presentation] 水クラスターイオンビームのアクリル基板への照射効果 (2010)
  • Author(s): 市橋岳
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-16
• [Presentation] シリコン基板に対するエタノールクラスターイオン照射効果の基板温度依存性 (2010)
  • Author(s): 向井寛
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-16
• [Presentation] Surface Processing and Modification of Polymers by Water Cluster Ion Beam (2010)
  • Author(s): H.Ryuto
  • Organizer: 18th International Conference on Ion Implantation Technology
  • Place of Presentation: 京都大学(京都市)
  • Year and Date: 2010-06-08
• [Presentation] Surface Modification of Silicone Rubber for Adhesion Pattering of Mesenchymal Stem Cells by Water Cluster Ion Beam (2010)
  • Author(s): P.Sommani
  • Organizer: 18th International Conference on Ion Implantation Technology
  • Place of Presentation: 京都大学(京都市)
  • Year and Date: 2010-06-08
• [Presentation] Polyatomic Ion Source with Ionic Liquid for Shallow Implantation (2010)
  • Author(s): M.Takeuchi
  • Organizer: 18th International Conference on Ion Implantation Technology
  • Place of Presentation: 京都大学(京都市)
  • Year and Date: 2010-06-07
• [Presentation] Application of Liquid Cluster Ion Beams in Surface Processing (2010)
  • Author(s): H.Ryuto
  • Organizer: 1st International Particle Accelerator Conference
  • Place of Presentation: 京都国際会館(京都市)
  • Year and Date: 2010-05-24
• [Presentation] Carbon Implantation by Polyatomic Ion Source of Organic Liquids (2010)
  • Author(s): M.Takeuchi
  • Organizer: 1st International Particle Accelerator Conference
  • Place of Presentation: 京都国際会館(京都市)
  • Year and Date: 2010-05-24
• [Presentation] 水クラスターイオンの有機材料に対する表面照射効果 (2010)
  • Author(s): 龍頭啓充
  • Organizer: ナノ学会第8回大会
  • Place of Presentation: 自然科学研究機構(岡崎市)
  • Year and Date: 2010-05-14