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Development of GaN pH sensor for the surveillance of cell culture

Research Project

Project/Area Number 22560332
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electron device/Electronic equipment
Research InstitutionThe University of Tokushima

Principal Investigator

AO Jin-ping  徳島大学, 大学院・ソシオテクノサイエンス研究部, 准教授 (40380109)

Project Period (FY) 2010 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2012: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2011: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2010: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
KeywordspHセンサ / 窒化ガリウム / AlGaN/GaN へテロ構造 / GaN MOSFET / 耐熱電極 / pHセンサ / AlGaN/GaN HFET / 高温動作 / AlGaN/GaNヘテロ構造 / 耐環境 / 細胞培養 / 耐環境電極
Research Abstract

The goal of this research project is the development of pH sensor based on AlGaN/GaN heterostructure for the surveillance of cell culture. TiN Schottky electrode which could stand high temperature was developed using reactive sputtering. By optimizing the fabrication process of GaN MOSFET on AlGaN/GaN heterostructure which can be used as pH sensor, device with electron mobility of about 160 cm2/Vs was obtained. Through the research steps of design, fabrication, implementation and device evaluation, proper operation up to 80・C was confirmed. In the whole temperature ranges, near ideal sensitivity values were achieved.

Report

(4 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Annual Research Report
  • 2010 Annual Research Report
  • Research Products

    (31 results)

All 2013 2012 2011 2010

All Journal Article (6 results) (of which Peer Reviewed: 6 results) Presentation (25 results) (of which Invited: 1 results)

  • [Journal Article] Thermally stable TiN Schottky contact on AlGaN/GaN heterostructure2013

    • Author(s)
      Jin-Ping Ao, Yoshiki Naoi, Yasuo Ohno
    • Journal Title

      Vacuum

      Volume: vol. 87, No. 1 Pages: 150-154

    • DOI

      10.1016/j.vacuum.2012.02.038

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Influence of Dry Recess Process on Enhancement-Mode GaN Metal-Oxide-Semiconductor Field-Effect Transistors2013

    • Author(s)
      Qingpeng Wang, Kentaro Tamai, Takahiro Miyashita, Shin-ichi Motoyama, Dejun Wang, Jin-Ping Ao, and Yasuo Ohno
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: vol. 52, No.1 Issue: 1S Pages: 1-5

    • DOI

      10.7567/jjap.52.01ag02

    • NAID

      210000141781

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Design Fabrication and Characterization of GaN MOSFET (in Chinese)2012

    • Author(s)
      王青鵬, 江〓, 敖金平, 王徳君
    • Journal Title

      Power Electronics

      Volume: vol. 46, No. 12 Pages: 81-83

    • URL

      http://www.dldzjs.com/

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Design Fabrication and Characterization of GaN MOSFET (in Chinese)2012

    • Author(s)
      Qingpeng Wang
    • Journal Title

      Power Electronics

      Volume: 46 Pages: 81-83

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] GaN MOSFET with a gate SiO2insulator deposited by silane-basedplasma-enhanced chemical vapor deposition2011

    • Author(s)
      Jin-Ping Ao, Katsutoshi Nakatani, Yuji Sogawa, Shiro Akamatsu, Young Hyun Kim, Takahiro Miyashita, Shin-ichi Motoyama, and Yasuo Ohno
    • Journal Title

      Phys. Status Solidi C

      Volume: vol. 8, No. 2 Issue: 2 Pages: 457-460

    • DOI

      10.1002/pssc.201000489

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] GaN MOSFET with a gate SiO_2 insulator deposited by silane-based plasma-enhanced chemical vapor deposition2011

    • Author(s)
      Jin-Ping Ao, et al
    • Journal Title

      Phys.Status Solidi C

      Volume: 8 Pages: 457-460

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Presentation] AlGaN/GaNヘテロ構造を用いたpHセンサの温度依存性2013

    • Author(s)
      新潟 一宇
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学(京都府)
    • Year and Date
      2013-09-17
    • Related Report
      2012 Final Research Report
  • [Presentation] Oxide Thickness Dependency on Threshold Voltage of GaN MOSFETs on AlGaN/GaN Heterostructure2013

    • Author(s)
      Qingpeng Wang
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Year and Date
      2013-03-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Field Isolation of GaN MOSFET by Boron Ion Implantation2013

    • Author(s)
      Ying Jiang
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Year and Date
      2013-03-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Device Isolation for GaN MOSFETs With Boron Ion Implantation2013

    • Author(s)
      Ying Jiang
    • Organizer
      5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials
    • Place of Presentation
      名古屋大学(愛知県)
    • Year and Date
      2013-01-28
    • Related Report
      2012 Final Research Report
  • [Presentation] Evaluation of a Gate-First process for AlGaN/GaN HFETs2013

    • Author(s)
      Liuan Li
    • Organizer
      5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials
    • Place of Presentation
      名古屋大学(愛知県)
    • Year and Date
      2013-01-28
    • Related Report
      2012 Final Research Report
  • [Presentation] Device Isolation for GaN MOSFETs With Boron Ion Implantation2013

    • Author(s)
      Ying Jiang
    • Organizer
      5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials
    • Place of Presentation
      名古屋大学(愛知県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Evaluation of a Gate-First Process for AlGaN/GaN HFETs2013

    • Author(s)
      Liuan Li
    • Organizer
      5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials
    • Place of Presentation
      名古屋大学(愛知県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Field Isolation of GaN MOSFET by Boron Ion Implantation2013

    • Author(s)
      Ying Jiang
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Oxide Thickness Dependency on Threshold Voltage of GaN MOSFETs on AlGaN/GaN Heterostructure2013

    • Author(s)
      Qingpeng Wang
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Synthesis and Application of Metal Nitrides as Schottky Electrodes for Gallium Nitride Electron Devices2012

    • Author(s)
      Jin-Ping Ao
    • Organizer
      the first international conference on emerging advanced nanomaterials
    • Place of Presentation
      Mercure Hotel, Brisbane (Australia)
    • Year and Date
      2012-10-22
    • Related Report
      2012 Final Research Report
  • [Presentation] GaN MOSFET with Boron Trichloride-Based Dry Recess Process2012

    • Author(s)
      Ying Jiang
    • Organizer
      11th Asia Pacific Conference on Plasma Science and Technology and 25th Symposium on Plasma Science for Materials
    • Place of Presentation
      京都大学(京都府)
    • Year and Date
      2012-10-02
    • Related Report
      2012 Final Research Report
  • [Presentation] GaNデバイスにおけるゲート・ファースト・プロセスの検討2012

    • Author(s)
      白石孝之
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学、松山大学(愛媛県)
    • Year and Date
      2012-09-11
    • Related Report
      2012 Final Research Report
  • [Presentation] AlGaN/GaN MISHFETチャネル電子移動度の測定2012

    • Author(s)
      玉井健太郎
    • Organizer
      電子情報通信学会電子デバイス研究会
    • Place of Presentation
      福井大学(福井県)
    • Year and Date
      2012-07-26
    • Related Report
      2012 Final Research Report
  • [Presentation] GaN MOSFET 電気特性へのチャネルリセスエッチングの影響2012

    • Author(s)
      玉井健太郎
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-17
    • Related Report
      2012 Final Research Report
  • [Presentation] Characterization of GaN MOSFETs on AlGaN/GaN Heterostructure2012

    • Author(s)
      Qingpeng Wang
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-17
    • Related Report
      2012 Final Research Report
  • [Presentation] GaN MOSFET電気特性へのチャネルリセスエッチングの影響2012

    • Author(s)
      玉井健太郎, et al
    • Organizer
      2012年春季第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-17
    • Related Report
      2011 Annual Research Report
  • [Presentation] Characterization of GaN MOSFETs on AlGaN/GaN Heterostructure2012

    • Author(s)
      Qingpeng Wang, et al
    • Organizer
      2012年春季第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-17
    • Related Report
      2011 Annual Research Report
  • [Presentation] Influence of Dry Recess Process on Enhancement-mod GaN MOSFET2012

    • Author(s)
      Qingpeng Wang
    • Organizer
      4th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials
    • Place of Presentation
      中部大学(愛知県)
    • Year and Date
      2012-03-07
    • Related Report
      2012 Final Research Report 2011 Annual Research Report
  • [Presentation] GaN MOSFET with Boron Trichloride-Based Dry Recess Process2012

    • Author(s)
      Ying Jiang
    • Organizer
      11th Asia Pacific Conference on Plasma Science and Technology and 25th Symposium on Plasma Science for Materials
    • Place of Presentation
      京都大学桂キャンパス(京都府)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Synthesis and Application of Metal Nitrides as Schottky Electrodes for Gallium Nitride Electron Devices2012

    • Author(s)
      Jin-Ping Ao
    • Organizer
      the first international conference on emerging advanced nanomaterials
    • Place of Presentation
      Mercure Hotel, Brisbane(Australia)
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] AlGaN/GaN MISHFETチャネル電子移動度の測定2012

    • Author(s)
      玉井健太郎
    • Organizer
      電子情報通信学会電子デバイス研究会
    • Place of Presentation
      福井大学(福井県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] GaNデバイスにおけるゲート・ファースト・プロセスの検討2012

    • Author(s)
      白石孝之
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学、松山大学(愛媛県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Thermally Stable TiN Schottky Contact on AlGaN/GaN Heterostructure2011

    • Author(s)
      Jin-Ping Ao
    • Organizer
      The 11thInternational Symposium on Sputtering and Plasma Processes
    • Place of Presentation
      京都リサーチパーク(京都府)
    • Year and Date
      2011-07-08
    • Related Report
      2012 Final Research Report
  • [Presentation] Thermally Stable TiN Schottky Contact on AlGaN/GaN Heterostructure2011

    • Author(s)
      Jin-Ping Ao, et al
    • Organizer
      The 11th International Symposium on Sputtering & Plasma Processes
    • Place of Presentation
      京都リサーチパーク(京都府)
    • Year and Date
      2011-07-08
    • Related Report
      2011 Annual Research Report
  • [Presentation] Thermally Stable TiN Schottky Contact on AlGaN/GaN Heterostructure2010

    • Author(s)
      Jin-Ping Ao, et al.
    • Organizer
      The 11^<th> International Symposium on Sputtering and Plasma Processes
    • Place of Presentation
      Kyoto Research Park, Kyoto, Japan
    • Related Report
      2010 Annual Research Report

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Published: 2010-08-23   Modified: 2019-07-29  

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