Development of Magnesium Silicide based Thermoelectric Materials by nano-microstructural control processing

• Project/Area Number: 22560738
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Material processing/treatments
• Research Institution: Osaka Municipal Technical Research Institute
• Principal Investigator: TANI Junichi 地方独立行政法人大阪市立工業研究所, 研究員 (20416324)
• Project Period (FY): 2010 – 2012
• Project Status: Completed (Fiscal Year 2012)
• Budget Amount: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000); Fiscal Year 2012: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000); Fiscal Year 2011: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2010: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
• Keywords: マグネシウムシリサイド / 材料加工 / 処理 / 廃熱利用 / 半導体物性 / ナノ材料 / 微細組織 / 熱電変換材料 / 第一原理計算 / 材料加工・処理

Research Abstract

In this study, the microstructure of magnesium silicide (Mg_2Si) based thermoelectric materials was successfully controlled at the nanolevel by using three new processing technologies: composites fabrication using reduction reaction method with oxides, thin film fabrication by sputtering method, and surface modification by laser irradiation.

Research Products

• [Journal Article] Fabrication and thermoelectric properties of Mg_2Si-based composites using reduction reaction with additives (2013)
  • Author(s): J. Tani and H. Kido
  • Journal Title: Intermetallics Volume: 32 Pages: 72-80
  • Peer Reviewed
• [Journal Article] Structural and Electrical Properties of Mg_2Si Thin Films Fabricated by Radio-Frequency Magnetron Sputtering Deposition (2013)
  • Author(s): J. Tani and H. Kido
  • Volume: 1490
  • Peer Reviewed
• [Journal Article] マグネシウムシリサイド熱電変換材料の開発 (2013)
  • Author(s): 谷淳一
  • Journal Title: 科学と工業 Volume: 87
  • NAID: 40019744556
• [Journal Article] Fabrication and thermoelectric properties of Mg2Si-based composites using reduction reaction with additives (2013)
  • Author(s): J. Tani and H. Kido
  • Journal Title: Intermetallics Volume: 32 Pages: 72-80
  • DOI: 10.1016/j.intermet.2012.08.026
  • Peer Reviewed
• [Journal Article] Structural and Electrical Properties of Mg2Si Thin Films Fabricated by Radio-Frequency Magnetron Sputtering Deposition (2013)
  • Author(s): J. Tani and H. Kido
  • Journal Title: Mater. Res. Soc. Symp. Proc. Volume: 1490 Pages: 229-234
  • DOI: 10.1557/opl.2012.1558
  • Peer Reviewed
• [Journal Article] Impurity doping into Mg_2Sn (2012)
  • Author(s): J. Tani and H. Kido
  • Journal Title: A first-principles study, Physica B: Condensed Matter Volume: 407 Pages: 3493-3498
  • Peer Reviewed
• [Journal Article] Impurity doping into Mg2Sn: A first-principles study (2012)
  • Author(s): J. Tani and H. Kido
  • Journal Title: Physica B: Condensed Matter Volume: 407 Issue: 17 Pages: 3493-3498
  • DOI: 10.1016/j.physb.2012.05.008
  • Peer Reviewed
• [Journal Article] Thermoelectric properties and oxidation behaviour of Magnesium Silicide, IOP Conference Series (2011)
  • Author(s): J. Tani, M. Takahashi, and H. Kido
  • Journal Title: Materials Science and Engineering Volume: 18 Pages: 142013-142013
  • Peer Reviewed
• [Journal Article] First-principles calculations of the structural and elastic properties of OsSi_2 at high pressure (2011)
  • Author(s): J. Tani, M. Takahashi, and H. Kido
  • Journal Title: Computational Materials Science Volume: 50 Pages: 2009-2013
  • Peer Reviewed
• [Journal Article] Thermoelectric properties and oxidation behaviour of Magnesium Silicide (2011)
  • Author(s): J.Tani, M.Takahashi, H.Kido
  • Journal Title: IOP Conference Series : Materials Science and Engineering Volume: 18 Issue: 14 Pages: 142013-142013
  • DOI: 10.1088/1757-899x/18/14/142013
  • Peer Reviewed
• [Journal Article] Lattice dynamics and elastic properties of Mg_3As_2 and Mg_3Sb_2 compounds form first-principles calculations (2010)
  • Author(s): J. Tani, M. Takahashi, and H. Kido
  • Journal Title: Physica B Volume: 405 Pages: 4219-4225
  • Peer Reviewed
• [Journal Article] Thermoelectric properties and oxidation behaviour of Magnesium Silicide
  • Author(s): J.Tani, M.Takahashi, H.Kido
  • Journal Title: IOP Conference Series : Materials Science and Engineering Volume: (in press)(掲載確定)
  • Peer Reviewed
• [Presentation] RF マグネトロンスパッタ法によるMg_2Si 薄膜の作製と特性評価 (2013)
  • Author(s): 谷淳一、木戸博康
  • Organizer: 日本セラミックス協会2013年年会
  • Place of Presentation: 東京工業大学(東京都)
  • Year and Date: 2013-03-17
• [Presentation] Structural and Electrical Properties of Mg-Si Thin Films Fabricated by RF Magnetron Sputtering Deposition (2012)
  • Author(s): J. Tani and H. Kido
  • Organizer: 2012 MRS Fall meetings & Exhibit
  • Place of Presentation: Hynes Convention Center(米国、ボストン市)
  • Year and Date: 2012-11-27
• [Presentation] RF マグネトロンスパッタ法によるマグネシウムシリサイド薄膜の微細組織制御 (2012)
  • Author(s): 谷淳一、木戸博康
  • Organizer: 第56回日本学術会議材料工学連合講演会
  • Place of Presentation: 京都テルサ(京都市)
  • Year and Date: 2012-10-30
• [Presentation] RF マグネトロンスパッタ法によるMg_2Si 薄膜の作製と電気的特性 (2012)
  • Author(s): 谷淳一、木戸博康
  • Organizer: 2012年春季第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学
  • Year and Date: 2012-03-22
• [Presentation] RFマグネトロンスパッタ法によるMg_2Si薄膜の作製と電気的特性 (2012)
  • Author(s): 谷淳一、木戸博康
  • Organizer: 2012年春季第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学
  • Year and Date: 2012-03-22
• [Presentation] 酸化物還元法およびパルス通電焼結法によるマグネシウムシリサイド系熱電複合材料の作製と熱電特性 (2011)
  • Author(s): 谷淳一
  • Organizer: 粉体粉末冶金協会 平成23 年度秋季大会
  • Place of Presentation: 大阪大学コンベンションセンター(吹田市)
  • Year and Date: 2011-10-27
• [Presentation] 酸化物還元法およびパルス通電焼結法によるマグネシウムシリサイド系熱電複合材料の作製と熱電特性 (2011)
  • Author(s): 谷淳一
  • Organizer: 粉体粉末冶金協会平成23年度秋季大会
  • Place of Presentation: 大阪大学コンベンションセンター
  • Year and Date: 2011-10-27
• [Presentation] 酸化物還元法によるマグネシウムシリサイド系熱電複合材料の作製と熱電特性 (2011)
  • Author(s): 谷淳一、高橋雅也、木戸博康
  • Organizer: 日本セラミックス協会 2011年年会
  • Place of Presentation: 静岡大学(浜松キャンパス)(浜松市)
  • Year and Date: 2011-03-18
• [Presentation] 酸化物還元法によるマグネシウムシリサイド系熱電複合材料の作製と熱電特性 (2011)
  • Author(s): 谷淳一、高橋雅也、木戸博康
  • Organizer: 日本セラミックス協会 2011年年会
  • Place of Presentation: 静岡大学(浜松市)
  • Year and Date: 2011-03-18
• [Presentation] Thermoelectric properties and oxidation behaviour of Magnesium Silicide (2010)
  • Author(s): J. Tani, M. Takahashi, and H. Kido
  • Organizer: 3^<,rd> International Congress on Ceramics (ICC3)
  • Place of Presentation: 大阪国際会議場(グランキューブ大阪)(大阪市)
  • Year and Date: 2010-11-16
• [Presentation] Thermoelectric properties and oxidation behaviour of Magnesium Silicide (2010)
  • Author(s): J.Tani, M.Takahashi, H.Kido
  • Organizer: 3^<rd> International Congress on Ceramics (ICC3)
  • Place of Presentation: 大阪国際会議場(大阪市)
  • Year and Date: 2010-11-16
• [Presentation] RFマグネトロンスパッタ法によるマグネシウムシリサイド薄膜の微細組織制御
  • Author(s): 谷淳一、木戸博康
  • Organizer: 第56回日本学術会議材料工学連合講演会
  • Place of Presentation: 京都テルサ(京都市）
• [Presentation] Structural and Electrical Properties of Mg-Si Thin Films Fabricated by RF Magnetron Sputtering Deposition
  • Author(s): J. Tani and H. Kido
  • Organizer: 2012 MRS Fall meetings & Exhibit
  • Place of Presentation: Hynes Convention Center（米国、ボストン市）
• [Presentation] RFマグネトロンスパッタ法によるMg2Si薄膜の作製と特性評価
  • Author(s): 谷淳一、木戸博康
  • Organizer: 日本セラミックス協会2013年年会
  • Place of Presentation: 東京工業大学（東京都）