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Development of dry-type off-gas treatment technology of exhaust gases from the semiconductor industry for fluorine recycling

Research Project

Project/Area Number 22560813
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Recycling engineering
Research InstitutionNagoya Institute of Technology

Principal Investigator

YASUI Shinji  名古屋工業大学, 工学研究科, 准教授 (30371561)

Project Period (FY) 2010 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2012: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2011: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2010: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Keywordsフッ素 / 再資源化 / PFC / 気固反応 / 排ガス処理 / フッ素リサイクル / フロン / 半導体排ガス / フッ化カルシウム / 乾式 / 蛍石 / 環境技術 / 化学工学 / ケイフッ化ナトリウム / モノシラン
Research Abstract

Fluorocarbons and perfluoro compounds (PFCs) contribute to global warming and are used in large quantities in the semiconductor industry, which must reduce the emission of these gases to the atmosphere to achieve the requirements of the Kyoto Protocol. We have been developing a new dry-type off-gas treatment system for recycling fluorine from perfluoro compounds present in off-gases from the semiconductor industry. The feature of this system is to absorb the fluorine compounds in the exhaust gases from the decomposition furnace by using two types of solid absorbents: the calcium carbonate in the upper layer absorbs HF and converts it to CaF2, and the sodium bicarbonate in the lower layer absorbs HF and SiF4 and converts them to Na2SiF6. In this research, the fluorine compound adsorption properties of both the solid adsorbents-calcium carbonate and the sodium compound-for the optimal design of the fixation furnace are investigated. An analysis of the gas-solid reaction rate was performed from the experimental results of the breakthrough curve by using a fixed-bed reaction model, and the reaction rate constants and adsorption capacity were obtained for achieving an optimal process design.

Report

(4 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Annual Research Report
  • 2010 Annual Research Report
  • Research Products

    (15 results)

All 2012 2011 2010 Other

All Journal Article (4 results) (of which Peer Reviewed: 2 results) Presentation (6 results) Remarks (3 results) Patent(Industrial Property Rights) (2 results)

  • [Journal Article] Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility2012

    • Author(s)
      S. Yasui, T. Sho jo, G. Inoue, K. Koike, A. Takeuchi and Y. Iwasa
    • Journal Title

      International Journal of Chemical Engineering

      Volume: Vol. 2012 Pages: 9-9

    • Related Report
      2012 Final Research Report
  • [Journal Article] Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility2012

    • Author(s)
      Shinji Yasui
    • Journal Title

      International Journal of Chemical Engineering

      Volume: Vol. 2012 Pages: 1-9

    • DOI

      10.1155/2012/329419

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Dry-type off-gas treatment technology of exhaust gases from the semiconductor industry for fluorine recycling2011

    • Author(s)
      S.Yasui, S.Yamaji, T.Shojo, G.Inoue, K.Koike, A.Takeuchi, Y.Iwasa
    • Journal Title

      Proc.2011 AIChE Annual Meeting

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Dry-type off-gas treatment technology of exhaust gases from the semiconductor industry for fluorine recycling

    • Author(s)
      S. Yasui, S. Yama j i, T. Shojo, G. Inoue, K. Koike, A. Takeuchi and Y. Iwasa
    • Journal Title

      Proc. 2011 AIChE Annual Meeting

    • Related Report
      2012 Final Research Report
  • [Presentation] ナトリウム系吸収材による半導体排ガスの乾式吸収特性2011

    • Author(s)
      山路峻平, 安井晋示, 荘所正, 井上吾一, 小池国彦, 竹内章浩, 岩佐慶夫
    • Organizer
      化学工学会第43回秋季大会
    • Place of Presentation
      名古屋工業大学
    • Year and Date
      2011-09-15
    • Related Report
      2011 Annual Research Report
  • [Presentation] フッ素リサイクルに向けた半導体クリーニングガスの乾式吸収特性2011

    • Author(s)
      山路峻平、安井晋示、荘所正、井上吾一、小池国彦、竹内章浩
    • Organizer
      化学工学会第76年会
    • Place of Presentation
      東京農工大学
    • Year and Date
      2011-03-23
    • Related Report
      2010 Annual Research Report
  • [Presentation] フッ素リサイクルに向けた半導体クリーニングガスの乾式吸収特性2011

    • Author(s)
      山路峻平,安井晋示,荘所正,井上吾一,小池国彦,竹内章浩
    • Organizer
      化学工学会第76年会0205
    • Related Report
      2012 Final Research Report
  • [Presentation] ナトリウム系吸収材による半導体排ガスの乾式吸収特性2011

    • Author(s)
      山路峻平,安井晋示,荘所正,井上吾一,小池国彦,竹内章浩,岩佐慶夫
    • Organizer
      化学工学会第43回秋季大会,T302
    • Place of Presentation
      名工大
    • Related Report
      2012 Final Research Report
  • [Presentation] Dry-type off-gas treatment technology of exhaust gases from the semiconductor industry for fluorine recycling2011

    • Author(s)
      S. Yasui, S. Yama j i, T. Shojo, G. Inoue, K. Koike, A. Takeuchi and Y. Iwasa
    • Organizer
      2011 AIChE Annual Meeting Paper.482a
    • Place of Presentation
      Minneapolis
    • Related Report
      2012 Final Research Report
  • [Presentation] HFC分解ガスと粒状炭酸カルシウムとの低塩気固反応における速度解析2010

    • Author(s)
      内海友佑、安井晋示、今井勉
    • Organizer
      化学工学会「2010秋の大会」
    • Place of Presentation
      同志社大学
    • Year and Date
      2010-09-08
    • Related Report
      2010 Annual Research Report
  • [Remarks]

    • URL

      http://yasui-lab.web.nitech.ac.jp/

    • Related Report
      2012 Final Research Report
  • [Remarks]

    • URL

      http://yasui-lab.web.nitech.ac.jp/

    • Related Report
      2011 Annual Research Report
  • [Remarks]

    • URL

      http://yasui-lab.web.nitech.ac.jp/

    • Related Report
      2010 Annual Research Report
  • [Patent(Industrial Property Rights)] 排ガス処理装置及び排ガス処理方法2011

    • Inventor(s)
      小池国彦,井上吾一,荘所正,竹内章浩,安井晋示
    • Industrial Property Rights Holder
      岩谷産業株式会社,中部電力
    • Industrial Property Number
      2011-085291
    • Filing Date
      2011-04-07
    • Related Report
      2012 Final Research Report
  • [Patent(Industrial Property Rights)] 排ガス処理装置及び排ガス処理方法2011

    • Inventor(s)
      小池国彦, 井上吾一, 荘所正, 竹内章浩, 安井晋示
    • Industrial Property Rights Holder
      岩谷産業株式会社, 中部電力株式会社
    • Industrial Property Number
      2011-085291
    • Filing Date
      2011-04-07
    • Related Report
      2011 Annual Research Report

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Published: 2010-08-23   Modified: 2019-07-29  

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