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Crystal structure change in CrN by atom substitution; Factor elucidation and preparation of new super hard material

Research Project

Project/Area Number 22686069
Research Category

Grant-in-Aid for Young Scientists (A)

Allocation TypeSingle-year Grants
Research Field Material processing/treatments
Research InstitutionNagaoka University of Technology

Principal Investigator

SUZUKI Tsuneo  長岡技術科学大学, 工学研究科, 助教 (00313560)

Project Period (FY) 2010 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥25,480,000 (Direct Cost: ¥19,600,000、Indirect Cost: ¥5,880,000)
Fiscal Year 2012: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2011: ¥11,570,000 (Direct Cost: ¥8,900,000、Indirect Cost: ¥2,670,000)
Fiscal Year 2010: ¥12,220,000 (Direct Cost: ¥9,400,000、Indirect Cost: ¥2,820,000)
Keywords硬質薄膜 / パルスレーザー堆積法 / 遷移金属窒化物 / 酸窒化クロム / 超高真空 / エピタキシャル成長 / 酸化挙動 / 精密酸素量制御 / レーザーアブレーション / 硬質材料 / 薄膜 / 固溶硬化 / ナノコンポジット
Research Abstract

Hardening of coated thin films on cutting tools can increase an efficiency of cutting process. We have developed new material. The new material Cr(N,0), where O atoms are substituted for N atoms in CrN lattice, showed high hardness and superior oxidation resistance. It was found that the crystal structure kept NaC1 type in spite of O atom substitution, since vacancies in Cr site were introduced with increasing oxygen content. Also, Cr(N,0) thin films with large crystalline size were successfully prepared on MgO single crystal substrate. These thin films revealed the oxygen substitution clear, and cause of high oxidation resistance.

Report

(4 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Annual Research Report
  • 2010 Annual Research Report
  • Research Products

    (36 results)

All 2013 2012 2011 2010 Other

All Journal Article (12 results) (of which Peer Reviewed: 12 results) Presentation (24 results)

  • [Journal Article] Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition2013

    • Author(s)
      Kazuma Suzuki, Toshiyuki Endo, Teruhisa Fukushima, Aoi Sato, Tsuneo Suzuki, Tadachika Nakayama, Hisayuki Suematsu and Koichi Niihara
    • Journal Title

      Material Transactions

      Volume: 54[7]

    • NAID

      10031183658

    • URL

      http://matjourna1.org/index.php?mid=jindex&stage=j1ist1&jid=MATERTRANS

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition2013

    • Author(s)
      Kazuma Suzuki
    • Journal Title

      Material Transactions

      Volume: 54

    • NAID

      10031183658

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Preparation of Compositionally Gradient Cr-Al-N-O Thin Films by Pulsed Laser Deposition2012

    • Author(s)
      鈴木常生,藤ノ木和哉,浅見廣樹,平井誠,湯之上隆,末松久幸,八井 浄
    • Journal Title

      Journal of the Japan Institute of Metals and Materials

      Volume: 76 Issue: 6 Pages: 391-396

    • DOI

      10.2320/jinstmet.76.391

    • NAID

      10030631028

    • ISSN
      0021-4876, 1880-6880, 2433-7501
    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] パルスレーザー堆積法による傾斜組成Cr-Al-N-O薄膜の作製2012

    • Author(s)
      鈴木常生, ほか
    • Journal Title

      日本金属学会誌

      Volume: 76(未定)

    • NAID

      10030631028

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Preparation of Cr(N,0) thin films by RF reactive unbalanced magnetron sputtering2011

    • Author(s)
      Jun Shirahata, Tetsutaro Ohori, Hiroki Asami, Tsuneo Suzuki, Tadachika Nakayama, Hisayuki Suematsu, Yoshiharu Nakajima, Koichi Niihara
    • Journal Title

      Thin Solid Films

      Volume: 519[11] Pages: 3497-3500

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Mechanical Properties and Microstructures of Silicon Doped Chromium Oxynitride Thin Films2011

    • Author(s)
      白幡淳,佐藤蒼生,鈴木和真,大堀鉄太郎,浅見廣樹,鈴木常生,中山忠親,末松久幸,新原晧一
    • Journal Title

      Journal of the Japan Institute of Metals and Materials

      Volume: 75 Issue: 2 Pages: 97-103

    • DOI

      10.2320/jinstmet.75.97

    • NAID

      130004456201

    • ISSN
      0021-4876, 1880-6880, 2433-7501
    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Fourier-Transform Infrared Absorption Spectroscopy of Chromium Nitride Thin Film2011

    • Author(s)
      Jun Shirahata, Tetsutaro Ohori, Hiroki Asami, Tsuneo Suzuki, Tadachika Nakayama, Hisayuki Suematsu and Koichi Niihara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 50[1]

    • NAID

      210000138317

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Preparation and Characterization of Cr-Zn-N-0 Thin Films deposited by Pulsed Laser Deposition2011

    • Author(s)
      Tsuneo Suzuki, Fumiya Sekiguchi, Jun Shirahata, Hiroki Asami, Tadachika Nakayama, Hisayuki Suematsu and Koichi Niihara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 50[1] Issue: 1S2 Pages: 01BE18-01BE18

    • DOI

      10.1143/jjap.50.01be18

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Preparation of Cr(N,O) thin films by RF reactive unbalanced magnetron sputtering2011

    • Author(s)
      Tun Shirahata, et al.
    • Journal Title

      Thin Solid Films

      Volume: 519 Pages: 3497-3500

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Preparation and Characterization of Cr-Zn-N-O Thin Films deposited by Pulsed Laser Deposition2011

    • Author(s)
      Tsuneo Suzuki, et al.
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 50

    • NAID

      210000138332

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Fourier-Transform Infrared Absorption Spectroscopy of Chromium Nitride Thin Film2011

    • Author(s)
      Jun Shirahata, et al.
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 50

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] ケイ素を添加した酸窒化クロム薄膜の機械的特性とその微構造2011

    • Author(s)
      白幡淳, ほか
    • Journal Title

      日本金属学会誌

      Volume: 75 Pages: 97-103

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Presentation] CrN系化合物における高硬度化および高電気伝導化2013

    • Author(s)
      佐藤蒼生ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      東京理科大学
    • Year and Date
      2013-03-27
    • Related Report
      2012 Final Research Report
  • [Presentation] パルスレーザー堆積法によりSiを強制固溶させたCr-Si-N薄膜の作製と硬度評価2013

    • Author(s)
      遠藤稔之ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      東京理科大学
    • Year and Date
      2013-03-27
    • Related Report
      2012 Final Research Report
  • [Presentation] エピタキシャルCr(N,0)薄膜の基板拘束による酸素含有量変化2013

    • Author(s)
      鈴木知真ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      東京理科大学
    • Year and Date
      2013-03-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Preparation of Epitaxially Grown Cr-Si-N Thin Films by Pulsed Laser Deposition2013

    • Author(s)
      Toshiyuki Endo et aL
    • Organizer
      37^<th> International Conference and Expo on Advanced Ceramics and Composites
    • Place of Presentation
      Daytona, USA
    • Year and Date
      2013-03-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Influence of Oxygen on the Hardness and Electrical Resistivity of Cr(N,0) Thin Films2013

    • Author(s)
      Aoi Sato et al
    • Organizer
      37^<th> International Conference and Expo on Advanced Ceramics and Composites
    • Place of Presentation
      Daytona, USA
    • Year and Date
      2013-03-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Influence of Oxygen on the Hardness and Electrical Resistivity of Cr(N,O) Thin Films2013

    • Author(s)
      Aoi Sato
    • Organizer
      37th International Conference and Expo on Advanced Ceramics and Composites
    • Place of Presentation
      Daytona, USA
    • Related Report
      2012 Annual Research Report
  • [Presentation] Preparation of Epitaxially Grown Cr-Si-N Thin Films by Pulsed Laser Deposition2013

    • Author(s)
      Toshiyuki Endo
    • Organizer
      37th International Conference and Expo on Advanced Ceramics and Composites
    • Place of Presentation
      Daytona, USA
    • Related Report
      2012 Annual Research Report
  • [Presentation] CrNへの0, Mgの同時添加による硬度および電気伝導性の評価2012

    • Author(s)
      佐藤蒼生ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      愛媛大学
    • Year and Date
      2012-09-12
    • Related Report
      2012 Final Research Report
  • [Presentation] PLD法により作製したエピタキシャルCr(N,0)薄膜の大気下における酸化挙動2012

    • Author(s)
      鈴木知真ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      愛媛大学
    • Year and Date
      2012-09-12
    • Related Report
      2012 Final Research Report
  • [Presentation] 高硬度・低電気抵抗を目指したCr(N,0)薄膜への置換型固溶元素の添加2012

    • Author(s)
      佐藤蒼生ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      横浜国立大学
    • Year and Date
      2012-03-28
    • Related Report
      2012 Final Research Report
  • [Presentation] PLD法によりMgO単結晶基板上にエピタキシャル成長させたCr(N,0)薄膜の作製2012

    • Author(s)
      鈴木知真ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      横浜国立大学
    • Year and Date
      2012-03-28
    • Related Report
      2012 Final Research Report
  • [Presentation] PLD法によりMgO単結晶基板上にエピタキシャル成長させたCr(N,O)薄膜の作製2012

    • Author(s)
      鈴木知真, ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      横浜国立大学(神奈川県)
    • Year and Date
      2012-03-28
    • Related Report
      2011 Annual Research Report
  • [Presentation] 高硬度・低電気抵抗を目指したCr(N,O)薄膜への置換型固溶元素の添加2012

    • Author(s)
      佐藤蒼生, ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      横浜国立大学(神奈川県)
    • Year and Date
      2012-03-28
    • Related Report
      2011 Annual Research Report
  • [Presentation] Control of oxygen content with oxygen gas introduction in Cr(N,0) thin films prepared by pulsed laser deposition2012

    • Author(s)
      K.Suzuki et al
    • Organizer
      36th Internathional Conference and Exposition on Advanced Ceramics and Composites (ICACC2012)
    • Place of Presentation
      Florida, USA
    • Year and Date
      2012-01-24
    • Related Report
      2012 Final Research Report
  • [Presentation] Cr(N,0)薄膜の酸素量の変化に伴う電気伝導性の評価2011

    • Author(s)
      佐藤蒼生ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      沖縄コンへ"ンションセンター
    • Year and Date
      2011-11-07
    • Related Report
      2012 Final Research Report
  • [Presentation] 酸素含有量を精密制御したCr(N,0)薄膜のPLD法による作製2011

    • Author(s)
      鈴木知真ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      沖縄コンベンションセンター
    • Year and Date
      2011-11-07
    • Related Report
      2012 Final Research Report
  • [Presentation] 酸素含有量を精密制御したCr(N,O)薄膜のPLD法による作製2011

    • Author(s)
      鈴木知真, ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      沖縄コンベンションセンター(沖縄県)
    • Year and Date
      2011-11-07
    • Related Report
      2011 Annual Research Report
  • [Presentation] Cr(N,O)薄膜の酸素量の変化に伴う電気伝導性の評価2011

    • Author(s)
      佐藤蒼生, ほか
    • Organizer
      日本金属学会
    • Place of Presentation
      沖縄コンベンションセンター(沖縄県)
    • Year and Date
      2011-11-07
    • Related Report
      2011 Annual Research Report
  • [Presentation] The Mechanical Properties of Cr-Zn-N-O Films Prepared by Pulsed Laser Deposition2010

    • Author(s)
      Fumiya Sekiguchi
    • Organizer
      EM-NANO2010
    • Place of Presentation
      富山国際会議場
    • Year and Date
      2010-06-23
    • Related Report
      2010 Annual Research Report
  • [Presentation] PLD 法により作製したエピタキシャルCr(N,O)薄膜の大気下における酸化挙動

    • Author(s)
      鈴木知真
    • Organizer
      日本金属学会
    • Place of Presentation
      愛媛大学(愛媛県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] CrNへのO,Mgの同時添加による硬度および電気伝導性の評価

    • Author(s)
      佐藤蒼生
    • Organizer
      日本金属学会
    • Place of Presentation
      愛媛大学(愛媛県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] エピタキシャルCr(N,O)薄膜の基板拘束による酸素含有量変化

    • Author(s)
      鈴木知真
    • Organizer
      日本金属学会
    • Place of Presentation
      東京理科大学(東京都)
    • Related Report
      2012 Annual Research Report
  • [Presentation] CrN系化合物における高硬度化および高電気伝導化

    • Author(s)
      佐藤蒼生
    • Organizer
      日本金属学会
    • Place of Presentation
      東京理科大学(東京都)
    • Related Report
      2012 Annual Research Report
  • [Presentation] パルスレーザー堆積法によりSiを強制固溶させたCr-Si-N薄膜の作製と硬度評

    • Author(s)
      遠藤稔之
    • Organizer
      日本金属学会
    • Place of Presentation
      東京理科大学(東京都)
    • Related Report
      2012 Annual Research Report

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Published: 2010-08-23   Modified: 2019-07-29  

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