Development of the techniques for the protein patterning by atmospheric pressure plasmas

• Project/Area Number: 22740365
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Plasma science
• Research Institution: Osaka University
• Principal Investigator: ANDO Ayumi 大阪大学, 大学院・工学研究科, 特任研究員 (60452471)
• Project Period (FY): 2010 – 2011
• Project Status: Completed (Fiscal Year 2011)
• Budget Amount: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000); Fiscal Year 2011: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000); Fiscal Year 2010: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
• Keywords: プラズマ / 大気圧プラズマ / 細胞外マトリックス / マイクロパターニング / バイオチップ / ラジカル / パターニング

Research Abstract

Extracellular matrices(ECMs) patterns of many tens or hundreds micrometers in size have been formed on silicon substrates with the use of low-temperature atmospheric-pressure plasma(APP) jets with metal stencil masks in this research. Neuronal model cells were shown to grow on the ECM patterned by APP jets, so that the patterning technique by low-temperature APPs for ECM layers provides a simple mean of arranging neuron cells on a relatively large area of a silicon surface.

Research Products

• [Journal Article] Micro-patterning formation of extracellular-matrix(ECM) layers (2012)
  • Author(s): Ayumi Ando, Toshifumi Asano, Tsuneo Urisu and Satoshi Hamaguchi
  • Journal Title: Europhysics news Volume: 43(3) Pages: 13-13
  • Peer Reviewed
• [Journal Article] Extracellular Matrix Patterning for Cell Alignment by Atmospheric Pressure Plasma Jets (2012)
  • Author(s): Ayumi Ando, Toshifumi Asano, Md. Abu Sayed, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu and Satoshi Hamaguchi
  • Journal Title: Japanese Journal of Applied Physics Volume: 51 Issue: 3R Pages: 36201-36201
  • DOI: 10.1143/jjap.51.036201
  • NAID: 40019199845
  • Peer Reviewed
• [Journal Article] Arrangement of PC12 Cells on a Silicon Chip via Extracellular Matrix (ECM) Layer Patterning by Atmospheric Pressure Plasmas (2011)
  • Author(s): Ayumi Ando, Hidetaka Uno, Toshifumi Asano, Tsuneo Urisu and Satoshi Hamaguchi
  • Journal Title: Plasma and Fusion Research Volume: 6 Pages: 1306155-1306155
  • DOI: 10.1585/pfr.6.1306155
  • NAID: 130002059489
  • ISSN: 1880-6821
  • Peer Reviewed
• [Journal Article] Micro pattern formation of extracellular-matrix(ECM) layers by atmospheric-pressure plasmas and cell culture on the patterned ECMs (2011)
  • Author(s): Ayumi Ando, Toshifumi Asano, Tsuneo Urisu and Satoshi Hamaguchi
  • Journal Title: Journal of Physics D : Applied Physics Volume: 44 Issue: 48 Pages: 482002-482002
  • DOI: 10.1088/0022-3727/44/48/482002
  • Peer Reviewed
• [Journal Article] Patterning of an extracellular matrix(ECM) layer on silicon by atmospheric-pressure plasmas for living neuron network chip fabrication (2011)
  • Author(s): Ayumi Ando, Toshifumi Asano, Hidetaka Uno, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu and Satoshi Hamaguchi
  • Journal Title: Proceedings of the 20th International Symposium on Plasma Chemistry(ISPC 20) Volume: Paper No.MED07
• [Journal Article] Protein pattering by atmospheric-pressure plasmas (2010)
  • Author(s): Ayumi Ando, Md. Abu Sayed, Toshifumi Asano, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu and Satoshi Hamaguchi
  • Journal Title: Proceedings of 4^<th> International Symposium on Atomic Technology(ISAT-4), Journal of Physics ; Conference Series Volume: No.232 Pages: 12019-12019
  • DOI: 10.1088/1742-6596/232/1/012019
  • Peer Reviewed
• [Journal Article] Protein pattering by atmospheric-pressure plasmas (2010)
  • Author(s): 安藤あゆみ
  • Journal Title: Proceedings of 4^<th> International Symposium on Atomic Technology (ISAT-4), Journal of Physics ; Conference Series Volume: No.232
  • Peer Reviewed
• [Journal Article] Extracellular matrix patterning by atmospheric pressure plasma jets (2010)
  • Author(s): 安藤あゆみ
  • Journal Title: Proceedings of 7^<th> International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference (ICRP-7/SPP-28/GEC-63)
• [Presentation] Arrangement of PC12 cells on extracellular matrix(ECM) layers patterned by atmospheric pressure plasmas (2012)
  • Author(s): Ayumi Ando, Hidetaka Uno, Tsuneo Urisu and Satoshi Hamaguchi
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing(JSPP2012)
  • Place of Presentation: Todaiji Culture Center, Todaiji Temple, Nara, Japan, Book of abstracts P33
  • Year and Date: 2012-01-17
• [Presentation] Arrangement of PC12 cells on extracellular matrix (ECM) layers patterned by at mospheric pressure plasmas (2012)
  • Author(s): Ayumi Ando
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing (JSPP2012)
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-17
• [Presentation] Orthopaedic Applications of Low-temperature plasmas (2012)
  • Author(s): Kazuto Masuda
  • Organizer: The 8^<th> EU-Japan Joint Symposium on Plasma Processing (JSPP2012)
  • Place of Presentation: Nara, Japan
  • Year and Date: 2012-01-17
• [Presentation] Extracellular matrix(ECM) patterning by atmospheric-pressure plasmas for arranging neuronal cells on silicon substrates (2011)
  • Author(s): Ayumi Ando, Toshifumi Asano, Hidetaka Uno, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu and Satoshi Hamaguchi
  • Organizer: Plasma Conference 2011(PLASMA 2011)
  • Place of Presentation: Ishikawa Ongakudo, Kanazawa, Japan, 25B05.(招待講演)
  • Year and Date: 2011-11-25
• [Presentation] Extracellular matrix (ECM) patterning by atmospheric-pressure plasmas for arranging neuronal cells on silicon substrates (2011)
  • Author(s): Ayumi Ando
  • Organizer: Plasma Conference 2011 (PLASMA 2011)
  • Place of Presentation: Kanazawa, Japan(招待講演)
  • Year and Date: 2011-11-25
• [Presentation] Patterning of an extracellular matrix(ECM) layer on silicon by atmospheric-pressure plasmas for living neuron network chip fabrication (2011)
  • Author(s): Ayumi Ando, Toshifumi Asano, Hidetaka Uno, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu and Satoshi Hamaguchi
  • Organizer: The 20th International Symposium on Plasma Chemistry(ISPC 20)
  • Place of Presentation: Loews Hotel, Philadelphia, USA, MED07
  • Year and Date: 2011-07-28
• [Presentation] Patterning of an extracellular matrix (ECM) layer on silicon by atmospheric-pressure plasmas for living neuron network chip fabrication (2011)
  • Author(s): Ayumi Ando
  • Organizer: The 20th International Symposium on Plasma Chemistry (ISPC 20)
  • Place of Presentation: Philadelphia, USA
  • Year and Date: 2011-07-28
• [Presentation] Plasma Irradiation Effects on Cells, Tissues, and Biomaterials in Orthopaedic Applications (2011)
  • Author(s): Kazuto Masuda
  • Organizer: The 20th International Symposium on Plasma Chemistry (ISPC 20)
  • Place of Presentation: Philadelphia, USA
  • Year and Date: 2011-07-28
• [Presentation] 大気圧低温プラズマによる神経細胞ネットワーク用細胞外マトリックスパターニング技術の開発 (2011)
  • Author(s): 安藤あゆみ
  • Organizer: 春季第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学(神奈川県)
  • Year and Date: 2011-03-26
• [Presentation] 大気圧低温プラズマによる神経細胞ネットワーク用細胞外マトリックスパターニング技術の開発 (2011)
  • Author(s): 安藤あゆみ, 宇野秀隆, 浅野豪文, 手老龍吾, 北野勝久, 宇理須恒雄, 浜口智志
  • Organizer: 第58回応用物理学関係連合講演会,第58回応用物理学関係連合講演会予稿集
• [Presentation] 大気圧プラズマによる神経細胞ネットワークチップ用細胞外マトリックスパターニング (2010)
  • Author(s): 安藤あゆみ, 浅野豪文, 手老龍吾, 北野勝久, 宇理須恒雄, 浜口智志
  • Organizer: 第27回プラズマ・核融合学会年会
  • Place of Presentation: 北海道大学
  • Year and Date: 2010-12-01
• [Presentation] 大気圧プラズマによる神経細胞ネットワークチップ用細胞外マトリックスパターニング (2010)
  • Author(s): 安藤あゆみ
  • Organizer: 第27回プラズマ・核融合学会年会
  • Place of Presentation: 北海道大学(北海道)
  • Year and Date: 2010-12-01
• [Presentation] Extracellular matrix patterning by atmospheric pressure plasma jets (2010)
  • Author(s): 安藤あゆみ
  • Organizer: 7^<th> International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference (ICRP-7/SPP-28/GEC-63)
  • Place of Presentation: Maison de la chimie (Paris, France)
  • Year and Date: 2010-10-06
• [Presentation] Extracellular matrix patterning by atmospheric pressure plasma jets (2010)
  • Author(s): Ayumi Ando, Toshifumi Asano, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu and Satoshi Hamaguchi
  • Organizer: 7^<th> International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference(ICRP-7/ SPP-28/ GEC-63)
  • Place of Presentation: Maison de la chimie, Paris, France, KWP. 00034