Development of coherence diffraction imaging for high-harmonic-generation EUV source

• Project/Area Number: 22760029
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Thin film/Surface and interfacial physical properties
• Research Institution: University of Hyogo
• Principal Investigator: HARADA Tetsuo 兵庫県立大学, 高度産業科学技術研究所, 助教 (30451636)
• Project Period (FY): 2010 – 2011
• Project Status: Completed (Fiscal Year 2011)
• Budget Amount: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000); Fiscal Year 2011: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000); Fiscal Year 2010: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
• Keywords: 応用光学 / EUV / 高次高調波 / コヒーレンス / コヒーレント回折イメージング

Research Abstract

Image reconstruction method for a lensless microscope was developed to observe EUV-mask patterns. The microscope equipped with standalone EUV source of high harmonic generation, which temporal coherence was not enough to reconstruct the pattern image. To improve the coherence, we fabricated a grating for a monochromator.

Research Products

• [Journal Article] Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology (2012)
  • Author(s): Masato Nakasuji, Akifumi Tokimasa, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe, Katsumi Midorikawa, Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys Volume: 52(in press)
  • NAID: 210000140707
  • Peer Reviewed
• [Journal Article] Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet (2012)
  • Author(s): M.Nakasuji, A.Tokimasak, T.Harada, Y.Nagata, T.Watanabe, K.Midorikawa, H.Kinoshita
  • Journal Title: Jpn.J.Appl.Phys. Volume: (Accepted)
  • Peer Reviewed
• [Journal Article] Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source (2012)
  • Author(s): T.Harada, M.Nakasuji, Y.Nagata, T.Watanabe, H.Kinoshita
  • Journal Title: Proc.SPIE Volume: (Accepted)
• [Journal Article] Imaging of EUV-mask patterns using coherent EUV scatterometry microscope based on coherent diffraction imaging (2011)
  • Author(s): Tetsuo Harada, Masato Nakasuji, Teruhiko, Kimura, Takeo Watanabe, Hiroo Kinoshita, Yutaka Nagata
  • Journal Title: J. Vac. Sci. Technol. B Volume: 29 Issue: 6
  • DOI: 10.1116/1.3657525
  • Peer Reviewed
• [Journal Article] Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU (2011)
  • Author(s): Tetsuo Harada, Masato Nakasuji, Masaki Tada, Yutaka Nagata, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys Volume: 50 Issue: 6S Pages: 06GB03-06GB03
  • DOI: 10.1143/jjap.50.06gb03
  • NAID: 210000070654
  • Peer Reviewed
• [Journal Article] The coherent EUV scatterometry microscope for actinic mask inspection and metrology (2011)
  • Author(s): Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita
  • Journal Title: Proc.SPIE Volume: 8081 Pages: 80810K-80810K
  • DOI: 10.1117/12.896576
• [Presentation] Development of Standalone Coherent EUV Scatterometry Microscope with High-Harmonic-Generation EUV Source (2012)
  • Author(s): Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Hiroo Kinoshita
  • Organizer: Photo Mask Japan 2012
  • Place of Presentation: (Yokohama, Japan)(招待講演)
  • Year and Date: 2012-04-19
• [Presentation] EUVマスク検査のための高次高調波コヒーレントスキャトロメトリー顕微鏡の開発 (2012)
  • Author(s): 中筋正人, 時政明史, 原田哲男, 永田豊, 渡邊健夫, 緑川克美, 木下博雄
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学(東京都)
  • Year and Date: 2012-03-18
• [Presentation] EUVマスク検査のための高次高調波コヒーレントスキャトロメトリー顕微鏡の開発 (2012)
  • Author(s): 中筋正人, 原田哲男, 永田豊, 時政明史, 渡邊健夫, 緑川克美, 木下博雄
  • Organizer: 第25回放射光学会年会放射光科学合同シンポジウム
  • Place of Presentation: 鳥栖市(佐賀県)
  • Year and Date: 2012-01-09
• [Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク検査 (2011)
  • Author(s): 原田哲男, 中筋正人, 渡邊健夫, 永田豊, 木下博雄
  • Organizer: 第11回X線結像光学シンポジウム
  • Place of Presentation: (東北大学)(招待講演)
  • Year and Date: 2011-11-04
• [Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク検査 (2011)
  • Author(s): 原田哲男, 中筋正人, 渡邊健夫, 永田豊, 木下博雄
  • Organizer: 第11回X線結像光学シンポジウム
  • Place of Presentation: 東北大学(宮城県)(招待講演)
  • Year and Date: 2011-11-04
• [Presentation] Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet (2011)
  • Author(s): M.Nakasuji, A.Tokimasak, T.Harada, Y.Nagata, T.Watanabe, K.Midorikawa, H.Kinoshita
  • Organizer: MNC2011
  • Place of Presentation: Kyoto (Japan)
  • Year and Date: 2011-10-26
• [Presentation] Imaging of EUV-Mask Patterns using the Coherent Scatterometry Microscope based on a Coherent Diffraction Imaging (2011)
  • Author(s): T.Harada, M.Nakasuji, T.Kimura, T.Watanabe, H.Kinoshita, Y.Nagata
  • Organizer: 55^<th> EIPBN
  • Place of Presentation: Las Vegas (USA)
  • Year and Date: 2011-05-31
• [Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク上のプログラム欠陥観察結果 (2011)
  • Author(s): 中筋正人, 木村瑛彦, 多田将樹, 原田哲男, 渡邊健夫, 木下博雄
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: (講演予稿集のみ)
  • Year and Date: 2011-03-24
• [Presentation] コヒーレントスキャトロメトリー顕微鏡によるCD評価 (2011)
  • Author(s): 中筋正人, 多田将樹, 原田哲男, 渡邊健夫,木下博雄
  • Organizer: 第24回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: つくば国際会議場
  • Year and Date: 2011-01-10
• [Presentation] タイコグラフィーにおける像再生条件の最適化 (2011)
  • Author(s): 木村瑛彦, 中筋正人, 原田哲男, 渡邊健夫, 木下博雄
  • Organizer: 第24回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: つくば国際会議場
  • Year and Date: 2011-01-10
• [Presentation] コヒーレントスキャトロメトリー顕微鏡によるタイコグラフィーでのEUVマスクパタン増再生 (2011)
  • Author(s): 原田哲男, 中筋正人, 木村瑛彦, 渡邊健夫, 木下博雄
  • Organizer: 第24回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: つくば国際会議場
  • Year and Date: 2011-01-09
• [Presentation] Critical Dimension Evaluation of an EUV Mask utilizing the Coherent EUV Scatterometry Microscope (2010)
  • Author(s): Tetsuo Harada, Masato Nakasuji, Masaki Tada, Takeo Watanabe, Hiroo Kinoshita
  • Organizer: MNC2010
  • Place of Presentation: 小倉
  • Year and Date: 2010-11-10
• [Presentation] X線回折顕微法によるEUVマスク像再生アルゴリズムの検討 (2010)
  • Author(s): 木村瑛彦, 原田哲男, 渡邊健夫, 木下博雄
  • Organizer: 2010年度精密工学会 秋季大会学術講演会
  • Place of Presentation: 名古屋大学
  • Year and Date: 2010-09-27
• [Presentation] コヒーレントスキャトロメトリー顕微鏡によるCD評価 (2010)
  • Author(s): 原田哲男, 中筋正人, 多田将樹, 渡邊健夫, 木下博雄
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学
  • Year and Date: 2010-09-14
• [Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク上のプログラム欠陥観察結果 (2010)
  • Author(s): 中筋正人, 多田将樹, 原田哲男, 渡邊健夫, 木下博雄
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学
  • Year and Date: 2010-09-14