Channel propagation of femtosecond laser pulses for lithographic applications
| Project/Area Number |
22760042
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Applied optics/Quantum optical engineering
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| Research Institution | Hokkaido University |
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Principal Investigator |
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| Project Period (FY) |
2010 – 2011
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| Project Status |
Completed (Fiscal Year 2011)
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| Budget Amount *help |
¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2010: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
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| Keywords | フェムト秒レーザ / リソグラフィ / 非線形光学 / 非線形光学効果 / マイクロ流路 / チャネル伝搬 |
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| Research Abstract |
Femtosecond laser pulses, which are focused into photoresists, exhibit unique channel propagation phenomena. Although similar propagation was previously reported as for ultraviolet laser exposure using photosensitive resins, femtosecond laser enabled to the channel propagation even in chemically amplified resists, which was not polymerized by ultraviolet exposure alone. Optical measurements revealed that refractive index changes were as large as 10^<-3> to 10^<-2> without post baking treatments. Such refractive index changes were induced by cross-linking reactions related to heat accumulation effects. Additionally, the origin of the channel propagation was high coupling efficiencies between guiding-modes in the exposed region and the laser pulses.
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Report
(3 results)
Research Products
(27 results)
