In situ observation of MOS structure with an ultra thin metal gate for clarification of NBTI mechanism

• Project/Area Number: 22760222
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Electronic materials/Electric materials
• Research Institution: Tohoku University
• Principal Investigator: ZHAO Ming 東北大学, 金属材料研究所, 助教 (50512224)
• Project Period (FY): 2010 – 2011
• Project Status: Completed (Fiscal Year 2011)
• Budget Amount: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000); Fiscal Year 2011: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000); Fiscal Year 2010: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
• Keywords: 作成 / 評価技術 / NBTI / 高精度ERDA / 高精度RBS / ERDA / RBS / 超薄型連続金属膜

Research Abstract

The 3-nm-thicked continuous metal film has been successfully fabricated by sputtering deposition and 50eV ion irradiation. Therefore, it is possible to prove one of the theories of the mechanism of NBTI by using ERDA to study the H concentration in the Si substrate of CMOS. We have observed that the H can out diffuse in Si substrate at 260oC. This result indicates that ‘diffusion-limited' model is more suitable for explain the NBTI mechanism. This result can be used for the optimization of the fabrication parameters of CMOS.

Research Products

• [Journal Article] Surface electronic properties of discontinuous Pd films during hydrogen exposure (2011)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama, Aichi Inouye, Shunya Yamamoto, Masahito Yoshikawa
  • Journal Title: Japanese Journal of Applied Physics Volume: 50巻
  • Peer Reviewed
• [Journal Article] Hydrogen Interaction with Pd/SiO2/Si Rectifying Junction (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama, Aichi Inouye, Shunya Yamamoto, Masahito Yoshikawa
  • Journal Title: Materials Science and Engineering B Volume: 175巻 Pages: 223-228
  • Peer Reviewed
• [Journal Article] Hydrogen Interaction with Pd/SiO_2/Si Rectifying Junction (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama, Aichi Inouye, Shunya Yamamoto, Masahito Yoshikawa
  • Journal Title: Materials Science and Engineering B Volume: 175 Pages: 223-228
  • Peer Reviewed
• [Presentation] The study on hydrogen performance in high-k stacks by ERDA (2011)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama, Kaoru Nakajima, Motofumi Suzuki, Kenji Kimura
  • Organizer: 6th International Workshop on High-Resolution Depth Profiling
  • Place of Presentation: パリ、フランス
  • Year and Date: 2011-06-27
• [Presentation] The study on hydrogen performance in high-k stacks by ERDA (2011)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama, Kaoru Nakajima, Motofumi Suzuki, Kenji Kimura
  • Organizer: 6th International Workshop on High-Resolution Depth Profiling
  • Place of Presentation: フランスパリ市
  • Year and Date: 2011-06-22
• [Presentation] Room Temperature Fabrication of Metal Film by Low Energy Ion Sputtering (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama
  • Organizer: イオンビームによる表面介面解析特別研究会
  • Place of Presentation: 名古屋
  • Year and Date: 2010-12-03
• [Presentation] Room Temperature Fabrication of Metal Film by Low Energy Ion Sputtering (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama
  • Organizer: イオンビームによる表面介面解析特別研究会
  • Place of Presentation: 日本名古屋市
  • Year and Date: 2010-11-03
• [Presentation] Room Temperature Fabrication of Continuous Metal Films by low Energy Ar+ Irradiation (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama
  • Organizer: 日本原子力学会「2010年秋の大会」
  • Place of Presentation: 日本札幌市
  • Year and Date: 2010-09-15
• [Presentation] Room Temperature Fabrication of Continuous Metal Films by low Energy Ar+ Irradiation (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Tatsuo Shikama
  • Organizer: 日本原子力学会「2010年秋の大会」
  • Place of Presentation: 札幌市
  • Year and Date: 2010-09-15
• [Presentation] The Influence of Low Energy Ar+ irradiation on the Surface morphology of Metal Thin Films (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Aichi Inouye, Shunya Yamamot, Masahito Yoshikawa, Tatsuo Shikama
  • Organizer: The 3rd International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies
  • Place of Presentation: 富山市
  • Year and Date: 2010-06-22
• [Presentation] The Influence of Low Energy Ar+ irradiation on the Surface morphology of Metal Thin Films (2010)
  • Author(s): Ming Zhao, Shinji Nagata, Aichi Inouye, Shunya Yamamot, Masahito Yoshikawa, Tatsuo Shikama
  • Organizer: The 3rd International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies
  • Place of Presentation: 日本富山市
  • Year and Date: 2010-06-02