Development of Polyatomic Ion Source for Organic Liquids toward Application of Shallow Ion Implantation
| Project/Area Number |
22760252
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Electron device/Electronic equipment
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| Research Institution | Kyoto University |
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Principal Investigator |
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| Project Period (FY) |
2010 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2012: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2011: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2010: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
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| Keywords | 微細プロセス技術 / イオン注入 / イオン液体 / イオン源 / イオンビーム |
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| Research Abstract |
Field emission type ionic liquid ion source with a high and stable current was developed and evaluated on its beam properties. Effects of the ionic liquid ion beams on silicon and glass substrates were also studied. The developed ion source produced single anions and anion with anion-cation pairs in positive ion beam, and yielded single cations and cation with anion-cation pairs in negative ion beam. Glass substrates irradiated with ionic liquid BMIM-PF6 ion beam showed decrease of surface roughness to 0.1 nm. This indicates that the ionic liquid ion beams can be used for surface modifications.
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Report
(4 results)
Research Products
(71 results)
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[Presentation] アセトンクラスターの生成2011
Author(s)
糸崎俊介, 龍頭啓充, 竹内光明, 高岡義寛
Organizer
第58応用物理学関係連合講演会
Place of Presentation
神奈川工科大学
Year and Date
2011-03-25
Related Report
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