Ceramics Coating of Metal Substrate by Chemical Vapor Deposition under Intense Laser Field
| Project/Area Number |
22760550
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Material processing/treatments
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| Research Institution | Tohoku University |
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Principal Investigator |
ITO Akihiko 東北大学, 金属材料研究所, 助教 (20451635)
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| Project Period (FY) |
2010 – 2011
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| Project Status |
Completed (Fiscal Year 2011)
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| Budget Amount *help |
¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2011: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2010: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
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| Keywords | 化学気相析出 / レーザー工学 / セラミックス / コーティング / 配向制御 / レーザー光学 / アルミナ |
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| Research Abstract |
A laser irradiation to chemical vapor deposition process enhanced chemical reactions and mobility of adsorbed species on a surface, leading a high-speed deposition of ceramics coating with orientation and microstructure control. In the present study, we demonstrated the preparation of α-Al_2O_3, TiON and TiN films at high deposition rate with orientation, composition and microstructural control.
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Report
(3 results)
Research Products
(121 results)
