Elucidation of Ionization Dynamics of Polymers for Nanofabrication by Using Quantum Beam

• Project/Area Number: 22760669
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Nuclear engineering
• Research Institution: Hokkaido University
• Principal Investigator: OKAMOTO Kazumasa 北海道大学, 大学院・工学研究院, 助教 (10437353)
• Project Period (FY): 2010 – 2011
• Project Status: Completed (Fiscal Year 2011)
• Budget Amount: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000); Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000); Fiscal Year 2010: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
• Keywords: 放射線 / X線 / 粒子線 / 半導体超微細化 / リソグラフィ / レジスト / 自由電子レーザー / 極端紫外光 / パルスラジオリシス / ポリヒドロキシスチレン / 電子線 / ポリスチレン

Research Abstract

The microscopic charge dynamics in resist materials was studied by spectroscopy using quantum beam(extreme-ultraviolet free-electron laser(EUVFEL) and electron beam) as excitation source. It was suggested that the quantum efficiency of the acid yield in polymer films increases with decreasing the dose rate of the EUVFEL light. The charge dynamics in poly(styrene-acrylate) copolymers and poly(4-hydroxystyrene) was also studied by using pulse radiolysis.

Research Products

• [Journal Article] Dynamics of radicalcation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography (2011)
  • Author(s): Yasuharu Tajima, Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
  • Journal Title: Jpn. J. Appl. Phys Volume: 50 Issue: 6S Pages: 06GD03-06GD03
  • DOI: 10.1143/jjap.50.06gd03
  • Peer Reviewed
• [Journal Article] Fundamental study on reaction mechanisms in chemically amplified extreme-ultraviolet resists by using 61-nm free-electron laser (2011)
  • Author(s): Kazumasa Okamoto, Takahiro Kozawa, Takaki Hatsui, Yasuharu Tajima, Keita Oikawa, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, and Takashi Sumiyoshi
  • Journal Title: Proc. SPIE Volume: 7972 Pages: 797217-797217
  • DOI: 10.1117/12.879358
  • Peer Reviewed
• [Journal Article] Deprotonation mechanism of poly(styrene-acrylate)-based chemically amplified resist (2011)
  • Author(s): Yasuharu Tajima, Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
  • Journal Title: Proc. SPIE Volume: 7972 Pages: 79721N-79721N
  • DOI: 10.1117/12.879362
  • Peer Reviewed
• [Journal Article] Deprotonation mechanism of poly(styrene-acrylate)-based chemically amplified resist (2011)
  • Author(s): Yasuharu Tajima
  • Journal Title: Proceedings of SPIE Volume: 7972
  • Peer Reviewed
• [Journal Article] Dynamics of radicalcation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography (2011)
  • Author(s): Yasuharu Tajima
  • Journal Title: Japanese Journal of Applied Physics Volume: (印刷中)
  • Peer Reviewed
• [Journal Article] Fundamental study on reaction mechanisms in chemically amplified extreme-ultraviolet resists by using 61-nm free-electron laser (2011)
  • Author(s): Kazumasa Okamoto
  • Journal Title: Proceedings of SPIE Volume: 7972
  • Peer Reviewed
• [Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies (2010)
  • Author(s): K. Okamoto, M. Tanaka, T. Kozawa, and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 49巻 Issue: 10R Pages: 106501-106501
  • DOI: 10.1143/jjap.49.106501
  • NAID: 40017341248
  • Peer Reviewed
• [Presentation] レジスト高分子の放射線化学 (2012)
  • Author(s): 岡本一将、住吉孝
  • Organizer: 日本化学会第92春季年会
  • Place of Presentation: 慶応義塾大学
  • Year and Date: 2012-03-28
• [Presentation] レジスト高分子の放射線化学 (2012)
  • Author(s): 岡本一将
  • Organizer: 日本化学会第92春季年会
  • Place of Presentation: 慶応義塾大学日吉キャンパス(神奈川県)(招待講演)
  • Year and Date: 2012-03-28
• [Presentation] 極端紫外自由電子レーザーによるレジスト高分子へのエネルギー付与 (2012)
  • Author(s): 及川敬太
  • Organizer: 日本化学会第92春季年会
  • Place of Presentation: 慶応義塾大学日吉キャンパス(神奈川県)
  • Year and Date: 2012-03-27
• [Presentation] Acid generation efficiency in resist films after exposure to the 61 nm free-electron laser light (2011)
  • Author(s): K. Oikawa, K. Okamoto, T. Kozawa, T. Hatsui, M. Nagasono, T. Kameshima, T. Togashi, K. Tono, M. Yabashi, H. Kimura, Y. Senba, H. Ohash, R. Fujiyoshi and T. Sumiyoshi
  • Organizer: MNC
  • Place of Presentation: ANA Hotel Kyoto, Kyoto, Japan
  • Year and Date: 2011-10-27
• [Presentation] Acid generation efficiency in resist films after exposure to the 61nm free-electron laser light (2011)
  • Author(s): Keita Oikawa
  • Organizer: 24th International Microprocesses and Nanotechnology Conference
  • Place of Presentation: ANA Hotel Kyoto, Japan
  • Year and Date: 2011-10-27
• [Presentation] 極端紫外自由電子レーザーによる極薄膜高分子内のスパー制御 (2011)
  • Author(s): 岡本一将、古澤孝弘、及川敬太、初井宇記、永園充、亀島敬、富樫格、登野健介、矢橋牧名、木村洋昭、仙波泰徳、大橋治彦、石川哲也、住吉孝
  • Organizer: 第54回放射線化学討論会
  • Place of Presentation: 大阪大学
  • Year and Date: 2011-09-30
• [Presentation] 極端紫外自由電子レーザーによる極薄膜高分子内のスパー制御 (2011)
  • Author(s): 岡本一将
  • Organizer: 第54回 放射線化学討論会
  • Place of Presentation: 大阪大学吹田キャンパス(大阪府)
  • Year and Date: 2011-09-30
• [Presentation] 極端紫外自由電子レーザーによる電子線レジストへのエネルギー付与 (2011)
  • Author(s): 及川敬太
  • Organizer: 第54回 放射線化学討論会
  • Place of Presentation: 大阪大学吹田キャンパス(大阪府)
  • Year and Date: 2011-09-29
• [Presentation] Fundamental study on reaction mechanisms in chemically amplified extreme-ultraviolet resists by using 61-nm free-electron laser, SPIE Advanced Lithography 2011 (2011)
  • Author(s): Kazumasa Okamoto, Takahiro Kozawa, Takaki Hatsui, Yasuharu Tajima, Keita Oikawa, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, and Takashi Sumiyoshi
  • Organizer: San Jose Convention Center and San Jose Marriott| San Jose
  • Place of Presentation: California, USA
  • Year and Date: 2011-03-02
• [Presentation] Fundamental study on reaction mechanisms in chemically amplified extreme-ultraviolet resists by using 61-nm free-electron laser (2011)
  • Author(s): Kazumasa Okamoto
  • Organizer: SPIE Advanced Lithography 2011
  • Place of Presentation: San Jose Convention Center, San Jose, USA
  • Year and Date: 2011-03-02
• [Presentation] Deprotonation mechanism of poly(styrene-acrylate)-based chemically amplified resist (2011)
  • Author(s): Yasuharu Tajima
  • Organizer: SPIE Advanced Lithography 2011
  • Place of Presentation: San Jose Convention Center, San Jose, USA
  • Year and Date: 2011-03-01
• [Presentation] Charge dynamics in resist polymers for EUV and EB lithography (2010)
  • Author(s): Kazumasa Okamoto
  • Organizer: EUVレジスト国際シンポジウム
  • Place of Presentation: 大阪大学中之島センター,大阪市
  • Year and Date: 2010-11-18
• [Presentation] Dynamics of radical cation of poly(styrene-acrylate)-based chemically amplified resist for EUV and electron beam lithography (2010)
  • Author(s): Yasuharu Tajima, Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
  • Organizer: MNC 2010, 23rd International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Rihga Royal Hotel Kokura, Fukuoka, Japan
  • Year and Date: 2010-11-11
• [Presentation] Dynamics of radical cation of poly(styrene-acrylate)-based chemically amplified resist for EUV and electron beam lithography (2010)
  • Author(s): Yasuharu Tajima
  • Organizer: MNC 2010, 23rd International Microprocesses and Nanotechnology Conference
  • Place of Presentation: リーガロイヤルホテル小倉,北九州市
  • Year and Date: 2010-11-11
• [Presentation] 芳香族分子の電荷非局在性に関する研究 (2010)
  • Author(s): 岡本一将
  • Organizer: 第53回放射線化学討論会
  • Place of Presentation: 名古屋大学
  • Year and Date: 2010-09-22