| Budget Amount *help |
¥49,140,000 (Direct Cost: ¥37,800,000、Indirect Cost: ¥11,340,000)
Fiscal Year 2013: ¥12,350,000 (Direct Cost: ¥9,500,000、Indirect Cost: ¥2,850,000)
Fiscal Year 2012: ¥16,380,000 (Direct Cost: ¥12,600,000、Indirect Cost: ¥3,780,000)
Fiscal Year 2011: ¥20,410,000 (Direct Cost: ¥15,700,000、Indirect Cost: ¥4,710,000)
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| Research Abstract |
Large Ar cluster ion beam has been utilized not only as a sputtering beam but also as a primary ion beam in Secondary Ion Mass Spectrometry (SIMS) and X-ray Photoelectron Spectrometry (XPS). Surface analytical equipment with cluster ion source is commercially available these days and Ar cluster ion beam is now "De facto standard" for surface analysis of organic materials, such as organic semiconductors, polymers, drug and biological materials.
Although, it was believed that large cluster ion beam is hard to focused, a fine focused Ar cluster ion beam( <1um ) was developed. Ion trajectory simulation and precision mechanical machining have been employed to overcome to this problem. Short working distance between a sample and end of the objective lens helps to reduce beam diameter. Mass imaging technique with this beam has been demonstrated for cultivated cells and tissues of rat brain with the lateral resolution of 4um.
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