| Project/Area Number |
23340181
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Plasma science
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| Research Institution | Sasebo National College of Technology |
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Principal Investigator |
KAWASAKI Hiroharu 佐世保工業高等専門学校, 電気電子工学科, 教授 (10253494)
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| Co-Investigator(Renkei-kenkyūsha) |
OHSHIMA Tamiko 佐世保工業高等専門学校, 電気電子工学科, 准教授 (00370049)
YAGYU Yoshihito 佐世保工業高等専門学校, 電気電子工学科, 准教授 (40435483)
SUDA Yoshiaki 佐世保工業高等専門学校, 電気電子工学科, 教授 (20124141)
IHARA Takeshi 佐世保工業高等専門学校, 電気電子工学科, 助教 (30634050)
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| Project Period (FY) |
2011 – 2013
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥9,750,000 (Direct Cost: ¥7,500,000、Indirect Cost: ¥2,250,000)
Fiscal Year 2013: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2012: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2011: ¥5,460,000 (Direct Cost: ¥4,200,000、Indirect Cost: ¥1,260,000)
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| Keywords | スパッタリング / 粉体ターゲット / スパッタリング成膜 / 機能性薄膜 / プラズマプロセス / 電気電子材料 |
|---|
| Research Abstract |
Functional thin films were prepared using sputtering deposition with powder target. Their deposition processes were also studied by Langmuir probe method, light emission spectroscopic method and laser light scattering method. Experimental results suggest that film quality using powder target were almost same compared with that using bulk target. However, deposition rate using powder target were 2~5 times higher than that using bulk target. Electron density and Ti emission intensity of the sputtering deposition methods were also 2~5 times higher than that using bulk target. The high electron density using powder target may be due to the 4 reasons as follows. 1)Net surface area of the target is larger than that of the bulk target. 2) Oblique incidence of sputtering ions into the target. 3)Surface temperature of the powder target is higher than that of the bulk target. 4)Hollow cathode effects in the target.
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