Development of new cleaning-removal system using cryogenic micro-nano solid spray

• Project/Area Number: 23360080
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Fluid engineering
• Research Institution: Tohoku University
• Principal Investigator: ISHIMOTO Jun 東北大学, 流体科学研究所, 教授 (10282005)
• Co-Investigator(Renkei-kenkyūsha): MATSUURA Kazuo 愛媛大学, 大学院・理工学研究科, 准教授 (20423577)
• Project Period (FY): 2011-04-01 – 2014-03-31
• Project Status: Completed (Fiscal Year 2013)
• Budget Amount: ¥18,850,000 (Direct Cost: ¥14,500,000、Indirect Cost: ¥4,350,000); Fiscal Year 2013: ¥3,510,000 (Direct Cost: ¥2,700,000、Indirect Cost: ¥810,000); Fiscal Year 2012: ¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000); Fiscal Year 2011: ¥10,270,000 (Direct Cost: ¥7,900,000、Indirect Cost: ¥2,370,000)
• Keywords: 混相流 / 極低温 / 微粒化 / 熱伝達 / ナノ洗浄 / 冷却 / 固体窒素 / 噴霧 / 相変化

Research Abstract

The basic characteristics of a thermomechanical resist removal-cleaning system using cryogenic micro-nano solid nitrogen spray flow was investigated using a new type of integrated measurement coupled numerical technique. The effect of ultra-high heat flux cooling on the resist removal performance due to the thermal contraction of resist material was clarified. It was numerically predicted that resist removal performance could be improved by the scraping effect of impinging micro-solid nitrogen particle with plastic deformation in the narrow region between the resist. Furthermore, it was numerically and experimentally found that the hybrid interactive effects of fluid mechanical force by impingement of micro-solid particles and the thermomechanical effect due to ultra-high heat transfer characteristics contribute to the resist removal-cleaning process.

Research Products

• [Journal Article] Photoresist Removal-Cleaning Technology Using Cryogenic Micro-Solid Nitrogen Spray (2014)
  • Author(s): Jun Ishimoto, U. Oh, Tomoki Koike and Naoya Ochiai
  • Journal Title: ECS Journal of Solid State Science and Technology (JSS Focus Issue on Semiconductor Surface Cleaning and Conditioning) Volume: Vol.3,No.1 Issue: 1 Pages: N3046-N3053
  • DOI: 10.1149/2.009401jss
  • Peer Reviewed
• [Journal Article] Ultra-High Heat Flux Cooling Characteristics of Cryogenic Micro-Solid Nitrogen Particles and Its Application to Semiconductor Wafer Cleaning Technology (2014)
  • Author(s): Jun Ishimoto, U Oh, Zhao Guanghan, Tomoki Koike and Naoya Ochiai
  • Journal Title: Advances in Cryogenic Engineering Volume: Vol.59 Pages: 1099-1106
  • DOI: 10.1063/1.4860828
  • Peer Reviewed
• [Journal Article] Numerical Analysis of Single Bubble Behavior in a Megasonic Field by Non-Spherical Eulerian Simulation (2014)
  • Author(s): Naoya Ochiai and Jun Ishimoto
  • Journal Title: ECS Journal of Solid State Science and Technology (JSS Focus Issue on Semiconductor Surface Cleaning and Conditioning) Volume: 3 Issue: 1 Pages: N3112-N3117
  • DOI: 10.1149/2.020401jss
  • Peer Reviewed
• [Journal Article] Cryogenic Single-Component MicroNano Solid Nitrogen Particle Production Using Laval Nozzle for Physical Resist Removal-Cleaning Process (2013)
  • Author(s): Jun Ishimoto, U Oh, Tomoki Koike, and Naoya Ochiai
  • Journal Title: ECS Transactions Volume: Vol.58, No.6 Issue: 6 Pages: 231-239
  • DOI: 10.1149/05806.0231ecst
  • Peer Reviewed
• [Journal Article] Integrated Computational Study of Ultra-High Heat Flux Cooling Using Cryogenic Micro-Solid Nitrogen Spray (Top 25 Hottest Articles in Cryogenics, July to September 2012, 15th) (2012)
  • Author(s): Jun Ishimoto, U Oh, Daisuke Tan
  • Journal Title: Cryogenics Volume: Volume52,Issue10 Issue: 10 Pages: 505-517
  • DOI: 10.1016/j.cryogenics.2012.07.002
  • Peer Reviewed
• [Journal Article] Thermomechanical Resist RemovalCleaning System Using Cryogenic Micro-Slush Jet (2012)
  • Author(s): Jun Ishimoto, Daisuke Tan, Hiroto Otake and Seiji Samukawa
  • Journal Title: Solid State Phenomena Volume: Vol.187 Pages: 145-148
  • Peer Reviewed
• [Journal Article] Ultra-Cooling Heat Transfer Characteristics Using Cryogenic Micosolid Nitrogen Spray (2012)
  • Author(s): U Oh, Jun Ishimoto, Naoki Harada and Daisuke Tan
  • Journal Title: Proceedings of the ASME 2012 Summer Heat Transfer Conference Volume: (CD-ROM)
  • Peer Reviewed
• [Journal Article] Thermomechanical Resist Removal-Cleaning System Using Cryogenic Micro-Slush Jet (2012)
  • Author(s): Jun Ishimoto, Daisuke Tan, Hiroto Otake and Seiji Samukawa
  • Journal Title: Solid State Phenomena Volume: 187 Pages: 145-148
  • DOI: 10.4028/www.scientific.net/ssp.187.145
  • Peer Reviewed
• [Journal Article] Ultra-Cooling Heat Transfer Characteristics Using Cryogenic Micro-Solid Nitrogen Spray (2012)
  • Author(s): U Oh, Jun Ishimoto, Naoki Harada and Daisuke Tan
  • Journal Title: Proceedings of the ASME 2012 Heat Transfer Summer Conference collocated with the ASME 2012 Fluids Engineering Division Summer Meeting Volume: 2 Pages: 531-538
  • DOI: 10.1115/ht2012-58494
  • Peer Reviewed
• [Journal Article] ULTRA-COOLING HEAT TRANSFER CHARACTERISTICS USING CRYOGENIC MICRO-SOLID NITROGEN SPRAY (2012)
  • Author(s): U Oh
  • Journal Title: Proceedings of the ASME 2012 Summer Heat Transfer Conference Volume: 1
  • Peer Reviewed
• [Journal Article] Integrated Experimental and Numerical Study of Thermomechanical Resist Removal-Cleaning Performance Using Cryogenic Micro-Solid Nitrogen Spray (2011)
  • Author(s): Jun Ishimoto, Daisuke Tan, U Oh, Tomohiro Kubota and Seiji Samukawa
  • Journal Title: ECS Transactions Volume: Vol.41,No.5 Pages: 83-90
  • Peer Reviewed
• [Presentation] Cryogenic Single-Component MicroNano Solid Nitrogen Particle Production Using Laval Nozzle for Physical Resist Removal-Cleaning Process (2013)
  • Author(s): Jun Ishimoto, U Oh, Tomoki Koike, and Naoya Ochiai
  • Organizer: 224th ECS Meeting, San Francisco, CA
  • Place of Presentation: Hilton San Francisco, USA
• [Presentation] Ultra-High Heat Flux Cooling Characteristics of Cryogenic Micro-Solid Nitrogen Particles (2013)
  • Author(s): Jun Ishimoto, Naoya Ochiai and Kozo Saito
  • Organizer: Tenth International Conference on Flow Dynamics (ICFD2013)
  • Place of Presentation: Sendai International Center, Sendai, Japan
• [Presentation] Multiphase high density hydrogen energy and its risk mitigation, safety problems (2013)
  • Author(s): Jun Ishimoto
  • Organizer: KTH International Workshop on Flow Dynamics related to Energy, Aerospace and Material Processing, KTH
  • Place of Presentation: Stockholm, Sweden
• [Presentation] Ultra-High Heat Flux Cooling Characteristics of Cryogenic Micro-Solid Nitrogen Particles and Its Application to Semiconductor Wafer Cleaning Technology (2013)
  • Author(s): Jun Ishimoto, U Oh, Zhao Guanghan, Tomoki Koike and Naoya Ochiai
  • Organizer: Cryogenic Engineering Conference and the International Cryogenic Materials Conference (CEC-ICMC)
  • Place of Presentation: Dena'ina Civic and Convention Center, Anchorage, Alaska, USA
• [Presentation] Physical Nano-Device Cleaning Technology Using Thermomechanical Effect of Cryogenic Solid Nitrogen (2013)
  • Author(s): U Oh, Jun Ishimoto and Jin-Goo Park
  • Organizer: 2013 ELyT Laboratory Workshop in Zao To-o-gatta
  • Place of Presentation: Zao To-o-gatta, Japan
• [Presentation] 極低温マイクロ・ナノ固体窒素噴霧を用いたレジストはく離・洗浄特性に関する基礎研究 (2012)
  • Author(s): 石本淳
  • Organizer: 第73回応用物理学会学術講演会,界面ナノ電子化学 : 産業界と学術界との界面融合へ(界面ナノ電子化学研究会企画)
  • Place of Presentation: 愛媛大学,松山市
  • Year and Date: 2012-09-11
  • Invited
• [Presentation] Thermomechanical Resist RemovalCleaning Technology Using Cryogenic Micro-Solid Nitrogen Spray (2011)
  • Author(s): Jun Ishimoto
  • Organizer: Proceedings of The 14th Surface Cleaning Users Group Meeting, Cleaning Technology Symposium (KSCUGM)
  • Place of Presentation: Hanyang University, ERICA Campus, Ansan, Korea
  • Year and Date: 2011-11-24
  • Invited
• [Presentation] マイクロ固体窒素噴霧流を用いた超高熱流束冷却と新型半導体洗浄法の開発 (2011)
  • Author(s): 王 宇(東北大), 丹 大輔(東燃化学), 石本 淳(東北大)
  • Organizer: 日本混相流学会年会講演会2011 オーガナイズドセッション(OS-6 サステナブル異分野融合型混相流)
  • Place of Presentation: 京都工芸繊維大学(京都市)
• [Presentation] Ultra-High Heat Flux Cooling Characteristics of Cryogenic Micro-Solid Nitrogen Particles and Its Application to Semiconductor Wafer Cleaning Technology
  • Author(s): Jun Ishimoto
  • Organizer: Cryogenic Engineering Conference and the International Cryogenic Materials Conference (CEC-ICMC), June 17th to 21st, 2013
  • Place of Presentation: Anchorage, Alaska, USA
• [Presentation] Cryogenic Single-Component Micro-Nano Solid Nitrogen Particle Production Using Laval Nozzle for Physical Resist Removal-Cleaning Process
  • Author(s): Jun Ishimoto
  • Organizer: 224th ECS Meeting
  • Place of Presentation: San Francisco, CA, USA
• [Presentation] Ultra-High Heat Flux Cooling Characteristics of Cryogenic Micro-Solid Nitrogen Particles
  • Author(s): Jun Ishimoto
  • Organizer: Tenth International Conference on Flow Dynamics (ICFD2013)
  • Place of Presentation: Sendai, Japan
• [Presentation] Multiphase high density hydrogen energy and its risk mitigation, safety problems
  • Author(s): Jun Ishimoto
  • Organizer: KTH International Workshop on Flow Dynamics related to Energy, Aerospace and Material Processing
  • Place of Presentation: KTH, Stockholm, Sweden
• [Presentation] Multiphase High Density Hydrogen Energy and its Risk Assessment
  • Author(s): Jun Ishimoto
  • Organizer: International Symposium on Innovative Energy Research
  • Place of Presentation: Sendai, Japan
  • Invited
• [Presentation] Thermomechanical Resist Removal‐Cleaning Technology Using Cryogenic Micro‐Nano Solid Nitrogen Spray
  • Author(s): Jun Ishimoto
  • Organizer: Center for High-rate Nanomanufacturing Fall Seminar Series
  • Place of Presentation: Northeastern University, Boston, USA
  • Invited
• [Presentation] Thermomechanical Nano Device Resist Removal-Cleaning Technology by Using Cryogenic Spray Flow of Solid Nitrogen
  • Author(s): U Oh
  • Organizer: 12th International Symposium on Advanced Fluid Information and Transdisciplinary Fluid Integration, AFI/TFI-2012
  • Place of Presentation: Sendai, Miyagi, Japan
• [Presentation] Integrated Research Collaboration for Frontier Science of Next Generation Reactive Fluid
  • Author(s): Jun Ishimoto
  • Organizer: 12th International Symposium on Advanced Fluid Information and Transdisciplinary Fluid Integration, AFI/TFI-2012
  • Place of Presentation: Presqu'ile de Giens, France
• [Presentation] 微細固体窒素スプレーを用いたウエハレジストはく離－洗浄特性に関する研究
  • Author(s): 王 宇
  • Organizer: 混相流学会年会講演会2012
  • Place of Presentation: 東京大学 柏キャンパス
• [Presentation] Innovative Nano-Device Cleaning Technology Using Cryogenic Spray Flow of Micro-Solid Nitrogen
  • Author(s): Jun Ishimoto
  • Organizer: Painting Technology Workshop (PTW2012), October 30-31st, 2012
  • Place of Presentation: Lexington, Kentucky, USA
  • Invited
• [Presentation] New technology for physical photoresist removal-cleaning method using cryogenic micro-solid nitrogen spray
  • Author(s): Jun Ishimoto
  • Organizer: Annual Workshop of ELyT Laboratory
  • Place of Presentation: Presqu'ile de Giens, France
  • Invited
• [Presentation] Innovative Wafer Resist Removal-Cleaning Technology by Using Smart Cryogenic Spray Flow of Solid Nitrogen,
  • Author(s): U Oh
  • Organizer: Technical Congress of Progress and Innovation for Smart Materials and Related Technology (PI-SMART)
  • Place of Presentation: Hirosaki, Japan
  • Invited
• [Remarks]
  • URL: http://alba.ifs.tohoku.ac.jp/
• [Remarks] 反応性混相流の活用によるナノデバイスクリーニング
  • URL: http://alba.ifs.tohoku.ac.jp/
• [Patent(Industrial Property Rights)] 一成分極低温微細固体粒子連続生成装置,および,その一成分極低温微細固体粒子連続生成方法 (2013)
  • Inventor(s): 石本淳
  • Industrial Property Rights Holder: 石本淳
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 2013-125074
  • Filing Date: 2013-06-13
• [Patent(Industrial Property Rights)] 一成分極低温微細固体粒子連続生成装置，および，その一成分極低温微細固体粒子連続生成方法 (2013)
  • Inventor(s): 石本淳
  • Industrial Property Rights Holder: 石本淳
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 2013-125074
  • Filing Date: 2013-06-13