| Budget Amount *help |
¥19,500,000 (Direct Cost: ¥15,000,000、Indirect Cost: ¥4,500,000)
Fiscal Year 2013: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2012: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2011: ¥10,400,000 (Direct Cost: ¥8,000,000、Indirect Cost: ¥2,400,000)
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| Research Abstract |
GaN-based HEMTs have attractive for high power switching applications. Normally-off operation was one of major requirements for AlGaN/GaN HEMTs. However, realization of normally-off operation with high drain cuurent is difficult due to the existence of two-dimensional electron gas in heterointerface induced piezo and spontaneous polarization charges. Selective area growth (SAG) technique is one of solutions for normally-off operation.
In this study, I report normally-off AlGaN/GaN HEMTs with SAG of an AlGaN layer and deposition of an Al2O3 film on an AlGaN/GaN heterostructure designed to be completely depleted. Adopting AlGaN regrowth in a selective area and Al2O3 film deposition for the access region of the HEMT, the normall-off operation of AlGaN/GaN HEMT was demonstrated. The device showed the drain current density of 160 mA/mm and the threshold voltgae of 0.4 V.
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