| Project/Area Number |
23360161
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Electron device/Electronic equipment
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| Research Institution | Keio University |
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Principal Investigator |
OBARA Minoru 慶應義塾大学, 理工学部, 名誉教授 (90101998)
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| Co-Investigator(Kenkyū-buntansha) |
SAIKI Toshiharu 慶應義塾大学, 理工学部, 教授 (70261196)
TSUDA Hiroyuki 慶應義塾大学, 理工学部, 教授 (90327677)
TERAKAWA Mitsuhiro 慶應義塾大学, 理工学部, 専任講師 (60580090)
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| Project Period (FY) |
2011-04-01 – 2014-03-31
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥20,020,000 (Direct Cost: ¥15,400,000、Indirect Cost: ¥4,620,000)
Fiscal Year 2013: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Fiscal Year 2012: ¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000)
Fiscal Year 2011: ¥11,440,000 (Direct Cost: ¥8,800,000、Indirect Cost: ¥2,640,000)
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| Keywords | ナノプロセシング / ミー散乱 / 表面プラズモニック散乱 / 散乱近接場・遠方場 / フェムト秒レーザー / 表面周期構造 / FDTD法 / フェムト秒レーザ / 表面周期構造作製 / 近接場光加工 / 表面プラズモン / 近接場光トラップ / 表面周期リップル / プラズモン制御 / フェムト秒レーザプロセシング |
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| Research Abstract |
An enhanced near-field scattered from nanostructures is localized to the nano-scale zone, and is then used for nano-ablation processing of a variety of advanced functional materials. This report presents theoretically and experimentally the characteristics of near-field and nano-ablation in terms of femtosecond laser polarization, irradiation angles, scattering structures, scattering materials, work materials. Near-fields from plasmonic scattering and Mie scattering are clearly explained. In addition to the enhanced near-field processing, the mechanism of surface ripples formed by the interference of the incident femtosecond laser and the scattered far-field light is well explained by using the 3D FDTD method. The nano-patterned surfaces fabricated these methods can potentially be used for surface photonic devices.
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