Development of novel plasma-enhanced processes for low-temperature formation of high quality oxide semiconductor films

• Project/Area Number: 23360325
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Material processing/treatments
• Research Institution: Osaka University
• Principal Investigator: SETSUHARA Yuichi 大阪大学, 接合科学研究所, 教授 (80236108)
• Co-Investigator(Renkei-kenkyūsha): TAKENAKA Kosuke 大阪大学, 接合科学研究所, 助教 (60432423)
• Project Period (FY): 2011-04-01 – 2014-03-31
• Project Status: Completed (Fiscal Year 2013)
• Budget Amount: ¥18,980,000 (Direct Cost: ¥14,600,000、Indirect Cost: ¥4,380,000); Fiscal Year 2013: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000); Fiscal Year 2012: ¥7,410,000 (Direct Cost: ¥5,700,000、Indirect Cost: ¥1,710,000); Fiscal Year 2011: ¥8,320,000 (Direct Cost: ¥6,400,000、Indirect Cost: ¥1,920,000)
• Keywords: プラズマ加工 / 低損傷プロセス / 反応性製膜 / 半導体薄膜 / 低温形成 / 酸化物半導体

Research Abstract

This research project has been carried out for development of novel plasma-enhanced processes to form high quality oxide semiconductor films at low substrate temperature using inductively coupled high-density low-damage plasma sources sustained with low-inductance antenna. The results of the present project have exhibited that good quality semiconductor films can be successfully formed at substrate temperatures as low as or lower than those acceptable for processing of a variety of polymers.

Research Products

• [Journal Article] プラズマを用いたソフトマテリアルプロセス技術の展開 ～低温・低ダメージの材料プロセスからプラズマ医療～ (2014)
  • Author(s): 節原 裕一
  • Journal Title: スマートプロセス学会誌 Volume: 3 Pages: 15-21
  • NAID: 130004972746
  • Peer Reviewed
• [Journal Article] Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity- Controlled Deposition of Microcrystalline Silicon Thin Films (2013)
  • Author(s): Kosuke Takenaka, Yuichi Setsuhara and Akinori Ebe
  • Journal Title: Japanese Journal of Applied Physics Volume: 52 Issue: 11S Pages: 11NB05-11NB05
  • DOI: 10.7567/jjap.52.11nb05
  • NAID: 210000143099
  • Peer Reviewed
• [Journal Article] Plasma interaction with Zn nano layer on organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation (2013)
  • Author(s): Ken Cho, Kosuke Takenaka, Yuichi Setsuhara
  • Journal Title: Surface and Coatings Technology Volume: 228 Pages: S271-S275
  • DOI: 10.1016/j.surfcoat.2012.05.126
  • Peer Reviewed
• [Journal Article] Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation (2012)
  • Author(s): Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori
  • Journal Title: Thin Solid Films Volume: 523 Pages: 15-19
  • DOI: 10.1016/j.tsf.2012.05.061
  • Peer Reviewed
• [Journal Article] Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas (2012)
  • Author(s): Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori
  • Journal Title: Jpn. J. Appl. Phys. Volume: 51 Issue: 1S Pages: 01AJ02-01AJ02
  • DOI: 10.1143/jjap.51.01aj02
  • NAID: 210000140089
  • Peer Reviewed
• [Journal Article] フレキシブルデバイス創製に向けたプラズマーソフトマテリアル相互作用の解析 (2011)
  • Author(s): 趙研, 節原裕一, 竹中弘祐, 白谷正治, 関根誠, 堀勝
  • Journal Title: 高温学会誌 Volume: 37 Pages: 289-297
  • NAID: 10030167027
  • Peer Reviewed
• [Presentation] RF plasma sources for PECVD and soft-material processes (2014)
  • Author(s): Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka and Akinori Ebe
  • Organizer: The International Symposium on Plasma-Nano Materials and Processes
  • Place of Presentation: Seoul, Korea
  • Invited
• [Presentation] Properties of ICP-Enhanced Reactive Sputter Discharge for Formation of Advanced Semiconductor Films (2014)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Soichiro Osaki, Yutaro Suyama, Hirofumi Ohtani, Atsuki Kanai
  • Organizer: 6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014) / 7th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2014)
  • Place of Presentation: Nagoya, Japan
• [Presentation] Plasma-Enhanced Reactivity- Controlled Sputter Deposition Process for Low-Temperature Formation of Semiconductor Films (2014)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Atsuki Kanai, Soichiro Osaki
  • Organizer: 8th International Conference on Reactive Plasmas (ICRP- 8)/31st Symposium on Plasma Processing (SPP-31)
  • Place of Presentation: Fukuoka, Japan
• [Presentation] 高品質半導体薄膜作製のためのプラズマ支援反応性スパッタリングプロセスの高度制御性 (2014)
  • Author(s): 節原 裕一, 竹中 弘祐, 大崎 創一郎, 陶山 悠太郎, 大谷 浩史, 金井 厚毅, 江部 明憲
  • Organizer: 第61回応用物理学会春季学術講演会
  • Place of Presentation: 東京
• [Presentation] Properties of ICP-Enhanced Reactive Sputter Discharge for Formation of Advanced Semiconductor Films (2014)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Soichiro Osaki, Yutaro Suyama, Hirofumi Ohtani, Atsuki Kanai
  • Organizer: 6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014)
  • Place of Presentation: Nagoya, Japan
• [Presentation] Plasma-Enhanced Reactivity-Controlled Sputter Deposition Process for Low-Temperature Formation of Semiconductor Films (2014)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Atsuki Kanai, Soichiro Osaki
  • Organizer: 8th International Conference on Reactive Plasmas (ICRP-8)/31st Symposium on Plasma Processing (SPP-31)
  • Place of Presentation: Fukuoka, Japan
• [Presentation] Development of advanced ICP-enhanced reactive sputter deposition technologies for flexible devices (2013)
  • Author(s): Yuichi Setsuhara
  • Organizer: The workshop of the Joint Institute for Plasma Nano Materials (IPNM)
  • Place of Presentation: Nagoya, Japan
  • Year and Date: 2013-10-23
  • Invited
• [Presentation] Advanced reactive sputter deposition system enhanced with ICPs driven by new type of low- inductance antenna modules (2013)
  • Author(s): Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka and Akinori Ebe
  • Organizer: International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2013)
  • Place of Presentation: Las Vegas, USA
  • Invited
• [Presentation] 高品質半導体薄膜作製のためのプラズマ支援反応性スパッタリングプロセスの高度制御 (2013)
  • Author(s): 節原 裕一, 竹中 弘祐, 大谷 浩史, 金井 厚毅, 大崎 創一郎, 江部 明憲
  • Organizer: 第74回応用物理学会学術講演会
  • Place of Presentation: 京都
• [Presentation] ICP-Enhanced Reactive Sputter Deposition Processes for Low-Temperature Formation of IGZO TFT (2013)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
  • Organizer: 35th International Symposium on Dry Process (DPS2013)
  • Place of Presentation: Jeju, Korea
• [Presentation] ICP-Enhanced Reactivity-Controlled Sputter Deposition with New Type of Low-Inductance Antenna Modules for High-Rate and Large-Area Deposition of Functional Films (2013)
  • Author(s): Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka, Akinori Ebe
  • Organizer: The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013)
  • Place of Presentation: Jeju, Korea
• [Presentation] Advanced reactive sputter deposition system enhanced with ICPs driven by new type of low-inductance antenna modules (2013)
  • Author(s): Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka, Akinori Ebe
  • Organizer: International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2013)
  • Place of Presentation: Las Vegas, USA
  • Invited
• [Presentation] Control Capability of ICP-Enhanced Reactive Sputtering System with Inner Type Low-Inductance Antenna Modules (2013)
  • Author(s): Yuichi Setsuhara, Soichiro Osaki, Hirofumi Otani, Atsuki Kanai, Kosuke Takenaka, Akinori Ebe
  • Organizer: 第23回日本MRS年次大会
  • Place of Presentation: 横浜
• [Presentation] Controllability of Plasma-Enhanced Reactive Sputter Deposition Process with ICPs Sustained by Multiple Inner Type Low-Inductance Antenna Modules (2013)
  • Author(s): Yuichi Setsuhara, Soishiro Osaki, Kosuke Takenaka, Akinori Ebe
  • Organizer: 第26回プラズマ材料科学シンポジウム(SPSM26)
  • Place of Presentation: 福岡
• [Presentation] Low-Temperature Formation of Semiconductor Films via ICP-Enhanced Reactive Sputtering for Development of Advanced Flexible Devices (2013)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Hirofimi Ohtani, Akinori Ebe
  • Organizer: 第30回プラズマプロセシング研究会
  • Place of Presentation: 浜松
• [Presentation] ICP-Enhanced Reactive Sputtering with Multiple Inner Type Low-Inductance Antenna Modules for Large-Area Formation of Thin Film Devices (2013)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
  • Organizer: 5rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
  • Place of Presentation: Nagoya, Japan
• [Presentation] Designing Plasma-Enhanced Magnetron Sputtering with Low-Inductance Antenna Modules (2013)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
  • Organizer: The 6th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2013)
  • Place of Presentation: Gifu, Japan
• [Presentation] 高品質半導体薄膜作製のためのプラズマ支援反応性スパッタリングプロセスの高度制御性 (2013)
  • Author(s): 節原裕一、竹中弘祐、大谷浩史、金井厚毅、江部明憲
  • Organizer: 第60回応用物理学関係連合講演会
  • Place of Presentation: 厚木
• [Presentation] Plasma- Enhanced Sputtering Assisted with ICP via New Type of Low-Inductance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films (2012)
  • Author(s): Yuichi Setsuhara, Yasufumi Ohchi, Ken Cho, Kosuke Takenaka, Akinori Ebe
  • Organizer: 13th International Conference on Plasma Surface Engineering
  • Place of Presentation: Garmisch-Partenkirchen, Germany
  • Year and Date: 2012-09-13
• [Presentation] Yuichi Setsuhara, Yasufumi OhchiKen Cho, Kosuke Takenaka, Akinori EbePlasma-Enhanced Sputtering Assisted with ICP via New Type of Low-Induetance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films (2012)
  • Author(s): Yuichi Setsuhara, Yasufumi OhchiKen Cho, Kosuke Takenaka, Akinori Ebe
  • Organizer: 13th International Conference on Plasma Surface Engineering
  • Place of Presentation: Garmisch-Partenkirchen, Germany
  • Year and Date: 2012-09-13
• [Presentation] Process Control Capabilities of ICP-Enhanced Sputter Discharge for Reactive Large-Area Deposition of Functional Films (2012)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka and Akinori Ebe
  • Organizer: The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
  • Place of Presentation: Seoul, Korea
  • Year and Date: 2012-06-08
  • Invited
• [Presentation] Process Control Capabilities of ICP-Enhanced Sputter Discharge for Reactive Large-Area Deposition of Functional Films (2012)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
  • Organizer: The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
  • Place of Presentation: Seoul, Korea(招待講演)
  • Year and Date: 2012-06-08
• [Presentation] Plasma-Enhanced Reactive Sputter Deposition with Low-Inductance Antenna for Low-Temperature Fabrication of Flexible Photovoltaic Devices (2012)
  • Author(s): Yuichi Setsuhara
  • Organizer: The 6th International Conference on Technological Advances of Thin Films & Surface Coatings
  • Place of Presentation: Singapore(招待講演)
  • Year and Date: 2012-01-15
• [Presentation] ICP-Assisted Reactive Sputter-Deposition with Inner-Type Low-Inductance Antenna (LIA) (2012)
  • Author(s): Yuichi Setsuhara, Akinori Ebe
  • Organizer: The 14th International Workshop on Advanced Plasma Processing andDiagnostics, The 2nd Workshop for NU-SKKU Joint Institute for Plasma-NanoMaterials
  • Place of Presentation: Fukuoka, Japan(招待講演)
  • Year and Date: 2012-01-08
• [Presentation] プラズマ支援反応性スパッタリング法による透明アモルファス酸化物半導体薄膜トランジスタ低温形成技術の開発 (2012)
  • Author(s): 節原 裕一, 趙 研, 大地 康史, 竹中弘祐, 江部 明憲
  • Organizer: 第59回応用物理学関係連合講演会
  • Place of Presentation: 東京
• [Presentation] Plasma-Enhanced Reactive Sputter Deposition with Low-Inductance Antenna for Low-Temperature Fabrication of Flexible Photovoltaic Devices (2012)
  • Author(s): Yuichi Setsuhara
  • Organizer: The 6th International Conference on Technological Advances of Thin Films & Surface Coatings
  • Place of Presentation: Singapore
  • Invited
• [Presentation] Plasma-Enhanced Sputtering Assisted with ICP via New Type of Low-Inductance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films (2012)
  • Author(s): Yuichi Setsuhara, Yasufumi Ohchi, Ken Cho, Kosuke Takenaka, Akinori Ebe
  • Organizer: 13th International Conference on Plasma Surface Engineering
  • Place of Presentation: Garmisch-Partenkirchen, Germany
• [Presentation] Process Control Capabilities Of Plasma-Enhanced Reactive Sputter Deposition With New Type Of Low-Inductance-Antenna Driven ICP For Large-Area Formation Of Semiconductor Films (2012)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Akinori Ebe
  • Organizer: Joint conference on the 11th Asia Pacific Conference on Plasma Science and Technology (11th APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)
  • Place of Presentation: Kyoto, Japa
• [Presentation] Control Capabilities of Reactive Sputter Deposition Process via ICPs Driven by Low-Inductance Antenna for Large-Area Formation of Thin Film Devices (2012)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
  • Organizer: 65th Annual Gaseous Electronics Conference
  • Place of Presentation: Texas, USA
• [Presentation] Development of ICP-Enhanced Reactive Sputtering System with Multiple Low-Inductance Antenna Modules for Large-Area Deposition of Silicon Films (2012)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
  • Organizer: 34th International symposium on Dry Process
  • Place of Presentation: Tokyo, Japan
• [Presentation] プラズマ支援反応性スパッタリング法を用いた長尺基板対応大面積プラズマスパッタシステムの開発 (2012)
  • Author(s): 竹中弘祐, 節原裕一, 江部明憲
  • Organizer: 第73回応用物理学会学術講演会
  • Place of Presentation: 松山
• [Presentation] ICP-Enhanced Reactive Processes with Low-Inductance Antenna (2012)
  • Author(s): Yuichi Setsuhara, Kosuke Takenaka, Ken Cho, Akinori Ebe
  • Organizer: The 5th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2012)
  • Place of Presentation: Aichi, Japan
• [Presentation] Plasma-Assisted Sputtering with ICP Driven by Inner-Type Low-Inductance Antenna (2012)
  • Author(s): Yuichi Setsuhara, Ken Cho,Kosuke Takenaka, Akinori Ebe
  • Organizer: 4th International Symposi凵m on Advanced PlasmaScience and its Applications (ISPIasma 2012)
  • Place of Presentation: Aichi, Japan
• [Presentation] 埋め込み型低インダクタンスアンテナを用いたプラズマ支援反応性スパッタリング法により作製したa-IGZO膜の特性評価 (2011)
  • Author(s): 大地康史, 趙研, 竹中弘祐, 節原裕一, 江部明憲
  • Organizer: 応用物理学会プラズマエレクトロニクス分科会20周年(研究会創設25周年)記念特別シンポジウム
  • Place of Presentation: 名古屋
  • Year and Date: 2011-10-22
• [Presentation] Plasma-Assisted Deposition of Functional Thin Films and Process Analyses for Development of Flexible Electronics (2011)
  • Author(s): Yuichi Setsuhara
  • Organizer: International Union of Materials Research Society (IUMRS)- International Conference in Asia (ICA) 2011
  • Place of Presentation: Taipei, Taiwan
  • Year and Date: 2011-09-20
  • Invited
• [Presentation] Plasma-Assisted Deposition of Functional Thin Films and Process Analyses for Development of Flexible Electronics (2011)
  • Author(s): Yuichi Setsuhara
  • Organizer: International Union of Materials Research Society (IUMRS)-lnternational Conference in Asia (ICA) 2011
  • Place of Presentation: Taipei, Taiwan(招待講演)
  • Year and Date: 2011-09-20
• [Presentation] Development of Plasma-Enhanced Reactive Large-Area Processes (2011)
  • Author(s): Yuichi Setsuhara, Akinori Ebe
  • Organizer: Advanced Plasma Technology for Green Energy and Biomedical Apllications
  • Place of Presentation: Chiangmai, Thailand(招待講演)
  • Year and Date: 2011-08-12
• [Presentation] Development of Inner-Type ICPs for Reactive Large-Area Processes (2011)
  • Author(s): Yuichi Setsuhara, Akinori Ebe
  • Organizer: The 13th International Workshop on Advanced Plasma Processing and Diagnostics
  • Place of Presentation: Deajeon, Korea(招待講演)
  • Year and Date: 2011-07-22
• [Presentation] Development of ICP-assisted sputter process for large-area production of thin-film solar cells (2011)
  • Author(s): Yuichi Setsuhara
  • Organizer: 2011 International Workshop on Environment and Resources
  • Place of Presentation: New Taipei City, Taiwa(招待講演)
  • Year and Date: 2011-06-18
• [Presentation] Characterization of Inductively-Coupled RF Plasmas with Inner-Type Low-Inductance Antennas and Application to Plasma-Assisted Reactive Sputter Deposition (2011)
  • Author(s): Ken Cho, Yasufumi Ohchi, Kosuke Takenaka, Yuichi Setsuhara
  • Organizer: 第21回日本MRS学術シンポジウム
  • Place of Presentation: 横浜
• [Presentation] Development of Low-Damage Reactive Sputter Deposition Processes with lnner-Type Low Inductance Antenna (2011)
  • Author(s): Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Akinori Ebe
  • Organizer: Plasma Conference 2011
  • Place of Presentation: Ishikawa, Japan
• [Presentation] 埋込型低インダクタンスアンテナによるプラズマ生成技術の開発と大面積・低ダメージ反応性プロセスへの応用 (2011)
  • Author(s): 節原裕一, 趙研, 竹中弘祐, 江部明憲
  • Organizer: 第72回応用物理学会学術講演会
  • Place of Presentation: 山形