Establishment of hybrid ring-shaped hollow discharge and application to large-diameter high-density plasma source
| Project/Area Number |
23540577
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (C)
|
| Allocation Type | Multi-year Fund |
|---|
| Section | 一般 |
|---|
| Research Field |
Plasma science
|
|---|
| Research Institution | Saga University |
|---|
Principal Investigator |
OHTSU Yasunori 佐賀大学, 工学(系)研究科(研究院), 准教授 (50233169)
|
|---|
| Project Period (FY) |
2011 – 2013
|
| Project Status |
Completed (Fiscal Year 2013)
|
| Budget Amount *help |
¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2013: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
|
|---|
| Keywords | ハイブリッドリングホロー放電 / ホロー陰極効果 / 容量結合放電 / 2次電子放出係数 / 多重リング状ホロー電極 / ２次電子放出係数 / ガンマ作用 / 容量結合プラズマ / 粒子シミュレーション / ハイブリッドリングﾎﾛ-放電 |
|---|
| Research Abstract |
Radio frequency(RF) capacitively coupled discharge plasma is widely used for the preparation of functional thin films which play an important role for solar panel and liquid crystal display devices. However, the RF capacitively coupled plasma has a weak point that the productivity of the thin films is very low. Thus, high-density plasma source is required from the microelectronic industry. In this work, a novel plasma production method is proposed and is confirmed. The requirement is attained by the combination between ring-shaped hollow electrode and the coating of high secondary electron emission material to the electrode. In future, this proposal can be attained by developing the scale-up.
|
Report
(4 results)
Research Products
(36 results)
