Large-area stacked silicon photonics based on amorphous Si
Project/Area Number |
23560036
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Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Applied optics/Quantum optical engineering
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Research Institution | University of Fukui |
Principal Investigator |
KATSUYAMA TOSHIO 福井大学, 工学(系)研究科(研究院), 教授 (90467134)
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Co-Investigator(Kenkyū-buntansha) |
WADA Yasuo 東洋大学, 大学院学際・融合科学研究科, 教授 (50386736)
AOKI Kanna 神戸大学, 自然科学系先端融合研究環重点研究部, 助教 (90332254)
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Project Period (FY) |
2011-04-28 – 2015-03-31
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Project Status |
Completed (Fiscal Year 2014)
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Budget Amount *help |
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2013: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2012: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2011: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
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Keywords | シリコンフォトニクス / アモルファス・シリコン / Si細線導波路 / フォトニック結晶 / ベータ鉄シリサイド / シリコン細線導波路 |
Outline of Final Research Achievements |
We have studied optical devices based on amorphous Si (a-Si) in order to realize new large-area stacked structures composing silicon-based optical circuits. We have thus realized (1) an air-bridge-type a-Si slab structure with a large area (20 μm square), (2) a two-layered stacked optical circuit composed of an a-Si wire waveguide with an a-Si grating layer mediated by a SiO2 layer, and (3) a directional-coupler-type stacked light-emitting device composed of an a-Si wire waveguide with a β-FeSi2 light-emitting layer mediated by a SiO2 layer. As a result, it is shown that various stacked optical circuits can be realized by using a-Si material.
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Report
(5 results)
Research Products
(29 results)
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[Journal Article] Amorphous Si waveguides with high-quality stacked gratings for multi-layer Si optical circuits2014
Author(s)
H. Tokushige, T. Endo, K. Saiki, K. Hiidome, S. Kitamura, T. Katsuyama, M. Tokuda, H. Takagi, M. Morita, Y. Ito, K. Tsutsui, Y. Wada, N. Ikeda and Y. Sugimoto
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Journal Title
Photonics and Nanostructures - Fundamentals and Applications
Volume: 12
Pages: 501-507
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Peer Reviewed / Acknowledgement Compliant
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[Presentation] Fabrication of Si wire waveguides composed of amorphous Si2011
Author(s)
Y. Kitamura, T. Yamaguchi, K. Saiki, K. Hiidome, K. Kirimura, T. Katsuyama, M. Tokuda, H. Takagi, M. Morita, Y. Ito, K. Tsutsui, and Y. Wada
Organizer
17th Microoptics Conference (MOC’11)
Place of Presentation
SENDAI INTERNATIONAL CENTER, Sendai, Japan
Related Report
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[Presentation] Fabrication of slab-type photonic crystals composed of amorphous Si2011
Author(s)
T. Yamaguchi, Y. Kitamura, K. Hiidome, K. Saiki, T. Katsuyama,, M. Tokuda, H. Takagi, M. Morita, Y. Ito, K. Tsutsui, and Y. Wada
Organizer
The 1st International Symposium on Photonics and Electronics Convergence -Advanced Nanophotonics and Silicon Device Systems- (ISPEC2011)
Place of Presentation
東大
Related Report
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[Presentation] Amorphous Si waveguides with high-quality stacked gratings for multi-layer Si optical circuits
Author(s)
T. Endo, K. Saiki, K. Hiidome, H. Tokushige, T. Katsuyama, M. Tokuda, H. Takagi, M. Morita, Y. Ito, K. Tsutsui, Y. Wada, N. Ikeda, and Y. Sugimoto
Organizer
The 10th Conference on Lasers and Electro-Optics Pacific Rim(CLEO-PR 2013)
Place of Presentation
Kyoto, Japan
Related Report
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[Presentation] Annealing Behavior of Optical Transmission Loss of Amorphous Si Wire Waveguides for Silicon Photonics
Author(s)
K. Hiidome, K. Saiki, T. Endo, T. Yamaguchi, T. Yamaguchi, T. Katsuyama, M. Tokuda, H. Takagi, M. Morita, Y. Ito, K. Tsutsui, Y. Wada, N. Ikeda, Y. Sugimoto
Organizer
IUMRS-International Conference on Electronic Materials (IUMRS-ICEM 2012)
Place of Presentation
Yokohama, Japan
Related Report
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[Presentation] Compact Optical Branching Filter with a Si Slit Structure
Author(s)
K. Saiki, K. Hiidome, T. Endo, T. Yamaguchi, Y. Kitamura, T. Katsuyama, M. Tokuda, H. Takagi, M. Morita, Y. Ito, K. Tsutsui, and Y. Wada
Organizer
JSAP-OSA Joint Symposia
Place of Presentation
Matsuyama, Japan
Related Report
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