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Study on nano machining technology using fullerenol molecules

Research Project

Project/Area Number 23560129
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Production engineering/Processing studies
Research InstitutionKyushu Institute of Technology

Principal Investigator

SUZUKI Keisuke  九州工業大学, 大学院情報工学研究院, 准教授 (50585156)

Co-Investigator(Kenkyū-buntansha) KIMURA Keiichi  九州工業大学, 大学院情報工学研究院, 教授 (80380723)
KHAJORNRUNGRUNGANG Panart  九州工業大学, 先端金型センター, 助教 (60404092)
Project Period (FY) 2011 – 2013
Project Status Completed (Fiscal Year 2013)
Budget Amount *help
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2013: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2012: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2011: ¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Keywords超精密加工 / 水酸化フラーレン / 混合微粒子 / サファイアCMP / 国際情報交換 / 精密研磨 / ナノ材料 / ナノチューブ・フラーレン / 省エネルギー / マイクロ・ナノデバイス
Research Abstract

Novel functional fine particles are formed by mixing fullerenol solution and colloidal silica slurry for applying sapphire CMP. Material removal rate (MRR) of the sapphire CMP become higher than conventional colloidal silica slurry by using novel functional fine particles. In this cases, the MRR increases as the concentration of the C60(OH)n in the mixed slurry become higher. The variation of MRR against concentration of the C60(OH)n is effected by surface morphology of the sapphire substrate in this case.The fullerenol molecules such as C60(OH)n n=ca.10 are adsorbed on the colloidal silica particles for the fine particle by DLS and Raman results. From the peak shift of the DLS, we estimate that 2 layers of C60(OH)n molecules is coated around the colloidal silica particles. C60(OH)n molecules might be weakly bonded with the colloidal silica particle because the peak assigned as C60(OH)n molecules shift by the adsorption process on the Raman spectra.

Report

(4 results)
  • 2013 Annual Research Report   Final Research Report ( PDF )
  • 2012 Research-status Report
  • 2011 Research-status Report
  • Research Products

    (22 results)

All 2014 2013 2012 2011

All Journal Article (5 results) (of which Peer Reviewed: 5 results) Presentation (15 results) Patent(Industrial Property Rights) (2 results) (of which Overseas: 1 results)

  • [Journal Article] Study on Sapphire CMP slurry using fullerenol as novel functional fine particle2013

    • Author(s)
      Keisuke Suzuki et.al.
    • Journal Title

      ICOMM2014

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Study on Sapphire CMP using Fullerenol mixed slurry-Effect on the size of silica and diamond fine particles-Advanced Metallization Conference2013

    • Author(s)
      Keisuke Suzuki et.al.
    • Journal Title

      23th Asian Session (ADMETA 2013)

      Pages: 90-91

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Study on Sapphire CMP Slurry using Water-soluble Fullerenol as Fine Particles2011

    • Author(s)
      Keisuke Suzuki et. al.
    • Journal Title

      International Conference on Planarization/CMP Technology (2011 ICPT)

      Pages: 287-292

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Effect of Fullerenol as Fine Particles in Sapphire CMP Slurry2011

    • Author(s)
      Takashi Saito, Keisuke Suzuki et. al.
    • Journal Title

      International Conference on Planarization/CMP Technology (2011 ICPT)

      Pages: 502-506

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Performance of water-solble fullerenol as novel functional fine particles for sapphire CMP2011

    • Author(s)
      Keisuke Suzuki et. al.
    • Journal Title

      21th Asian Session (ADMETA2011)

      Pages: 118-119

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Presentation] Study on Sapphire CMP slurry using fullerenol as novel functional fine particle2014

    • Author(s)
      Keisuke Suzuki et.al.,
    • Organizer
      ICOMM2014
    • Place of Presentation
      Singapore
    • Related Report
      2013 Annual Research Report
  • [Presentation] 他水酸化フラーレン混合スラリーを用いたサファイアCMPに関する研究‐研磨性能における定量的評価‐2013

    • Author(s)
      村川渉,鈴木恵友
    • Organizer
      精密工学会九州支部学生研究発表会
    • Place of Presentation
      宮崎大学工学部
    • Year and Date
      2013-12-14
    • Related Report
      2013 Final Research Report
  • [Presentation] 水酸化フラーレン混合スラリーによるサファイアCMPに関する研究材料除去メカニズムの検討2013

    • Author(s)
      齊藤貴志,鈴木恵友他
    • Organizer
      2012年度精密工学会春季大会
    • Place of Presentation
      首都大学
    • Year and Date
      2013-03-15
    • Related Report
      2013 Final Research Report
  • [Presentation] 水酸化フラーレンを利用したサファイアCMP高効率研磨手法に関する研究2013

    • Author(s)
      河北誠也,鈴木恵友他
    • Organizer
      2013年度精密工学会春季大会
    • Place of Presentation
      東京工業大学
    • Year and Date
      2013-03-13
    • Related Report
      2013 Final Research Report
  • [Presentation] MEMS技術を応用したCMPマイクロハターンハットの研究−Niめっき金型を用いたマイクロハターンハットの製作—2013

    • Author(s)
      磯野慎太郎,伊藤高廣,鈴木恵友他
    • Organizer
      2013年度精密工学会春季大会
    • Place of Presentation
      東京工業大学
    • Year and Date
      2013-03-13
    • Related Report
      2013 Final Research Report
  • [Presentation] Study on Sapphire CMP using Fullerenol mixed slurry-Effect on the size of silica and diamond fine particles2013

    • Author(s)
      Keisuke Suzuki et. al.,
    • Organizer
      Advanced Metallization Conference 2013 23th Asian Session (ADMETA 2013)
    • Place of Presentation
      The university of Tokyo
    • Related Report
      2013 Annual Research Report
  • [Presentation] 水酸化フラーレンを利用したサファイアCMP高効率研磨手法に関する研究2013

    • Author(s)
      河北誠也,山城天心,木村景一,カチョーンルンルアンパナート,鈴木恵友
    • Organizer
      2013年度精密工学会春季大会
    • Place of Presentation
      東京工業大学大岡山キャンパス
    • Related Report
      2012 Research-status Report
  • [Presentation] サファイアCMPにおける水酸化フラーレン混合スラリーに関する研究-リサイクル法に関する検証2012

    • Author(s)
      烏谷恵里
    • Organizer
      精密工学会九州支部学生研究発表会
    • Place of Presentation
      大分大学
    • Year and Date
      2012-12-14
    • Related Report
      2013 Final Research Report
  • [Presentation] CMP用マイクロハターンハットの開発-ホリシンクへの適用-2012

    • Author(s)
      磯野慎太郎,鈴木恵友他
    • Organizer
      2012年度精密工学会春季大会
    • Place of Presentation
      九州工業大学
    • Year and Date
      2012-09-16
    • Related Report
      2013 Final Research Report
  • [Presentation] サファイアCMPにおける水酸化フラーレン混合スラリーに関する研究コロイタルシリカスラリーをヘースとした研磨特性の検証2012

    • Author(s)
      齊藤貴志,鈴木恵友他
    • Organizer
      2011年度精密工学会秋季大会
    • Place of Presentation
      金沢大学
    • Year and Date
      2012-09-11
    • Related Report
      2013 Final Research Report
  • [Presentation] Study on Sapphire CMP Slurry using Water-soluble Fullerenol as Fine Particles2011

    • Author(s)
      Keisuke Suzuki,Takashi Saito, Erika Karasudani, Tatsuya Korezawa, Panart Khajornrungruang
    • Organizer
      2011 International Conference on Planarization/CMP Technology (2011 ICPT)
    • Place of Presentation
      COEX Soul
    • Related Report
      2011 Research-status Report
  • [Presentation] Effect of Fullerenol as Fine Particles in Sapphire CMP Slurry2011

    • Author(s)
      Takashi Saito, Keisuke Suzuki, Panart Khajornrungruang, Tatsuya Korezawa, and Keiichi Kimura
    • Organizer
      2011 International Conference on Planarization/CMP Technology (2011 ICPT)
    • Place of Presentation
      COEX Soul
    • Related Report
      2011 Research-status Report
  • [Presentation] Performance of Water-soluble Fullerenol as Novel Functional Fine Particles for Sapphire CMP2011

    • Author(s)
      Keisuke Suzuki,Takashi Saitou,Tatsuya Korezawa, Panart Khajornrungruang and Keiichi Kimura
    • Organizer
      Advanced Metallization Conference 2011 21th Asian Session (ADMETA 2011)
    • Place of Presentation
      Japan, Tokyo
    • Related Report
      2011 Research-status Report
  • [Presentation] サファイアCMPにおける水酸化フラーレン混合スラリーに関する研究̶コロイダルシリカスラ リーをベースとした研磨特性の検証̶2011

    • Author(s)
      齊藤貴志 鈴木恵友, パナートカチ ョーンルンル アン,烏谷恵里香,木村景一,
    • Organizer
      2011年度精密工学会秋季大会
    • Place of Presentation
      金沢大学
    • Related Report
      2011 Research-status Report
  • [Presentation] 水酸化フラーレン混合スラリーによるサファイアCMP に関する研究̶材料除去メカニズムの検討2011

    • Author(s)
      齊藤貴志,鈴木恵友,パナートカチ ョーンルンル アン,烏谷恵里香,木村景一
    • Organizer
      2012年度精密工学会春季大会
    • Place of Presentation
      首都大学 東京
    • Related Report
      2011 Research-status Report
  • [Patent(Industrial Property Rights)] 研磨剤2011

    • Inventor(s)
      鈴木恵友,木村景一,カチョーンルンルアンパナート,齊藤貴志,是澤 龍哉
    • Industrial Property Rights Holder
      国立大学法人九州工業大学
    • Industrial Property Rights Type
      特許
    • Filing Date
      2011-05-26
    • Related Report
      2013 Final Research Report
    • Overseas
  • [Patent(Industrial Property Rights)] 研磨剤2011

    • Inventor(s)
      鈴木恵友
    • Industrial Property Rights Holder
      九州工業大学
    • Industrial Property Number
      2011-117617
    • Filing Date
      2011
    • Related Report
      2011 Research-status Report

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Published: 2011-08-05   Modified: 2019-07-29  

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