Development of diamond emitters by aluminum-nanoimprint method
| Project/Area Number |
23560144
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Maizuru National College of Technology |
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Principal Investigator |
KIYOHARA Shuji 舞鶴工業高等専門学校, 電子制御工学科, 准教授 (40299326)
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| Co-Investigator(Kenkyū-buntansha) |
ISHIKAWA Ippei 舞鶴工業高等専門学校, 電子制御工学科, 講師 (10511735)
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| Project Period (FY) |
2011 – 2013
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
Fiscal Year 2013: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
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| Keywords | ナノインプリント / ダイヤモンドライクカーボン / ナノ加工 / ポリシロキサン / 酸素イオンシャワー / ガラス状炭素 / 酸素イオンビーム / ガラス状炭素モールド / ダイヤモンド / モールド / 酸素イオン / 電子ビームリソグラフィ |
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| Research Abstract |
We investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff method using aluminum mask. The DLC film was used as the patterning material. A glass-like carbon (GLC) was used as a mold material. The polysiloxane was used as EB resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An Al was used as oxide metal mask material of liftoff. We have fabricated the GLC mold of dot arrays with 5000 nm-square and 500 nm-height. Al film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and Al mask patterns were fabricated. The maximum etching selectivity of Al film against DLC film was as high as 35, which was obtained under 400 eV-ion energy. Then we processed the patterned Al on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5000 nm-squarer and 400 nm-height.
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Report
(4 results)
Research Products
(57 results)
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[Journal Article] Fabrication of Micro-OLEDs by Room-temperature Curing Contact-imprint Using DLC Molds2013
Author(s)
I. Ishikawa, K. Sakurai, S. Kiyohara, C. Ito, H. Tanoue, Y. Suda, H. Takikawa, Y. Taguchi, Y. Sugiyama, Y. Omata, Y. Kurashima
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Journal Title
Mater. Res. Soc. Symp. Proc.
Volume: Vol.1511
DOI
Related Report
Peer Reviewed
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[Presentation] はしご型HSQを用いた室温硬化ナノインプリント法による超微細有機ELの開発2013
Author(s)
松本拓也,石川一平,清原修二,櫻井圭輔,田上英人,須田善行,滝川浩史,渡邊雅彦,杉山嘉也,小俣有紀子,倉島優一
Organizer
日本高専学会第19回年会講演会
Place of Presentation
高知工業高等専門学校
Year and Date
2013-08-31
Related Report
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[Presentation] Fabrication of Micro-OLEDs by Room-temperature Curing Contact-imprint Using DLC Molds2012
Author(s)
I. Ishikawa, K. Sakurai, S. Kiyohara, C. Ito, H. Tanoue, Y. Suda, H. Takikawa, Y. Taguchi, Y. Sugiyama, Y. Omata, Y. Kurashima
Organizer
2012 Materials Research Society Fall Meeting
Place of Presentation
Hynes Covention Center and Sheraton Boston Hotel
Year and Date
2012-11-26
Related Report
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[Presentation] 水素フリー高密度DLC膜のパターニング,単離およびハンドリング2012
Author(s)
田上英人,柏木大幸,奥田浩史,須田善行,滝川浩史,川島貴弘,柴田隆行,清原修二,田口佳男,杉山嘉也,小俣有紀子,神谷雅男,瀧真,長谷川祐史,辻信広,石川剛史
Organizer
2012年春季第59回応用物理学関係連合講演会講演予稿集,応用物理学会
Place of Presentation
早稲田大学
Related Report
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[Presentation] Patterning of Tetrahedral Amorphous-Carbon Film by Electron Beam Lithography and Pick Up from Si-Wafer in Focused Ion Beam System2012
Author(s)
H. Tanoue, T. Kashiwagi, H. Okuda, Y. Suda, H. Takikawa, M. Kamiya, S. Kiyohara, T. Kawashima, T. Shibata, Y. Taguchi, Y. Sugiyama, Y. Omata, M. Taki, Y. Hasegawa, N. Tsuji and T. Ishikawa
Organizer
4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
Place of Presentation
Chubu University, Aichi, Japan(5p-C02OC)
Related Report
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[Presentation] Patterning of Tetrahedral Amorphous-Carbon Film by Electron Beam Lithography and Pick Up from Si-Wafer in Focused Ion Beam System2012
Author(s)
H. Tanoue, T. Kashiwagi, H. Okuda, Y. Suda, H. Takikawa, M. Kamiya, S. Kiyohara, T. Kawashima, T. Shibata, Y. Taguchi, Y. Sugiyama, Y. Omata, M. Taki, Y. Hasegawa, N. Tsuji and T. Ishikawa
Organizer
4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
Place of Presentation
Chubu University
Related Report
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[Presentation] Patterning of Tetrahedral Amorphous Carbon Film by Electron Beam Lithography2011
Author(s)
T. Kashiwagi, H. Okuda, H. Tanoue, Y. Suda, H. Takikawa, M. Kamiya, S. Kiyohara, T. Kawashima, T. Shibata, Y. Taguchi, Y. Sugiyama, Y. Omata, M. Taki, Y. Hasegawa, N. Tsuji and T. Ishikawa
Organizer
The Asia-Pacific Interdisciplinary Research Conference 2011
Place of Presentation
Toyohashi University of Technology,Toyohashi, Aichi, Japan(18PP-70)( p.172)
Year and Date
2011-11-18
Related Report
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[Presentation] フィルタードアーク蒸着で形成したDLC膜の酸素イオンエッチング2011
Author(s)
柏木大幸,奥田浩史,角口公章,田上英人,須田善行,滝川浩史,神谷雅男,瀧真,長谷川祐史,辻信広,石川剛史,清原修二
Organizer
平成23年度電気関係学会東海支部連合大会, 電気関係学会東海支部連合大会
Place of Presentation
三重大学(p.O1-1)
Year and Date
2011-09-26
Related Report
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[Presentation] Fabrication of Micro-OLEDs by Room-temperature Curing Contact-imprint Using DLC Molds
Author(s)
I. Ishikawa, K. Sakurai, S. Kiyohara, C. Ito, H. Tanoue, Y. Suda, H. Takikawa, Y. Taguchi, Y. Sugiyama, Y. Omata, Y. Kurashima
Organizer
2012 Materials Research Society Fall Meeting
Place of Presentation
Hynes Covention Center and Sheraton Boston Hotel
Related Report
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