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Improvement in Characteristics of Crystalline Silicon Solar Cells by High-Pressure Water Vapor Heat Treatment

Research Project

Project/Area Number 23560360
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionTokyo University of Agriculture and Technology

Principal Investigator

HASUMI Masahiko  東京農工大学, 工学(系)研究科(研究院), 助教 (60261153)

Co-Investigator(Renkei-kenkyūsha) SAMESHIMA Toshiyuki  東京農工大学, 大学院工学研究院, 教授 (30271597)
Project Period (FY) 2011 – 2013
Project Status Completed (Fiscal Year 2013)
Budget Amount *help
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2013: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2012: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2011: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
Keywordsソーラーセル / 水蒸気熱処理 / 少数キャリアライフタイム / マイクロ波吸収 / 太陽電池 / シリコン / マイクロ波吸収測定 / ライフタイム
Research Abstract

Improvement in a conversion efficiency of a-Si:H p-i-n solar cells were achieved by heat treatment with high-pressure H2O vapor. This treatment has a capability of curing poor solar cell characteristics.
We constructed the microwave transmittance measurement system to precisely measure the effective minority carrier lifetime with the two different wavelength light illumination. The present technique has a capability of application to monitoring semiconductor quality especially photosensitivity in semiconductor device processing.

Report

(4 results)
  • 2013 Annual Research Report   Final Research Report ( PDF )
  • 2012 Research-status Report
  • 2011 Research-status Report
  • Research Products

    (49 results)

All 2014 2013 2012 2011 Other

All Journal Article (14 results) (of which Peer Reviewed: 12 results) Presentation (34 results) Remarks (1 results)

  • [Journal Article] Activation of silicon implanted with phosphorus and boron atoms by microwave annealing with carbon powder as a heat source2014

    • Author(s)
      M. Hasumi, T. Nakamura, S. Yoshidomi, and T. Sameshima
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 53

    • NAID

      210000143902

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Multi junction solar cells using band-gap induced cascaded light absorption2014

    • Author(s)
      T. Sameshima, H. Nomura, S. Yoshidomi, and M. Hasumi
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 53

    • NAID

      210000143904

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Photo induced minority carrier annihilation at crystalline silicon surface in metal oxide semiconductor structure2014

    • Author(s)
      T. Sameshima, J. Furukawa, T. Nakamura, S. Shigeno, T. Node, S. Yoshidomi, and M. Hasumi
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 53

    • NAID

      210000143406

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Activation of silicon implanted with phosphorus and boron atoms by microwave annealing with carbon powder as a heat source2014

    • Author(s)
      Masahiko Hasumi, Tomohiko Nakamura, Shinya Yoshidomi, and Toshiyuki Sameshima
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 53 Issue: 5S1 Pages: 05FV05-05FV05

    • DOI

      10.7567/jjap.53.05fv05

    • NAID

      210000143902

    • Related Report
      2013 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Multi junction solar cells using band-gap induced cascaded light absorption2014

    • Author(s)
      Toshiyuki Sameshima, Hitomi Nomura, Shinya Yoshidomi, and Masahiko Hasumi
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 53 Issue: 5S1 Pages: 05FV07-05FV07

    • DOI

      10.7567/jjap.53.05fv07

    • NAID

      210000143904

    • Related Report
      2013 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Photo induced minority carrier annihilation at crystalline silicon surface in metal oxide semiconductor structure2014

    • Author(s)
      Toshiyuki Sameshima, Jun Furukawa, Tomohiko Nakamura, Satoshi Shigeno, Tomohito Node, Shinya Yoshidomi, and Masahiko Hasumi
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 53 Issue: 3 Pages: 031301-031301

    • DOI

      10.7567/jjap.53.031301

    • NAID

      210000143406

    • Related Report
      2013 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Investigation of Silicon Surface Passivation by Microwave Annealing Using Multiple-Wavelength Light-Induced Carrier Lifetime Measurement2013

    • Author(s)
      T. Sameshima, R. Ebina, K. Betsuin, Y. Takiguchi, and M. Hasumi
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 52

    • NAID

      210000141723

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Investigation of Silicon Surface Passivation by Microwave Annealing, Jpn2013

    • Author(s)
      T. Sameshima
    • Journal Title

      J. Appl. Phys

      Volume: Vol.52 Issue: 1R Pages: 11801-11801

    • DOI

      10.7567/jjap.52.011801

    • Related Report
      2012 Research-status Report
    • Peer Reviewed
  • [Journal Article] Heat treatment of amorphous silicon p-i-n solar cells with high-pressure H2O vapor2012

    • Author(s)
      J. Takenezawa, M. Hasumi, T. Sameshima, T. Koida, T. Kaneko, M. Karasawa, and M. Kondo
    • Journal Title

      J. Non-Cryst. Solids

      Volume: 358

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Surface Passivation of Crystalline Silicon by Combination of Amorphous Silicon Deposition with High-Pressure H2O Vapor Heat Treatment2012

    • Author(s)
      T. Sameshima, T. Nagao, M. Hasumi, A. Shuku, E. Takahashi, and Y. Andoh
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 51

    • NAID

      210000140378

    • Related Report
      2013 Final Research Report
    • Peer Reviewed
  • [Journal Article] Heat Treatment of Amorphous Silicon p-i-n Solar Cells with High-Pressure H2O Vapor2012

    • Author(s)
      J. Takenezawa
    • Journal Title

      Journal of Non-Crystalline Solids

      Volume: 358 Issue: 17 Pages: 2285-2288

    • DOI

      10.1016/j.jnoncrysol.2012.01.057

    • Related Report
      2012 Research-status Report
    • Peer Reviewed
  • [Journal Article] Surface Passivation of Crystalline Silicon by Combination of Amorphous Silicon Deposition with High-Pressure H_2O Vapor Heat Treatment2012

    • Author(s)
      T. Sameshima, T. Nagao, M. Hasumi, A.Shuku, E.Takahashi
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: Vol.51 Issue: 3S Pages: 03CA06-03CA06

    • DOI

      10.1143/jjap.51.03ca06

    • Related Report
      2011 Research-status Report
    • Peer Reviewed
  • [Journal Article] Fabrication of Aluminum Oxide Films by Aluminum Metal Evaporation in Oxygen Gas Atmosphere for Surface Passivation2011

    • Author(s)
      M. Hasumi, Y. Kanda, S. Yoshidomi, and T. Sameshima
    • Journal Title

      Technical Digest of the 24^<th> Int. Photovoltaic Solar Energy Conf

    • Related Report
      2013 Final Research Report
  • [Journal Article] Fabrication of Aluminum Oxide Films by Aluminum Metal Evaporation in Oxygen Gas Atmosphere for Surface Passivation2011

    • Author(s)
      M. Hasumi, Y. Kanda, S. Yoshidomi, and T. Sameshima
    • Journal Title

      Technical Digest of the 24th Int. Photovoltaic Solar Energy Conf.

      Volume: 1

    • Related Report
      2011 Research-status Report
  • [Presentation] Crystallization of Amorphous Silicon Thin Films by Microwave Heating2014

    • Author(s)
      中村友彦, 吉冨真也, 蓮見真彦, 鮫島俊之
    • Organizer
      応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学
    • Year and Date
      2014-03-19
    • Related Report
      2013 Final Research Report
  • [Presentation] Activation of Silicon Implanted with Dopant Atoms by Microwave Heating2013

    • Author(s)
      T. Sameshima, T. Nakamura, S. Yoshidomi, M. Hasumi, T. Ishii, Y. Inouchi, M. Naito and T. Mizuno
    • Organizer
      International Conference on Solid State Devices and Materials
    • Place of Presentation
      Hilton Fukuoka Sea Hawk
    • Year and Date
      2013-09-26
    • Related Report
      2013 Annual Research Report 2013 Final Research Report
  • [Presentation] Silicon Surface Oxidation and Passivation by Remote Induction-Coupled Oxygen Plasma2013

    • Author(s)
      鮫島俊之, 蓮見真彦, 吉冨真也, 中村友彦, 滋野聖
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学
    • Year and Date
      2013-09-17
    • Related Report
      2013 Final Research Report
  • [Presentation] Multi-Connected Solar Cells Using Band-Gap Induced Cascaded Light Absorption2013

    • Author(s)
      T. Sameshima, S. Yoshidomi, and M. Hasumi
    • Organizer
      JSAP-MRS Joint Symposia
    • Place of Presentation
      Doshisha Univ
    • Year and Date
      2013-09-16
    • Related Report
      2013 Final Research Report
  • [Presentation] Microwave Annealing of Phosphorus Implanted p-type Silicon2013

    • Author(s)
      M. Hasumi, S. Yoshidomi, and T. Sameshima
    • Organizer
      JSAP-MRS Joint Symposia
    • Place of Presentation
      Doshisha Univ
    • Year and Date
      2013-09-16
    • Related Report
      2013 Final Research Report
  • [Presentation] Activation of Silicon Implanted with Phosphorus Atoms by Microwave Heating2013

    • Author(s)
      S. Yoshidomi, C. Akiyama, J. Furukawa, M. Hasumi, T. Ishii, T. Sameshima, Y. Inouchi, and M. Nait
    • Organizer
      International Workshop on Active-Matrix Flatpanel Displays and Devices
    • Place of Presentation
      Ryukoku Univ
    • Year and Date
      2013-07-04
    • Related Report
      2013 Final Research Report
  • [Presentation] Minority Carrier Annihilation at Crystalline Silicon Surface in MOS Structure2013

    • Author(s)
      J. Furukawa, S. Yoshidomi, M. Hasumi, and T. Sameshima
    • Organizer
      International Workshop on Active-Matrix Flatpanel Displays and Devices
    • Place of Presentation
      Ryukoku Univ
    • Year and Date
      2013-07-04
    • Related Report
      2013 Final Research Report
  • [Presentation] MOS構造における結晶シリコン表面の少数キャリア再結合2013

    • Author(s)
      古川潤, 吉冨真也, 蓮見真彦, 鮫島俊之
    • Organizer
      応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2013-03-28
    • Related Report
      2013 Final Research Report
  • [Presentation] Minority Carrier Lifetime Measurements by Multiple Wavelength Light Induced Carrier Microwave Absorption Method2012

    • Author(s)
      T. Sameshima, Y. Takiguchi, T. Nagao, and M. Hasumi
    • Organizer
      International Workshop on Active-Matrix Flatpanel Displays and Devices
    • Place of Presentation
      Ryukoku Univ
    • Year and Date
      2012-07-04
    • Related Report
      2013 Final Research Report
  • [Presentation] Increase in Minority Carrier Lifetime Measured by Microwave Irradiation Method2012

    • Author(s)
      T. Sameshima, K. Betsuin, T. Nagao, and M. Hasumi
    • Organizer
      International Workshop on Active-Matrix Flatpanel Displays and Devices
    • Place of Presentation
      Ryukoku Univ
    • Year and Date
      2012-07-04
    • Related Report
      2013 Final Research Report
  • [Presentation] 多波長光照射によるマイクロ波フリーキャリヤ吸収を用いた半導体少数キャリヤ消滅特性の調査2012

    • Author(s)
      滝口裕太, 永尾友一, 蓮見真彦, 鮫島俊之
    • Organizer
      応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-18
    • Related Report
      2013 Final Research Report
  • [Presentation] リモート酸素プラズマ処理と高圧水蒸気熱処理によるシリコン表面パッシベーション2012

    • Author(s)
      永冨佳将, 蓮見真彦, 鮫島俊之
    • Organizer
      応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-18
    • Related Report
      2013 Final Research Report
  • [Presentation] Minority Carrier Lifetime Measurements by Multiple Wavelength Light Induced Carrier Microwave Absorption Method2012

    • Author(s)
      T. Sameshima, Y. Takiguchi, T. Ngao, M. Hasumi
    • Organizer
      THE 19TH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES
    • Place of Presentation
      Ryukoku University
    • Related Report
      2012 Research-status Report
  • [Presentation] Increase in Minority Carrier Lifetime Measured by Microwave Irradiation Method2012

    • Author(s)
      T. Sameshima, K. Betsuin, T. Nagao, M. Hasumi
    • Organizer
      THE 19TH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES
    • Place of Presentation
      Ryukoku University
    • Related Report
      2012 Research-status Report
  • [Presentation] 多波長光照射によるマイクロ波フリーキャリヤ吸収を用いた半導体少数キャリヤ消滅特性の調査2012

    • Author(s)
      滝口裕太,永尾友一,蓮見真彦,鮫島俊之
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Related Report
      2011 Research-status Report
  • [Presentation] リモート酸素プラズマ処理と高圧水蒸気熱処理によるシリコン表面パッシベーション2012

    • Author(s)
      永冨佳将,蓮見真彦,鮫島俊之
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Related Report
      2011 Research-status Report
  • [Presentation] シリコン表面における光誘起少数キャリヤ再結合消滅挙動2012

    • Author(s)
      古川 潤,滝口裕太,永尾友一,蓮見真彦,鮫島俊之
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Related Report
      2011 Research-status Report
  • [Presentation] Heat Treatment of Amorphous Silicon p-i-n Solar Cells with High-Pressure H2O Vapor2011

    • Author(s)
      M. Hasumi, J. Takenezawa, T. Sameshima, T. Koida, T. Kaneko, M. Karasawa, and M. Kondo
    • Organizer
      International Conference on Amorphous and Nanocrystalline Semiconductors
    • Place of Presentation
      Nara Prefectural New Public Hall
    • Year and Date
      2011-08-23
    • Related Report
      2013 Final Research Report
  • [Presentation] High-Pressure H2O Vapor Heat Treatment Used to Improve Polycrystalline Silicon Soar Cell Characteristics2011

    • Author(s)
      J. Takenezawa, M. Hasumi, and T. Sameshima
    • Organizer
      International Workshop on Active-Matrix Flatpanel Displays and Devices
    • Place of Presentation
      Ryukoku Univ
    • Year and Date
      2011-07-12
    • Related Report
      2013 Final Research Report
  • [Presentation] シリコンの少数キャリヤライフタイムの種々の外部刺激による変化2011

    • Author(s)
      鮫島俊之、別院公一、蓮見真彦
    • Organizer
      第8回薄膜材料デバイス研究会
    • Place of Presentation
      龍谷大学
    • Related Report
      2011 Research-status Report
  • [Presentation] J. Takenezawa, M. Hasumi, T. Sameshima2011

    • Author(s)
      High-Pressure H2O Vapor Heat Treatment Used to Improve Polycrystalline Solar Cell Characteristics
    • Organizer
      THE EIGHTEENTH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES
    • Place of Presentation
      龍谷大学
    • Related Report
      2011 Research-status Report
  • [Presentation] Masahiko Hasumi, Jun Takenezawa, Toshiyuki Sameshima, Takashi Koida, Tetsuya Kaneko, Minoru Karasawa, Michio Kondo2011

    • Author(s)
      Heat Treatment of Amorphous Silicon p-i-n Solar Cells with High-Pressure H2O Vapor
    • Organizer
      24th International Conference on Amorphous and Nanocrystalline Semiconductors
    • Place of Presentation
      奈良
    • Related Report
      2011 Research-status Report
  • [Presentation] Atsushi Kohno, Takayuki Tajiri, Shinya Yoshidomi, Masahiko Hasumi, Toshiyuki Sameshima2011

    • Author(s)
      Chemical Bonding and Valence Band States of SiO2 Thin Film Prepared by Oxygen Plasma Followed by High-Pressure H2O Vapor Heat Treatment
    • Organizer
      24th International Conference on Amorphous and Nanocrystalline Semiconductors
    • Place of Presentation
      奈良
    • Related Report
      2011 Research-status Report
  • [Presentation] Oxygen Radical Treatment used for Fabricating Metal-Insulator-Semiconductor Solar Cells

    • Author(s)
      滋野聖,吉冨真也,蓮見真彦,鮫島俊之
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学相模原キャンパス
    • Related Report
      2013 Annual Research Report
  • [Presentation] Crystallization of Amorphous Silicon Thin Films by Microwave Heating

    • Author(s)
      中村友彦,吉冨真也,蓮見真彦,鮫島俊之
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学相模原キャンパス
    • Related Report
      2013 Annual Research Report
  • [Presentation] 酸素プラズマ処理によるシリコン表面パッシベーション

    • Author(s)
      野手智仁,吉冨真也,古川潤,阿部博史,蓮見真彦,鮫島俊之
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学相模原キャンパス
    • Related Report
      2013 Annual Research Report
  • [Presentation] Silicon Surface oxidation and Passivation by Remote Induction-Coupled Oxygen Plasma

    • Author(s)
      鮫島俊之,蓮見真彦,吉冨真也,中村友彦,滋野聖
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学京田辺キャンパス
    • Related Report
      2013 Annual Research Report
  • [Presentation] Activation of Silicon Implanted with Dopant Atoms by Microwave Heating

    • Author(s)
      中村友彦,滋野聖,吉冨真也,蓮見真彦,石井寿子,鮫島俊之,井内裕,内藤勝男,水野智久
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学京田辺キャンパス
    • Related Report
      2013 Annual Research Report
  • [Presentation] Multi-Connected Solar Cells Using Band-Gap Induced Cascaded Light Absorption

    • Author(s)
      TOSHIYUKI SAMESHIMA, SHINYA YOSHIDOMI and MASAHIKO HASUMI
    • Organizer
      2013 JSAP-MRS Joint Symposia
    • Place of Presentation
      Doshisha University, Kyoto
    • Related Report
      2013 Annual Research Report
  • [Presentation] Microwave Annealing of Phosphorus Implanted p-type Silicon

    • Author(s)
      Masahiko Hasumi, Shinya Yoshidomi and Toshiyuki Sameshima
    • Organizer
      2013 JSAP-MRS Joint Symposia
    • Place of Presentation
      Doshisha University, Kyoto
    • Related Report
      2013 Annual Research Report
  • [Presentation] Passivation of silicon surface by laser rapid heating

    • Author(s)
      Toshiyuki Sameshima, Hiroshi Abe, Masahiko Hasumi, Tomohisa Mizuno, Naoki Sano
    • Organizer
      LPM2013
    • Place of Presentation
      Toki Messe, Niigata
    • Related Report
      2013 Annual Research Report
  • [Presentation] Activation of Silicon Implanted with Phosphorus Atoms by Microwave Heating

    • Author(s)
      S. Yoshidomi, C. Akiyama, J.Furukawa, M. Hsumi, T. Ishii, T. Sameshima, Y. Inouchi, M. Naito
    • Organizer
      THE TWENTIETH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES
    • Place of Presentation
      Ryukoku University Avanti Kyoto Hall, Kyoto
    • Related Report
      2013 Annual Research Report
  • [Presentation] Minority Carrier Annihilation at Crystalline SiliconSurface in MOS Structure

    • Author(s)
      J. Furukawa, S. Yoshidomi, M. Hasumi, T. Sameshima
    • Organizer
      THE TWENTIETH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES
    • Place of Presentation
      Ryukoku University Avanti Kyoto Hall, Kyoto
    • Related Report
      2013 Annual Research Report
  • [Presentation] MOS 構造における結晶シリコン表面の少数キャリヤ再結合

    • Author(s)
      古川潤,吉冨真也,蓮見真彦,鮫島俊之
    • Organizer
      第 60 回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学
    • Related Report
      2012 Research-status Report
  • [Remarks]

    • URL

      http://www.tuat.ac.jp/~sameken/

    • Related Report
      2013 Final Research Report

URL: 

Published: 2011-08-05   Modified: 2019-07-29  

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