Development of laser plasma VUV source using solid rare gas targets supplying continuously
| Project/Area Number |
23654204
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Plasma science
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| Research Institution | University of Hyogo |
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Principal Investigator |
AMANO Sho 兵庫県立大学, 高度産業科学技術研究所, 助教 (50271200)
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| Project Period (FY) |
2011-04-28 – 2015-03-31
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| Project Status |
Completed (Fiscal Year 2014)
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| Budget Amount *help |
¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Fiscal Year 2013: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2012: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2011: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
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| Keywords | レーザープラズマ光源 / 真空紫外光 / 固体希ガス / 極低温 / 真空紫外 / 軟X線 / 希ガス |
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| Outline of Final Research Achievements |
A laser plasma source, which can generate continuously repetitive pulses, has been developed for a novel compact and powerful VUV source. We successfully developed a one-dimensionally translating substrate system with a closed He gas cryostat that can continuously supply various cryogenic targets for ~10 Hz laser pulses. Solid Ar, Kr and Xe layers were formed and a Nd:YAG Q-switched laser irradiated them, it was shown that stable output power was achieved continuously from the plasma emission at frequencies of 1-10 Hz. VUV Spectra of these emissions showed specific ion’s lines on continuous broad emissions.
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Report
(5 results)
Research Products
(7 results)
