Generation of high-density plasma using electrode with narrow slitand its application to grooving

• Project/Area Number: 23656104
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Production engineering/Processing studies
• Research Institution: Osaka University
• Principal Investigator: SANO Yasuhisa 大阪大学, 大学院・工学研究科, 准教授 (40252598)
• Project Period (FY): 2011 – 2012
• Project Status: Completed (Fiscal Year 2012)
• Budget Amount: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000); Fiscal Year 2012: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000); Fiscal Year 2011: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
• Keywords: 大気圧プラズマ / 溝加工

Research Abstract

A plasma can be generated locally around the electrode under the condition of atmospheric pressure because of the small mean free path of gas molecules. However, generation of small plasma for high-rate etching especially less than 1 mm is very difficult due to thermal limitations of needle-like electrodes or very thin wire electrodes. Thus, we proposed a novel electrode with a narrow slit and succeeded in generation of a narrow groove less than 0.1 mm.