Demonstration of negative refraction in grapheme pn junction
| Project/Area Number |
23656204
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Electronic materials/Electric materials
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| Research Institution | Hokkaido University |
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Principal Investigator |
YOH Kanji 北海道大学, 量子集積エレクトロニクス研究センター, 教授 (60220539)
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
Fiscal Year 2012: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2011: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
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| Keywords | 負の屈折 / クライン-トンネル / グラフェン / pn 接合 / pn接合 / ディラックフェルミオン / クライントンネリング / 負の屈折率 / ベセラゴレンズ / negative refraction |
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| Research Abstract |
The overall electrical measurement results indicate negative refraction overlapped with some interference pattern. The interference pattern is thought to come from multiple reflection of the injected electron waves. As a result
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Report
(3 results)
Research Products
(30 results)
