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Fabrication of ultra-high frequency diodes made of nickel oxide: Aiming for a photovoltaic application

Research Project

Project/Area Number 23656211
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Electronic materials/Electric materials
Research InstitutionThe University of Electro-Communications

Principal Investigator

NOZAKI Shinji  電気通信大学, 大学院・情報理工学研究科, 教授 (20237837)

Project Period (FY) 2011 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
Keywordsレクテナ / 整流器 / 酸化ニッケル / 光酸化 / 全空乏 / 太陽光発電 / ショットキー
Research Abstract

Although there were many reports on the tunnel diode with NiO between two metals, they did not show good rectification in their I-V characteristics. This project analyzed the reason why the reported diodes did not show good rectification and recommended the suitable structure. In the structure, the NiO semiconductor was formed by UV oxidation of Ni and sandwiched between Pt and Al to form a Schottky diode.

Report

(3 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Research-status Report
  • Research Products

    (14 results)

All 2013 2012 2011 Other

All Journal Article (1 results) (of which Peer Reviewed: 1 results) Presentation (10 results) Remarks (1 results) Patent(Industrial Property Rights) (2 results)

  • [Journal Article] Microstructure developments of F-doped SiO2 thin films prepared by liquid phase deposition2012

    • Author(s)
      Shijun Yu, Jae Sung Lee, Shinji Nozaki, Junghyun Cho
    • Journal Title

      Thin Solid Films 520

      Pages: 1718-1723

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Presentation] Effect of O2/Ni gas ratio on the epitaxial growth of NiO films by metalorganic chemical vapordeposition,2013

    • Author(s)
      Teuku Muhammad Roffi, Motohiko Nakamura, Kazuo Uchida and Shinji Nozaki
    • Organizer
      2013 MRS Spring Meeting
    • Place of Presentation
      SanFrancisco, CA, USA.
    • Related Report
      2012 Final Research Report
  • [Presentation] Effect of O2/Ni gas ratio on the epitaxial growth of NiO films by metalorganic chemical vapor deposition2013

    • Author(s)
      Teuku Muhammad Roffi, Motohiko Nakamura, Kazuo Uchida and Shinji Nozaki
    • Organizer
      2013 MRS Spring Meeting
    • Place of Presentation
      San Francisco, CA, USA
    • Related Report
      2012 Annual Research Report
  • [Presentation] Intense ultraviolet photoluminescence observed at room temperature from NiO nano-porous thin films grown by the hydrothermal technique2012

    • Author(s)
      Sachindra Nath Sarangi, Puratap Kumar Sahoo, Kazuo Uchida, Surendra Nath Sahu, Shinji Nozaki, and Dongyuan Zhang
    • Organizer
      2012 MRS Fall Meeting
    • Place of Presentation
      Boston, MA, USA
    • Related Report
      2012 Annual Research Report 2012 Final Research Report
  • [Presentation] Fabrication of a p-NiO/n-Si heterjunction diode by UV oxidation of Ni deposited on n-Si2012

    • Author(s)
      Dongyuan Zhang, Kazuo Uchida, and Shinji Nozaki
    • Organizer
      2012 MRS Fall Meeting
    • Place of Presentation
      Boston, MA, USA.
    • Related Report
      2012 Final Research Report
  • [Presentation] Fabrication of a p-NiO/n-Si heterjunction diode by UV oxidation of Ni deposited on n-Si2012

    • Author(s)
      Dongyuan Zhang, Kazuo Uchida, and Shinji Nozaki
    • Organizer
      2012 MRS Fall Meeting
    • Place of Presentation
      Boston, MA, USA
    • Related Report
      2012 Annual Research Report
  • [Presentation] UV酸化による半導体ニッケル酸化物の作製2011

    • Author(s)
      張東元m小泉淳、小野 洋、内田和男、野崎眞次
    • Organizer
      電気通信大学・東京農工大学第8回合同シンポジウム
    • Place of Presentation
      東京農工大学
    • Year and Date
      2011-12-10
    • Related Report
      2012 Final Research Report
  • [Presentation] XPSによる低温シリコン酸化膜の評価-フレキシブル基板上の集積回 路をめざして2011

    • Author(s)
      野崎 眞次
    • Organizer
      日本電子 EPMA・表面分析ユーザーズミーティング 2011
    • Place of Presentation
      東京大学武田先端知ビル
    • Year and Date
      2011-10-07
    • Related Report
      2012 Final Research Report
  • [Presentation] UV 酸化による半導体ニッケル酸化物の作製2011

    • Author(s)
      張東元,小泉淳,内田和男,Ramakrishnan Veerabahu,野崎眞次
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-09-01
    • Related Report
      2012 Final Research Report
  • [Presentation] UV酸化による半導体ニッケル酸化物の作製2011

    • Author(s)
      張 東元、小泉 淳、内田和男、Ramakrishnan Veerabahu、野崎眞次
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形大学
    • Related Report
      2011 Research-status Report
  • [Presentation] UV酸化による半導体ニッケル酸化膜の作製2011

    • Author(s)
      張 東元、小泉 淳、小野 洋、内田和男、野崎眞次
    • Organizer
      電気通信大学・東京農工大学第8回合同シンポジウム
    • Place of Presentation
      東京農工大学
    • Related Report
      2011 Research-status Report
  • [Remarks]

    • URL

      http://www.w3-4f5f.ee.uec.ac.jp

    • Related Report
      2012 Final Research Report
  • [Patent(Industrial Property Rights)] 整流素子2012

    • Inventor(s)
      野崎眞次、内田和男、黒川真吾、古川実、白土正
    • Industrial Property Rights Holder
      日本電業工作株式会社、電気通信大学
    • Industrial Property Number
      2012-094148
    • Filing Date
      2012-04-17
    • Related Report
      2012 Final Research Report
  • [Patent(Industrial Property Rights)] 整流素子2012

    • Inventor(s)
      野崎眞次、内田和男、黒川真吾、古川 実、白土 正
    • Industrial Property Rights Holder
      日本電業工作株式会社、電気通信大学
    • Industrial Property Rights Type
      特許
    • Filing Date
      2012-04-17
    • Related Report
      2012 Annual Research Report

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Published: 2011-08-05   Modified: 2019-07-29  

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