Formation of band-offset type transparent conductive oxide thin films
| Project/Area Number |
23656386
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Physical properties of metals
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| Research Institution | Kyushu University |
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Principal Investigator |
ARITA Makoto 九州大学, 工学(系)研究科(研究院), 助教 (30284540)
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| Co-Investigator(Kenkyū-buntansha) |
IKTOMA Yoshifumi 九州大学, 工学研究院, 助教 (90315119)
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| Project Period (FY) |
2011 – 2013
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
Fiscal Year 2013: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2012: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2011: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
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| Keywords | 酸化亜鉛 / 薄膜 / KFM / ケルビンフォース顕微鏡 / 透明導電膜 |
|---|
| Research Abstract |
The band structure of modulation-doped zinc oxide multilayer films was investigated using Kelvin force microscopy (KFM).A cross sectional cleaved surface and an oblique section formed by an ion beam etching of the multilayer films were scanned by a KFM probe tip and the mapping of work function was obtained. The results predicted the optimum thickness of the non-doped zinc oxide layer for good electrical properties. Thus, KFM should be useful for optimizing the structural design of modulation-doped transparent conductive oxide films.
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Report
(4 results)
Research Products
(16 results)
