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Development of homogeneous solid electrolyte/electrode structureby chemical vapor deposition method

Research Project

Project/Area Number 23656426
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Structural/Functional materials
Research InstitutionTokyo Institute of Technology

Principal Investigator

SHINOZAKI Kazuo  東京工業大学, 大学院・理工学研究科, 教授 (00196388)

Co-Investigator(Kenkyū-buntansha) SAKURAI Osamu  東京工業大学, 大学院・理工学研究科, 准教授 (20108195)
SHIOTA Tadashi  東京工業大学, 大学院・理工学研究科, 助教 (40343165)
Co-Investigator(Renkei-kenkyūsha) WAKIYA Naoki  静岡大学, 工学部, 教授 (40251623)
KIGUCHI Takanori  東北大学, 金属材料研究所, 准教授 (70311660)
Project Period (FY) 2011 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2012: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2011: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Keywords燃料電池材料 / CVD 法低温合成 / 燃料電池 / Gd添加CeO2 / 減圧CVD法 / 常圧CVD法 / 低温合成 / CVD法 / GDC / SDC
Research Abstract

Typical fabrication process of making solid electrolyte for the fuel cell is sintering. However it brings the inhomogeneity of cations from the in sufficient mixing of the raw materials and local diffusion during the sintering and also during long time running of power generation. These inhomogeneity is enhanced the large amount of trivalent cation doping, such as 20-30 at%. We proposed the chemical vapor deposition (CVD) using Ce(EtCp)_4 (Ce (C_5H_4C_2H_5)_4) and Gd(EtCp)_3 (Gd(C_5H_4C_2H_5)_3) as the source materials. In this research, we determined the optimum condition of these raw materials for CVD process for low-pressure coldwall-type-CVD apparatus. We succeeded to fabricate the columnar type GDC film on Al_2O_3, SiO_2/Si substrates. It was found that the film was grown at around 300℃ and has columnar structure that means no grain boundary in the out of plane direction. Since thinner thickness of the film and almost no grain boundary along the out of plane direction, oxide ion can be able to diffuse even at 180℃ by AC measurement. New type atmospheric pressure CVD apparatus was developed to grow the film with very fast growth rate. We also tried to fabricated the porous electrodes with dense surface layer for the anode: Ni-GDC and the cathode: LaSrCoO_3-GDC. GDC thin films by low pressure CVD were fabricated on the porous electrodes, and tried to generate the electric power in the H_2-O_2 system. Since the power generation test system is preliminary, but we have several important point to realize the CVD derived electrolyte system.

Report

(3 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Research-status Report
  • Research Products

    (20 results)

All 2013 2012 2011 2010

All Journal Article (2 results) (of which Peer Reviewed: 2 results) Presentation (18 results)

  • [Journal Article] Effect of step edges on the growth of Pt thin films on oxide single-crystal substrates2013

    • Author(s)
      Tadashi Shiota, Hiroki Ito, Naoki Wakiya, Jeffrey Cross, Osamu Sakurai, Kazuo Shinozaki
    • Journal Title

      Journal of the Ceramic Society of Japan

      Volume: 121 Issue: 1411 Pages: 278-282

    • DOI

      10.2109/jcersj2.121.278

    • NAID

      130004950829

    • ISSN
      1348-6535, 1882-0743
    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Effect of step edges on the growth of Pt thin films on oxide single-crystal substrates2013

    • Author(s)
      Tadashi SHIOTA, Hiroki ITO, Naoki WAKIYA, Jeffrey CROSS, Osamu SAKURAI, Kazuo SHINOZAKI
    • Journal Title

      Journal of the Ceramic Society of Japan

      Volume: 121 Pages: 278-282

    • NAID

      130004950829

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Presentation] YSZ酸素センサーの低温駆動を目指した(La,Sr)(Co,Ni)O_3薄膜電極の電気特性評価2013

    • Author(s)
      永原和聡, 海老澤琢, 浜崎純一, 塩田忠,脇 谷尚樹, 櫻井修, 篠崎和夫
    • Organizer
      日本セラミックス協会2013年年会
    • Place of Presentation
      東京工業大学(東京)
    • Related Report
      2012 Final Research Report
  • [Presentation] PLD法により各種酸化物ステップ基板上に製膜したPt薄膜の成長機構2013

    • Author(s)
      井藤洋輝, 塩田忠, 脇谷尚樹, 櫻井修, 篠崎和夫
    • Organizer
      日本セラミックス協会2013年年会
    • Place of Presentation
      東京工業大学(東京)
    • Related Report
      2012 Final Research Report
  • [Presentation] PLD法により各種酸化物ステップ基板上に製膜したPt薄膜の成長機構2013

    • Author(s)
      井藤洋輝・塩田忠・脇谷尚樹・櫻井修・篠崎和夫
    • Organizer
      日本セラミックス協会2013年年会
    • Place of Presentation
      東京工業大学西9号館(東京都)
    • Related Report
      2012 Annual Research Report
  • [Presentation] YSZ酸素センサーの低温駆動を目指した (La,Sr)(Co,Ni)O3 薄膜電極の電気特性評価2013

    • Author(s)
      永原和聡・海老沢琢・浜崎純一・塩田忠・脇谷尚樹・櫻井修・篠崎和夫
    • Organizer
      日本セラミックス協会2013年年会
    • Place of Presentation
      東京工業大学西9号館(東京都)
    • Related Report
      2012 Annual Research Report
  • [Presentation] CVD法による多孔質混合誘電性基板上へのGd添加CeO2_2電解質薄膜合成とその特性2012

    • Author(s)
      門馬征史, 三田健介, 大島直也, 田中宏樹, 塩田忠, Cross Jeffrey, 櫻井修, 篠崎和夫, 脇谷尚樹
    • Organizer
      日本セラミックス協会エレクトロセラミックス研究討論会
    • Place of Presentation
      東京工業大学(東京)
    • Related Report
      2012 Final Research Report
  • [Presentation] YSZ薄膜酸素センサー上に形成した(La,Sr)(Co,Ni)O3_3電極の低温動作特性評価2012

    • Author(s)
      永原和聡, 海老沢琢, 塩田忠, 櫻井修, 篠崎和夫, 脇谷尚樹
    • Organizer
      日本セラミックス協会関東支部研究発表会
    • Place of Presentation
      静岡大学(浜松)
    • Related Report
      2012 Final Research Report
  • [Presentation] 酸化物単結晶基板上のPt薄膜成長に及ぼすステップエッジの影響2012

    • Author(s)
      井藤洋輝, 塩田忠, 櫻井修, 篠崎和夫, 脇谷尚樹
    • Organizer
      日本セラミックス協会関東支部研究発表会
    • Place of Presentation
      静岡大学(浜松)
    • Related Report
      2012 Final Research Report
  • [Presentation] Electrical and catalytic properties of mixed condutive (La,Sr) (Co,Ni)O_3 thin-film prepared by pilsed laser deposition2012

    • Author(s)
      Kazuto Nagahara, ,Taku Ebisawa,Ta dashi Shiota,Naoki Wakiya,Jeffery S Cross, Osamu Sakurai and Kazuo Shinozaki
    • Organizer
      6thInternational Conference on the Science and Technology for the Advanced Ceramics,
    • Place of Presentation
      Mielparque Yokohama (Yokohama)
    • Related Report
      2012 Final Research Report
  • [Presentation] Growth process of Pt thin Films on stepped surface of oxide single crystals2012

    • Author(s)
      Hiroki Ito,Tadashi Shiota,Naoki Wakiya, Jeffrey S. Cross, Osamu Sakurai and Kazuo Shinozaki
    • Organizer
      6th International Conference on the Science and Technology for the Advanced Ceramics
    • Place of Presentation
      Mielparque Yokohama(Yokohama)
    • Related Report
      2012 Final Research Report
  • [Presentation] CVD法によるGd添加CeO_2電解質薄膜形成用Ni-電解質混合導電基板の作製と特性2012

    • Author(s)
      門馬征史, 田中宏樹, 早乙女遼一, 木口賢紀, 脇谷尚樹, Cross Jeffrey, 櫻井修, 篠崎和夫
    • Organizer
      日本セラミック協会関東支部研究発表会
    • Place of Presentation
      静岡大学(浜松)
    • Related Report
      2012 Final Research Report
  • [Presentation] Growth process of Pt thin films on stepped surface of oxide single crystals2012

    • Author(s)
      Hiroki Ito, Tadashi Shiota, Naoki Wakiya, Jeffrey S. Cross, Osamu Sakurai and Kazuo Shinozaki
    • Organizer
      6th International Conference on the Science and Technology for Advanced Ceramics
    • Place of Presentation
      メルパルク横浜(神奈川県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Electrical and catalytic properties of mixed conductive (La,Sr)(Co,Ni)O3 thin-film prepared by pulsed laser deposition2012

    • Author(s)
      Kazuto Nagahara, Taku Ebisawa, Tadashi Shiota, Naoki Wakiya, Jeffery S Cross, Osamu Sakurai and Kazuo Shinozaki
    • Organizer
      6th International Conference on the Science and Technology for Advanced Ceramics
    • Place of Presentation
      メルパルク横浜(神奈川県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] 酸化物単結晶基板上のPt薄膜成長に及ぼす ステップエッジの影響2012

    • Author(s)
      井藤洋輝,塩田忠,櫻井修,篠崎和夫,脇谷尚樹
    • Organizer
      日本セラミックス協会関東支部研究発表会
    • Place of Presentation
      静岡大学浜松キャンパス(静岡県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] YSZ薄膜酸素センサー上に形成した(La,Sr)(Co,Ni)O3 電極の低温動作特性評価2012

    • Author(s)
      永原和聡、海老沢琢、塩田忠、櫻井修、篠崎和 夫、脇谷尚樹
    • Organizer
      日本セラミックス協会関東支部研究発表会
    • Place of Presentation
      静岡大学浜松キャンパス(静岡県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] CVD法による多孔質混合導電性基板上への Gd添加CeO2電解質薄膜合成とその特性2012

    • Author(s)
      門馬征史・三田健介・大島直也・田中宏樹・ 塩田忠・Cross Jeffrey・櫻井修・篠崎和夫・脇谷尚樹
    • Organizer
      日本セラミックス協会エレクトロセラミックス研究討論会
    • Place of Presentation
      東京工業大学西9号館(東京都)
    • Related Report
      2012 Annual Research Report
  • [Presentation] CVD法によるGd2O3添加CeO2電解質薄膜の低温製膜とその電気特性2012

    • Author(s)
      田中宏樹, Jeffrey Cross, 塩田忠, 篠崎和夫, 櫻井修, 木口賢紀, 脇谷尚樹, 東慎太郎
    • Organizer
      日本セラミックス協会2012年年会講演予稿集, 3D08, P.292
    • Place of Presentation
      京都大学, 京都
    • Related Report
      2011 Research-status Report
  • [Presentation] CVD 法によるGd 添加CeO2電解質薄膜形成用Ni-電解質混合導電基板の作製と特性2011

    • Author(s)
      門馬征史, 田中宏樹, 早乙女遼一, 木口賢紀, 脇谷尚樹, Cross Jeffrey, 櫻井 修, 篠崎和夫
    • Organizer
      第27回日本セラミックス協会関東支部研究発表会講演要旨集, 1C14, P.58
    • Place of Presentation
      静岡大学, 静岡県
    • Related Report
      2011 Research-status Report
  • [Presentation] CVD法によるGd2O_3添加CeO_2電解質薄膜の低温製膜とその電気特性2010

    • Author(s)
      田中宏樹, Jeffrey Cross, 塩田忠 ,篠崎和夫, 櫻井修, 木口賢紀, 脇谷尚樹, 東慎太郎
    • Organizer
      日本セラミックス協会2012年年会講演
    • Place of Presentation
      京都大学(京都)
    • Year and Date
      2010-03-20
    • Related Report
      2012 Final Research Report

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Published: 2011-08-05   Modified: 2019-07-29  

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