| Project/Area Number |
23656461
|
|---|
| Research Category |
Grant-in-Aid for Challenging Exploratory Research
|
| Allocation Type | Multi-year Fund |
|---|
| Research Field |
Material processing/treatments
|
|---|
| Research Institution | Kyoto University |
|---|
Principal Investigator |
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
ICHII Takashi 京都大学, 大学院・工学研究科, 助教 (30447908)
|
|---|
| Project Period (FY) |
2011
|
| Project Status |
Completed (Fiscal Year 2011)
|
| Budget Amount *help |
¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2011: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
|
|---|
| Keywords | 走査プローブ顕微鏡 / ナノリソグラフィ / 自己集積化単分子膜 / ナノプロープリソグラフィ |
|---|
| Research Abstract |
Self-assembled monolayers of alkylphosphonic acid was used as a resist film for nanoprobe lithography because SAMs are ultrathin films with a thickness of only 2-3 nm and they can be easily prepared. Highly-ordered and low-defect-density alkylphosphonic SAMs were successfully formed on aluminum oxide films by just immersing the films in an ethanolic solution containing an alkylphosphonic acid, and we concluded that they were more suitable for the resist film than alkylsilane SAMs.
|
