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Development of novel function-controlled inorganic/organic layer-formationtechnology through integrated reaction studies on plasma interactions withnanolayers at surface and interface

Research Project

Project/Area Number 23656465
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Material processing/treatments
Research InstitutionOsaka University

Principal Investigator

SETSUHARA Yuichi  大阪大学, 接合科学研究所, 教授 (80236108)

Co-Investigator(Renkei-kenkyūsha) TAKENAKA Kosuke  大阪大学, 接合科学研究所, 助教 (60432423)
Project Period (FY) 2011 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2012: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2011: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Keywordsプラズマ加工 / 無機/有機界面 / 無機/有機積層 / 無機/有機界面 / 無機/有機積層
Research Abstract

This research project has been carried out to seek for breakthroughs toovercome constraints involved in plasma processes for formation of functional inorganic layeron organic layer through integrated reaction studies on plasma interactions with nanolayers atsurface and interface. The results obtained from this project have indicated feasibility of lowdamage plasma process to reduce the damage-layer thickness as thin as a few nm especiallyvia controlling the energy of ion bombardment during the reactive plasma process.

Report

(3 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Research-status Report
  • Research Products

    (20 results)

All 2013 2012 2011

All Journal Article (4 results) (of which Peer Reviewed: 4 results) Presentation (16 results) (of which Invited: 2 results)

  • [Journal Article] Plasma interaction with Zn nano layer on organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation2013

    • Author(s)
      Ken Cho, Kosuke Takenaka, Yuichi Setsuhara
    • Journal Title

      Surface and Coatings Technology

      Volume: 228 Pages: S271-S275

    • DOI

      10.1016/j.surfcoat.2012.05.126

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation2012

    • Author(s)
      Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori
    • Journal Title

      Thin Solid Films

      Volume: 523 Pages: 15-19

    • DOI

      10.1016/j.tsf.2012.05.061

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas2012

    • Author(s)
      Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 51 Issue: 1S Pages: 01AJ02-01AJ02

    • DOI

      10.1143/jjap.51.01aj02

    • NAID

      210000140089

    • Related Report
      2011 Research-status Report
    • Peer Reviewed
  • [Journal Article] フレキシブルデバイス創製に向けたプラズマ-ソフトマテリアル相互作用の解析2011

    • Author(s)
      趙 研, 節原 裕一, 竹中 弘祐, 白谷 正治, 関根 誠, 堀 勝
    • Journal Title

      高温学会誌

      Volume: 37 Pages: 289-297

    • NAID

      10030167027

    • Related Report
      2011 Research-status Report
    • Peer Reviewed
  • [Presentation] Low-Temperature Formation of Semiconductor Films via ICP-Enhanced Reactive Sputtering for Development of Advanced Flexible Devices2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofimi Ohtani, Akinori Ebe
    • Organizer
      第30回プラズマプロセシング研究会
    • Place of Presentation
      浜松
    • Related Report
      2012 Annual Research Report
  • [Presentation] Plasma-Enhanced ReactiveSputter Deposition with Low-Inductance Antennafor Low-Temperature Fabrication of FlexiblePhotovoltaic Devices2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 6th InternationalConference on Technological Advances of ThinFilms & Surface Coatings
    • Place of Presentation
      Singapore
    • Related Report
      2012 Final Research Report
  • [Presentation] Process Control Capabilitiesof ICP-Enhanced Sputter Discharge for ReactiveLarge-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The15th Korea-Japan Workshop for AdvancedPlasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea
    • Related Report
      2012 Final Research Report
  • [Presentation] Plasma-Enhanced Reactive Sputter Deposition with Low-Inductance Antenna for Low-Temperature Fabrication of Flexible Photovoltaic Devices2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 6th International Conference on Technological Advances of Thin Films & Surface Coatings
    • Place of Presentation
      Singapore
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] Process Control Capabilities of ICP-Enhanced Sputter Discharge for Reactive Large-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] Effect of Plasma Irradiation on Interfacial Nano Layers in Inorganic / Organic Hybrid Structures2012

    • Author(s)
      Kosuke Takenaka, Ken Cho, Yuichi Setsuhara
    • Organizer
      International Union of Materials Research Societies - International conference on Electronic Materials (IUMRS-ICEM2012)
    • Place of Presentation
      Yokohama, Japan
    • Related Report
      2012 Annual Research Report
  • [Presentation] Process Control Capabilities Of Plasma-Enhanced Reactive Sputter Deposition With New Type Of Low-Inductance-Antenna Driven ICP For Large-Area Formation Of Semiconductor Films2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Akinori Ebe
    • Organizer
      Joint conference on the 11th Asia Pacific Conference on Plasma Science and Technology (11th APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)
    • Place of Presentation
      Kyoto, Japan
    • Related Report
      2012 Annual Research Report
  • [Presentation] Control Capabilities of Reactive Sputter Deposition Process via ICPs Driven by Low-Inductance Antenna for Large-Area Formation of Thin Film Devices2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      65th Annual Gaseous Electronics Conference
    • Place of Presentation
      Texas, USA
    • Related Report
      2012 Annual Research Report
  • [Presentation] Low-Temperature and Low-Damage Plasma Processing of Inorganic/Organic Hybrid Materials for Development of Flexible Electronics2012

    • Author(s)
      Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      5th International Symposium on Advanced Materials Development and Integration of Novel Structural Metallic and Inorganic Materials
    • Place of Presentation
      Aichi, Japan
    • Related Report
      2012 Annual Research Report
  • [Presentation] ICP-Assisted Reactive Sputter-Deposition with Inner-Type Low-Inductance Antenna (LIA)2012

    • Author(s)
      Y. Setsuhara, A. Ebe
    • Organizer
      The 14th International Workshop on Advanced Plasma Processing and Diagnostics(招待講演)
    • Place of Presentation
      Fukuoka, Japan
    • Related Report
      2011 Research-status Report
  • [Presentation] プラズマ支援反応性スパッタリング法による透明アモルファス酸化物半導体薄膜トランジスタ低温形成技術の開発2012

    • Author(s)
      節原 裕一, 趙 研, 大地 康史, 竹中 弘祐, 江部 明憲
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Related Report
      2011 Research-status Report
  • [Presentation] Plasma-Assisted Sputtering with ICP Driven by Inner-Type Low-Inductance Antenna2012

    • Author(s)
      Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe
    • Organizer
      4th International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2012)
    • Place of Presentation
      愛知県春日井市
    • Related Report
      2011 Research-status Report
  • [Presentation] Plasma-Assisted Deposition of Functional Thin Films and Process Analyses for Development of Flexible Electronic2011

    • Author(s)
      Y. Setsuhara
    • Organizer
      IUMRS-ICA 2011 12th International Conference in Asia(招待講演)
    • Place of Presentation
      Taipei, Taiwan
    • Related Report
      2011 Research-status Report
  • [Presentation] Development of Plasma-Enhanced Reactive Large-Area Processes2011

    • Author(s)
      Y. Setsuhara, A. Ebe
    • Organizer
      Advanced Plasma Technology for Green Energy and Biomedical Apllications(招待講演)
    • Place of Presentation
      Chiangmai, Thailand
    • Related Report
      2011 Research-status Report
  • [Presentation] Development of Low-Damage Reactive Sputter Deposition Processes with Inner-Type Low Inductance Antenna2011

    • Author(s)
      Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe
    • Organizer
      Plasma Conference 2011
    • Place of Presentation
      金沢
    • Related Report
      2011 Research-status Report
  • [Presentation] Investigation of plasma interactions with organic semiconductors for fabrication of flexible electronics devices2011

    • Author(s)
      K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori
    • Organizer
      33rd International symposium on Dry Process
    • Place of Presentation
      京都
    • Related Report
      2011 Research-status Report

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Published: 2011-08-05   Modified: 2019-07-29  

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