Construction of iron-group metal/oxide semiconductor complex nanowires by electroless deposition
| Project/Area Number |
23656477
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Metal making engineering
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| Research Institution | Osaka Prefecture University |
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Principal Investigator |
YAGI Shunsuke 大阪府立大学, 21 世紀科学研究機構, 講師 (60452273)
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
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| Keywords | 酸化物半導体 / 複合ナノ材料 / 各種製造プロセス / 希少金属代替 / 金属ナノワイヤ |
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| Research Abstract |
A synthesis process of abundant nanowires of the iron-group metals and an electrochemical deposition process ofoxide semiconductor films were established through the present work. By combining these processes, it is possible to synthesize iron group metal/oxide semiconductor complex nanowires although the homogeneity of the oxide semiconductor coating should be improved.
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Report
(3 results)
Research Products
(16 results)
