Development of non-contact lithography toward 10 nm-node
| Project/Area Number |
23686026
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| Research Category |
Grant-in-Aid for Young Scientists (A)
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| Allocation Type | Single-year Grants |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Hokkaido University |
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Principal Investigator |
UENO Kosei 北海道大学, 電子科学研究所, 准教授 (00431346)
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| Project Period (FY) |
2011-04-01 – 2014-03-31
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥27,560,000 (Direct Cost: ¥21,200,000、Indirect Cost: ¥6,360,000)
Fiscal Year 2013: ¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2012: ¥10,660,000 (Direct Cost: ¥8,200,000、Indirect Cost: ¥2,460,000)
Fiscal Year 2011: ¥11,570,000 (Direct Cost: ¥8,900,000、Indirect Cost: ¥2,670,000)
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| Keywords | 10 nm-node / ナノギャップ / ナノ・マイクロ加工 / プラズモニクス / 近接場リソグラフィー / 近接場リソグラフィ |
|---|
| Research Abstract |
The nano-photolithography technology which carries out transcription exposure of the nanopattern with a nanometric accuracy on a positive photoresist surface was constructed using the feature with possible the metallic nanostructure which shows localized surface plasmon resonance making a nanometer-sized spatial region localize electromagnetic field. As the result, it succeeded in attaining principle verification of the non-contact nano-lithography technology of unexplored 10 nm-node.
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Report
(4 results)
Research Products
(153 results)
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[Journal Article] Real-time imaging of acoustic rectification2011
Author(s)
S. Danworaphong, T. A. Kelf, O. Matsuda, M. Tomoda, Y. Tanaka, N. Nishiguchi, O. B. Wright, Y. Nishijima, K. Ueno, S. Juodkazis, H. Misawa
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Journal Title
Appl. Phys. Lett
Volume: 99
Related Report
Peer Reviewed
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[Presentation] プラズモニクスの応用展開2012
Author(s)
上野貢生
Organizer
平成23年度PWC第3回光テクノロジー応用懇談会
Place of Presentation
アルカディア千歳(北海道)(招待講演)
Year and Date
2012-02-29
Related Report
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[Patent(Industrial Property Rights)] 金属構造体2012
Inventor(s)
上野 貢生, 三澤 弘明, 坪井 泰之, サウリウス ヨードカジス, ビガンタス ミ ゼイキス, 笹木 敬司
Industrial Property Rights Holder
ローム株式会社
Industrial Property Rights Type
特許
Acquisition Date
2012-11-22
Related Report
Overseas
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