Formation of high flux X-ray nanobeam and its application to scanning X-ray fluorescence microscopy
| Project/Area Number |
23710128
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Nanomaterials/Nanobioscience
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| Research Institution | Osaka University |
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Principal Investigator |
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2012: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2011: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
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| Keywords | ナノ計測 / X 線顕微鏡 / X線ミラー / イオンビーム加工 / X線集光 / X線顕微鏡 / 細胞内元素分布 |
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| Research Abstract |
Toward formation of a high flux X-ray nanobeam, the basic techniques to fabricate X-ray focusing mirrors with high demagnification were researched. A simulator that can calculate an intensity profile based on the Fresnel- Kirchhoff integral was developed to investigate acceptable figure errors and alignment errors. Also, an ion beam figuring system specialized for fabricating X-ray mirrors was developed. As a result of a performance test for the system, an elliptical mirror with a 2 nm (peak-to-valley) figure error could be successfully fabricated.
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Report
(3 results)
Research Products
(43 results)
