Growth of free-standing two-dimensional atomic sheet by nano-plasma processing and its applications

• Project/Area Number: 23740405
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Multi-year Fund
• Research Field: Plasma science
• Research Institution: Tohoku University
• Principal Investigator: KATO Toshiaki 東北大学, 大学院・工学研究科, 助教 (20502082)
• Project Period (FY): 2011 – 2012
• Project Status: Completed (Fiscal Year 2012)
• Budget Amount: ¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000); Fiscal Year 2012: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000); Fiscal Year 2011: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
• Keywords: 単層カーボンナノウォール / 垂直配向 / グラフェン / プラズマCVD / キャリア移動度

Research Abstract

Direct growth of graphene on an insulating substrate is realized by rapid-heating plasma CVD (RH-PCVD), which is originally developed by our group. For the first time, integration of graphene nanoribbons, quasi-one-dimensional structure of graphene, is also realized using Ni nanobar as catalysts for their growth. It is also revealed that the graphene nanoribbon devices show very high transistor performance (on/off ratio > 10,000).

Research Products

• [Journal Article] Site- and Alignment-Controlled Growth of Graphene Nanoribbons from Nickel Nanobars (2012)
  • Author(s): T. Kato and R. Hatakeyama
  • Journal Title: Nature Nanotechnology Volume: Vol. 7, No. 10 Issue: 10 Pages: 651-656
  • DOI: 10.1038/nnano.2012.145
  • Peer Reviewed
• [Journal Article] Direct Growth of Doping-Density-Controlled Hexagonal Graphene on SiO2 Substrate by Rapid-Heating Plasma CVD (2012)
  • Author(s): T. Kato
  • Journal Title: ACS Nano Volume: 6 Issue: 10 Pages: 8508-8515
  • DOI: 10.1021/nn302290z
  • Peer Reviewed
• [Journal Article] Plasma-Synthesized Single-Walled Carbon Nanotubes and Their Applications (2011)
  • Author(s): R.Hatakeyama
  • Journal Title: Journal of Physics D : Applied Physics Volume: 44 Issue: 17 Pages: 174004-174004
  • DOI: 10.1088/0022-3727/44/17/174004
  • Peer Reviewed
• [Presentation] Direct Growth and Integration of Graphene Nanoribbon (2013)
  • Author(s): T. Kato, R. Hatakeyama, and T. Kaneko
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: 神奈川県
  • Year and Date: 2013-03-28
• [Presentation] Integration of High Performance Graphene Nanoribbon Field Effect Transistors (2013)
  • Author(s): T. Kato, R. Hatakeyama, and T. Kaneko
  • Organizer: The 44th Fullerenes-Nanotubes-Graphene General Symposium
  • Place of Presentation: Tokyo
  • Year and Date: 2013-03-13
• [Presentation] Synthesis of Nanocarbon-Nanoparticle Conjugate Using Gas-Liquid Interfacial Non-Equilibrium Plasmas (2013)
  • Author(s): T. Kaneko, S. Takahashi, and T. Kato
  • Organizer: 1st International Workshop on Solution Plasma and Molecular Technologies
  • Place of Presentation: Tokyo
  • Year and Date: 2013-03-06
• [Presentation] Growth and Functionalization of Graphene and Graphene Nanoribbon by Advanced Plasma Technology (2013)
  • Author(s): T. Kato, R. Hatakeyama, and T. Kaneko
  • Organizer: 2013Workshop on Plasma & Nano Technology
  • Place of Presentation: Chuncheon, Korea
  • Year and Date: 2013-01-29
• [Presentation] Structure-Controlled Synthesis of Fullerenes and Carbon Nanotubes Using Plasma Technology (2013)
  • Author(s): R. Hatakeyama, T. Kato, and T. Kaneko
  • Organizer: 2013Workshop on Plasma & Nano Technology
  • Place of Presentation: Chuncheon, Korea
  • Year and Date: 2013-01-28
• [Presentation] Structure-Controlled Synthesis of Fullerenes and Carbon Nanotubes Using Plasma Technology (2013)
  • Author(s): R. Hatakeyama
  • Organizer: 2013 Workshop on Plasma & Nano Technology
  • Place of Presentation: Chuncheon (Korea)
  • Invited
• [Presentation] Growth and Functionalization of Graphene and Graphene Nanoribbon by Advanced Plasma Technology (2013)
  • Author(s): T. Kato
  • Organizer: 2013 Workshop on Plasma & Nano Technology
  • Place of Presentation: Chuncheon (Korea)
  • Invited
• [Presentation] Integration of high performance graphene nanoribbon field effect transistors (2013)
  • Author(s): T. Kato
  • Organizer: The 44th Fullerenes-Nanotubes-Graphene General Symposium
  • Place of Presentation: Tokyo
• [Presentation] Direct growth and integration of graphene nanoribbon (2013)
  • Author(s): T. Kato
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: Kanagawa
• [Presentation] Growth and Integration of Graphene Nanoribbon by Rapid-Heating Plasma Chemical Vapor Deposition (2012)
  • Author(s): T. Kato, T. Kaneko, and R. Hatakeyama
  • Organizer: The Second International Conference on Small Science (ICSS 2012)
  • Place of Presentation: Orlando, USA
  • Year and Date: 2012-12-17
• [Presentation] Controllable Growth of Graphene Nanoribbon by Advanced Plasma Chemical Vapor Deposition (2012)
  • Author(s): T. Kato, T. Kaneko, and R. Hatakeyama
  • Organizer: 2nd International Conference on Nanotek and Expo
  • Place of Presentation: Philadelphia, USA
  • Year and Date: 2012-12-03
• [Presentation] Controllable Graphene Growth Using Novel Plasma Catalytic Deposition (2012)
  • Author(s): T. Kato and R. Hatakeyama
  • Organizer: 34th International Symposium on Dry Process (DPS2012)
  • Place of Presentation: 東京都
  • Year and Date: 2012-11-16
• [Presentation] Advanced Plasma CVD for Structural-Controlled Growth of Single-Walled Carbon Nanotube and Graphene (2012)
  • Author(s): T. Kato and R. Hatakeyama
  • Organizer: IUMRS-International Conference on Electronic Materials (IUMRS-ICEM 2012)
  • Place of Presentation: 神奈川県
  • Year and Date: 2012-09-25
• [Presentation] Direct Growth of Hexagonal Domain Graphene on SiO_2 Substrate (2012)
  • Author(s): T. Kato, R. Hatakeyama, and T. Kaneko
  • Organizer: 第43回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: 宮城県
  • Year and Date: 2012-09-07
• [Presentation] Direct Growth of High-Quality Mono-Layer Graphene on Insulating Substrate by Advanced Plasma CVD (2012)
  • Author(s): T. Kato and R. Hatakeyama
  • Organizer: IEEE Nano2012
  • Place of Presentation: Birmingham, UK
  • Year and Date: 2012-08-20
• [Presentation] UniformSingle-Layer Graphene Growth on SiO2Substrate by Diffusion Plasma CVD and itsGrowth Mechanism (2012)
  • Author(s): T. Kato and R. Hatakeyama
  • Organizer: Thirteenth International Conference on the Science and Application of Nanotubes (NT12)
  • Place of Presentation: Brisbane, Australia
  • Year and Date: 2012-06-27
• [Presentation] 拡散プラズマプロセスによる単層カーボンナノチューブ及びグラフェンの構造制御合成と機能化 (2012)
  • Author(s): 加藤俊顕,畠山力三
  • Organizer: 第59回応用物理学関連連合講演会
  • Place of Presentation: 東京都
  • Year and Date: 2012-03-15
• [Presentation] シリコン酸化膜上へのグラフェン直接合成と成長機構 (2012)
  • Author(s): 加藤俊顕,畠山力三
  • Organizer: 第59回応用物理学関連連合講演会
  • Place of Presentation: 東京都
  • Year and Date: 2012-03-15
• [Presentation] Direct Fabrication of High-Quality Single-Layer Graphene on SiO2 Substrate by Diffusion Plasma CVD (2012)
  • Author(s): T. Kato and R. Hatakeyama
  • Organizer: 第42回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: 東京都
  • Year and Date: 2012-03-06
• [Presentation] Advanced Plasma CVD for Structural-Controlled Growth of Single-Walled Carbon Nanotube and Graphene (2012)
  • Author(s): T. Kato
  • Organizer: IUMRS-International Conference on Electronic Materials (IUMRS-ICEM 2012)
  • Place of Presentation: Yokohama
  • Invited
• [Presentation] Controllable Graphene Growth Using Novel Plasma Catalytic Deposition (2012)
  • Author(s): T. Kato
  • Organizer: 34rd International Symposium on Dry Process (DPS2012)
  • Place of Presentation: Tokyo
  • Invited
• [Presentation] Controllable Growth of Graphene Nanoribbon by Advanced Plasma Chemical Vapor Deposition (2012)
  • Author(s): T. Kato
  • Organizer: 2nd International Conference on Nanotek and Expo
  • Place of Presentation: Philadelphia (USA)
  • Invited
• [Presentation] Growth and Integration of Graphene Nanoribbon by Rapid-Heating Plasma Chemical Vapor Deposition (2012)
  • Author(s): T. Kato
  • Organizer: The Second International Conference on Small Science (ICSS 2012)
  • Place of Presentation: Orlando (USA)
  • Invited
• [Presentation] Fabrication and Functionalization of Graphene by Advanced Plasma (2012)
  • Author(s): T. Kato
  • Organizer: CNTNE 2012 (International Symposium on Carbon Nanotube Nanoelectronics)
  • Place of Presentation: Nagoya
• [Presentation] Uniform single-layer graphene growth on SiO2 substrate by diffusion plasma CVD and its growth mechanism (2012)
  • Author(s): T. Kato
  • Organizer: Thirteenth International Conference on the Science and Application of Nanotubes (NT12)
  • Place of Presentation: Brisbane (Australia)
• [Presentation] Transport type control of single-walled carbon nanotubes thin film transistor by controllable nitrogen and fluorine doping (2012)
  • Author(s): T. Kato
  • Organizer: Thirteenth International Conference on the Science and Application of Nanotubes (NT12)
  • Place of Presentation: Brisbane (Australia)
• [Presentation] Direct growth of high-quality mono-layer graphene on insulating substrate by advanced plasma CVD (2012)
  • Author(s): T. Kato
  • Organizer: IEEE Nano2012
  • Place of Presentation: Birmingham (UK)
• [Presentation] Fabrication of Nitrogen Substituted Single-Walled Carbon Nanotubes by Diffusion Plasma Reaction and Their Elctrical Transport Properties (2012)
  • Author(s): T. Kato
  • Organizer: The 43th Fullerenes-Nanotubes-Graphene General Symposium
  • Place of Presentation: Sendai
• [Presentation] Direct Growth of Hexagonal Domain Graphene on SiO2 Substrate (2012)
  • Author(s): T. Kato
  • Organizer: The 43th Fullerenes-Nanotubes-Graphene General Symposium
  • Place of Presentation: Sendai
• [Presentation] カーボンナノチューブのプラズマプロセス (2012)
  • Author(s): 畠山力三
  • Organizer: プラズマ・核融合学会 第24回専門講習会「ナノテク時代のプラズマ技術」
  • Place of Presentation: 京都
• [Presentation] Non-Equilibrium Plasmas Ranging from Physics to Nanobio Science (2012)
  • Author(s): R. Hatakeyama
  • Organizer: International Symposium for 25th Anniversary of H-mode Bifurcation Theory(招待講演)
  • Place of Presentation: Fukuoka
• [Presentation] Plasma Processing Challenge to High Performance Graphene Transistor Fabrication (2012)
  • Author(s): R. Hatakeyama
  • Organizer: Third International Symposium on Plasma Nanoscience(招待講演)
  • Place of Presentation: Johor (Malaysia and Singapore)
• [Presentation] Direct Fabrication of High-Quality Single-Layer Graphene on SiO2 Substrate by Diffusion Plasma CVD (2012)
  • Author(s): T. Kato
  • Organizer: 第42回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: Tokyo
• [Presentation] Property Control of Single-Walled Carbon Nanotubes Field Effect Transistor by Nitrogen and Fluorine Doping Using Plasma CVD (2012)
  • Author(s): M. Akutsu
  • Organizer: 第42回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: Tokyo
• [Presentation] Structure Control of Hybrid Nanocarbon Materials based on Carbon Nanotubes and Carbon Nanowalls (2012)
  • Author(s): T. Sato
  • Organizer: 第42回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: Tokyo
• [Presentation] Hydrogen Effects on Chirality Distribution of Single-Walled Carbon Nanotube Grown from Various Kinds of Catalysts (2012)
  • Author(s): K. Murakoshi
  • Organizer: 第42回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: Tokyo
• [Presentation] 拡散プラズマプロセスによる単層カーボンナノチューブ及びグラフェンの構造制御合成と機能化 (2012)
  • Author(s): 加藤俊顕
  • Organizer: 第59回応用物理学関連連合講演会
  • Place of Presentation: 東京
• [Presentation] シリコン酸化膜上へのグラフェン直接合成と成長機構 (2012)
  • Author(s): 加藤俊顕
  • Organizer: 第59回応用物理学関連連合講演会
  • Place of Presentation: 東京
• [Presentation] プラズマCVD成長単層カーボンナノチューブのカイラリティ分布に対する水素ラジカルの効果 (2012)
  • Author(s): 村越幸史
  • Organizer: 第59回応用物理学関連連合講演会
  • Place of Presentation: 東京
• [Presentation] Growth and Functionalization of High-Quality Graphene by Diffusion Plasma Processing (2011)
  • Author(s): T. Kato and R. Hatakeyama
  • Organizer: 第21回日本MRS学術シンポジウム
  • Place of Presentation: 神奈川県
  • Year and Date: 2011-12-19
• [Presentation] プラズマCVDによるグラフェン合成と構造制御 (2011)
  • Author(s): 加藤俊顕,畠山力三
  • Organizer: Plasma Conference2011(プラズマ・核融合学会第28回年会/応用物理学会第29回プラズマプロセシング研究会/日本物理学会(領域2)2011年秋季大会)
  • Place of Presentation: 石川県
  • Year and Date: 2011-11-22
• [Presentation] Effects of Room Temperature Plasma Treatment on the Selective Edge Functionalization of Graphene Nano Ribbon (2011)
  • Author(s): T. Kato, L. Jiao, X. Wang, H. Wang, X. Li, L. Zhang, R. Hatakeyama, and H. Dai
  • Organizer: 第41回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: 東京都
  • Year and Date: 2011-09-05
• [Presentation] アンモニアプラズマによる室温グラフェンエッジ修飾及びドーピング (2011)
  • Author(s): T. Kato, L. Jiao, X. Wang, H. Wang, X. Li, R. Hatakeyama, and H. Dai
  • Organizer: 平成23年秋季第72回応用物理学会学術講演会
  • Place of Presentation: 山形県
  • Year and Date: 2011-08-29
• [Presentation] プラズマCVD中グラフェン合成におけるプラズマ効果 (2011)
  • Author(s): 加藤俊顕,森川昌登,畠山力三
  • Organizer: 平成23年秋季第72回応用物理学会学術講演会
  • Place of Presentation: 山形県
  • Year and Date: 2011-08-29
• [Presentation] Selective Edge Functionalization of Graphene by Room Temperature Mild Plasma Treatment (2011)
  • Author(s): T. Kato, L. Jiao, X. Wang, H. Wang, X. Li, L. Zhang, R. Hatakeyama, and H. Dai
  • Organizer: 12th International Conference on the Science and Application of Nanotubes
  • Place of Presentation: Cambridge, UK
  • Year and Date: 2011-07-10
• [Presentation] Narrow Diameter, Chirality, and Length Distribution Single-Walled Carbon Nanotubes Growth by Time-Programmed Plasma CVD (2011)
  • Author(s): T. Kato
  • Organizer: International Conference on New Diamond and Nano Carbons 2011
  • Place of Presentation: Matsue
• [Presentation] Selective Edge Functionalization of Graphene by Room Temperature Mild Plasma Treatment (2011)
  • Author(s): T. Kato
  • Organizer: 12th International Conference on the Science and Application of Nanotubes
  • Place of Presentation: Cambridge (UK)
• [Presentation] Growth Kinetics of Narrow-Chirality and -Length Distributed Single-Walled Carbon Nanotubes by Time-Programmed Plasma CVD (2011)
  • Author(s): T. Kato
  • Organizer: 12th International Conference on the Science and Application of Nanotubes
  • Place of Presentation: Cambridge (UK)
• [Presentation] Narrow-Chirality Distributed Growth of Single-Walled Carbon Nanotubes from Nonmagnetic Catalyst by Diffusion Plasma CVD (2011)
  • Author(s): K. Murakoshi
  • Organizer: 12th International Conference on the Science and Application of Nanotubes
  • Place of Presentation: Cambridge (UK)
• [Presentation] Chirality Distribution Control of Single-Walled Carbon Nanotubes by Gold-Catalyzed Plasma CVD (2011)
  • Author(s): K. Murakoshi
  • Organizer: 平成23年度電気関係学会東北支部連合大会
  • Place of Presentation: 多賀城
• [Presentation] プラズマCVD中グラフェン合成におけるプラズマ効果 (2011)
  • Author(s): 加藤 俊顕
  • Organizer: 平成23年秋季第72回応用物理学会学術講演会
  • Place of Presentation: 山形
• [Presentation] アンモニアプラズマによる室温グラフェンエッジ修飾及びドーピング (2011)
  • Author(s): 加藤 俊顕
  • Organizer: 平成23年秋季第72回応用物理学会学術講演会
  • Place of Presentation: 山形
• [Presentation] 拡散プラズマCVDにより合成した窒素ドーピング単層カーボンナノチューブを用いた薄膜トランジスタの電気特性 (2011)
  • Author(s): 安久津 誠
  • Organizer: 平成23年秋季第72回応用物理学会学術講演会
  • Place of Presentation: 山形
• [Presentation] 弱磁場ヘリコンプラズマCVDによるカーボンナノチューブへのカーボンナノウォール修飾 (2011)
  • Author(s): 佐藤 拓矢
  • Organizer: 平成23年秋季第72回応用物理学会学術講演会
  • Place of Presentation: 山形
• [Presentation] Effects of Room Temperature Plasma Treatment on the Selective Edge Functionalization of Graphene Nano Ribbon (2011)
  • Author(s): T. Kato
  • Organizer: 第41回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: 八王子
• [Presentation] Hybrid Nanomaterials of Carbon Nanowalls and Single-Walled Carbon Nanotubes Fabricated by Helicon Plasma CVD (2011)
  • Author(s): T. Sato
  • Organizer: 第41回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: 八王子
• [Presentation] Effects of Catalysts Types on the Narrow-Chirality Distributed Single-Walled Carbon Nanotube Growth by Plasma CVD (2011)
  • Author(s): K. Murakoshi
  • Organizer: 第41回フラーレン・ナノチューブ・グラフェン総合シンポジウム
  • Place of Presentation: 八王子
• [Presentation] Nanobio Plasma Processes in Solid-Gas-Liquid Interfacial Layers (2011)
  • Author(s): R. Hatakeyama
  • Organizer: 2011 Northeastern Asia Symposium on Plasma Fusion(招待講演)
  • Place of Presentation: Daejon (Korea)
• [Presentation] 金触媒を用いたプラズマCVDによる単層カーボンナノチューブのカイラリティ分布制御合成 (2011)
  • Author(s): 村越幸史
  • Organizer: 応用物理学会プラズマエレクトロニクス分科会20周年（研究会創設25周年）記念特別シンポジウム
  • Place of Presentation: 名古屋
• [Presentation] Synthesis and Device Application of Nitrogen-Doped Single-Walled Carbon Nanotubes by Plasma CVD (2011)
  • Author(s): M. Akutsu
  • Organizer: 24th International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Kyoto
• [Presentation] プラズマ応用ナノカーボン新機能化研究の最前線 (2011)
  • Author(s): R. Hatakeyama
  • Organizer: 第27回九州・山口プラズマ研究会(招待講演)
  • Place of Presentation: 柳川
• [Presentation] プラズマCVDによるグラフェン合成と構造制御 (2011)
  • Author(s): 加藤俊顕
  • Organizer: Plasma Conference 2011
  • Place of Presentation: 金沢
• [Presentation] 非磁性触媒利用拡散プラズマCVDによる単層カーボンナノチューブの構造制御合成 (2011)
  • Author(s): 村越幸史
  • Organizer: Plasma Conference 2011
  • Place of Presentation: 金沢
• [Presentation] Plasma-Structured and -Functionalized Nanocarbon Materials and Devices (2011)
  • Author(s): R. Hatakeyama
  • Organizer: The 7th International Conference on Advanced Materials and Devices(招待講演)
  • Place of Presentation: Jeju (Korea)
• [Presentation] Glowth and Functionalization of High-Quality Graphene by Diffusion Plasma Processing (2011)
  • Author(s): T. Kato
  • Organizer: 21st Academic Symposium of MRS-Japan 2011(招待講演)
  • Place of Presentation: Yokohama
• [Book] "Recent Progress of Plasma CVD for Structure Controlled Growth of Single-Walled Carbon Nanotubes" 「Recent Progress in Carbon Nanotube Research」 (2013)
  • Author(s): T. Kato and R. Hatakeyama
  • Publisher: InTech (edited by Satoru Suzuki)
• [Book] "Fabrication of Stable N-Type Thin-Film Transistor with Cs Encapsulated Single-Walled Carbon Nanotubes",「Nanoelectronic Device Applications Handbook」 (2013)
  • Author(s): T. Kato, R. Hatakeyama, and Y. Osanai
  • Publisher: CRC Press (Taylor & Francis Group)edited by J. E. Morris & K. Iniewski
• [Book] Recent Progress of Plasma CVD for Structure Controlled Growth of Single-Walled Carbon Nanotubes (2013)
  • Author(s): T. Kato
  • Publisher: InTech
• [Book] Fabrication of stable n-type thin-film transistor with Cs encapsulated single-walled carbon nanotubes (2013)
  • Author(s): T. Kato
  • Publisher: CRC Press (Taylor & Francis Group)
• [Book] "Structure Control of Single-Walled Carbon Nanotubes by Plasma CVD", 「Plasma Processing of Nanomaterials」 (2011)
  • Author(s): R. Hatakeyama and T. Kato
  • Publisher: CRC Press, Taylor & Francis Group(edited by R. M. Sankaran)
• [Book] カーボンナノチューブ・グラフェンハンドブック (2011)
  • Author(s): 畠山 力三
  • Total Pages: 28
  • Publisher: コロナ社
• [Book] Plasma Processing of Nanomaterials (2011)
  • Author(s): R. Hatakeyama
  • Total Pages: 219
  • Publisher: CRC Press
• [Remarks]
  • URL: http://www.plasma.ecei.tohoku.ac.jp
• [Patent(Industrial Property Rights)] グラフェン構造体及びそれを用いた半導体装置並びにそれらの製造方法 (2012)
  • Inventor(s): 畠山力三, 加藤俊顕
  • Industrial Property Rights Holder: 畠山力三, 加藤俊顕
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 2011-264157
  • Filing Date: 2012-12-28
• [Patent(Industrial Property Rights)] グラフェン構造体及びそれを用いた半導体装置並びにそれらの製造方法 (2011)
  • Inventor(s): 畠山力三,加藤俊顕
  • Industrial Property Rights Holder: 畠山力三,加藤俊顕
  • Industrial Property Number: 2011-264157
  • Filing Date: 2011-12-01
• [Patent(Industrial Property Rights)] 単層カーボンナノチューブの製造方法 (2011)
  • Inventor(s): 畠山力三,加藤俊顕
  • Industrial Property Rights Holder: 畠山力三,加藤俊顕
  • Industrial Property Number: 2011-225534
  • Filing Date: 2011-10-13
• [Patent(Industrial Property Rights)] 単層カーボンナノチューブの製造方法 (2011)
  • Inventor(s): 畠山 力三
  • Industrial Property Rights Holder: 東北大学
  • Industrial Property Number: 2011-225534
  • Filing Date: 2011
• [Patent(Industrial Property Rights)] グラフェン構造体及びそれを用いた半導体装置並びにそれらの製造方法 (2011)
  • Inventor(s): 畠山 力三
  • Industrial Property Rights Holder: 東北大学
  • Industrial Property Number: 2011-264157
  • Filing Date: 2011