Preferential sputtering of polymer surface using Ar cluster ion beam
| Project/Area Number |
23760037
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | University of Hyogo |
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Principal Investigator |
MORITANI Kousuke 兵庫県立大学, 大学院・工学研究科, 准教授 (20391279)
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2012: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2011: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
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| Keywords | ビーム応用 / 表面分析 / イオンビーム / クラスター / 質量分析 / 表面界面 / SIMS / クラスターイオンビーム |
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| Research Abstract |
In this study, we measured SIMS spectra of organic thin film and a contaminated substrate sample using gas cluster ion projectiles, and then analyzed the data using the self-modeling curve resolution method (SMCR). As a result, we could classify many secondary ion peaks into 3 or 4 species.As a result, the many secondary ion peaks from the contaminant and sample is classified into the components from methacrylic acid, that from acrylic acid and that from silane coupling agents. And alsowe have finished the development of the XPS apparatus in the lab. In the next step, we will study the mechanism of GCIB sputtering processes using the SIMS and XPS.
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Report
(3 results)
Research Products
(20 results)
