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Fabrication of transparence micro-mold using thermal oxidation for nano-imprint

Research Project

Project/Area Number 23760119
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeMulti-year Fund
Research Field Production engineering/Processing studies
Research InstitutionNagoya University (2012)
University of Hyogo (2011)

Principal Investigator

NODA Daiji  名古屋大学, 工学研究科, 招へい教員 (00378267)

Project Period (FY) 2011 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Keywordsナノインプリント / 透明金型 / 熱酸化 / 光インプリント / 超微細構造 / 高アスペクト比加工 / マイクロマシン / MEMS
Research Abstract

Recently, X-ray phase imaging with X-ray gratings has been studied. I propose the new low cost fabrication process using Si mold using ICP-RIE and nano-imprint techniques. After thermal oxidation, Si micro-mold patterns were obtained until the bottom of high aspect ratio silicon dioxide microstructures. And, I tried the resin forming using fabricated Si mold. In these results, I obtained good grating patterns with submicron width. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold.

Report

(3 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Research-status Report
  • Research Products

    (21 results)

All 2012 2011

All Journal Article (1 results) (of which Peer Reviewed: 1 results) Presentation (20 results)

  • [Journal Article] Fabrication of Si Mold Using ICP Etching for X-ray Diffraction Grating2012

    • Author(s)
      Daiji Noda, Atsushi Tokuoka and Tadashi Hattori
    • Journal Title

      Key Engineering Materials

      Volume: Vols. 523-524 Pages: 587-591

    • DOI

      10.4028/www.scientific.net/kem.523-524.587

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Presentation] Fabrication of Si Mold Using ICP Etching for X-ray Diffraction Grating2012

    • Author(s)
      Daiji Noda, Atsushi Tokuoka and Tadashi Hattori
    • Organizer
      14thInternational conference on Precision Engineering (ICPE 2012)
    • Place of Presentation
      Awaji Yumebutai International Conference Center
    • Year and Date
      2012-11-08
    • Related Report
      2012 Final Research Report
  • [Presentation] ICP エッチングによる狭周期シリコン金型の作製2012

    • Author(s)
      野田大二,徳岡篤,服部正
    • Organizer
      日本機械学会年次大会
    • Place of Presentation
      金沢大学
    • Year and Date
      2012-09-12
    • Related Report
      2012 Final Research Report
  • [Presentation] X 線タルボ干渉計用大面積 X 線格子の作製2012

    • Author(s)
      野田大二,徳岡篤,香取めぐみ,南山康人,山下健治,西田諭史,服部正
    • Organizer
      先端技術セミナー2012
    • Place of Presentation
      イーグレ姫路あいめっせホール
    • Year and Date
      2012-04-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Si ドライエッチングによる X 線格子の作製2012

    • Author(s)
      野田大二,徳岡篤,服部正
    • Organizer
      先端技術セミナー2012
    • Place of Presentation
      イーグレ姫路あいめっせホール
    • Year and Date
      2012-04-27
    • Related Report
      2012 Final Research Report
  • [Presentation] ICP エッチングによる狭周期格子パターンの作製2012

    • Author(s)
      野田大二,徳岡篤,服部正
    • Organizer
      日本機械学会第12回機素潤滑設計部門講演会
    • Place of Presentation
      愛媛県県民文化会館
    • Year and Date
      2012-04-24
    • Related Report
      2012 Final Research Report
  • [Presentation] Siドライエッチングを用いたタルボ干渉計用回折格子の作製2012

    • Author(s)
      徳岡篤,矢代航,野田大二,服部正
    • Organizer
      平成 24 年電気学会全国大会
    • Place of Presentation
      広島工業大学
    • Year and Date
      2012-03-21
    • Related Report
      2012 Final Research Report
  • [Presentation] Fabrication of High Aspect Ratio X-ray Grating Using Silicon Dry Etching Method2012

    • Author(s)
      Daiji Noda, Atsushi Tokuoka and Tadashi Hattori
    • Organizer
      International Workshop on X-ray and Neutron Phase Imaging with Gratings (XNPIG)
    • Place of Presentation
      National Museum of Emerging Science and Innovation
    • Year and Date
      2012-03-05
    • Related Report
      2012 Final Research Report
  • [Presentation] Fabrication of Si Mold Using ICP Etching for X-ray Diffraction Grating2012

    • Author(s)
      Daiji Noda
    • Organizer
      14th International conference on Precision Engineering
    • Place of Presentation
      Awaji Yumebutai International Conference Center
    • Related Report
      2012 Annual Research Report
  • [Presentation] ICPエッチングによる狭周期格子パターンの作製2012

    • Author(s)
      野田大二
    • Organizer
      日本機械学会 第12回機素潤滑設計部門講演会
    • Place of Presentation
      愛媛県県民文化会館
    • Related Report
      2012 Annual Research Report
  • [Presentation] X線タルボ干渉計用大面積X線格子の作製2012

    • Author(s)
      野田大二
    • Organizer
      先端技術セミナー2012
    • Place of Presentation
      イーグレ姫路あいめっせホール
    • Related Report
      2012 Annual Research Report
  • [Presentation] SiドライエッチングによるX線格子の作製2012

    • Author(s)
      野田大二
    • Organizer
      先端技術セミナー2012
    • Place of Presentation
      イーグレ姫路あいめっせホール
    • Related Report
      2012 Annual Research Report
  • [Presentation] ICPエッチングによる狭周期シリコン金型の作製2012

    • Author(s)
      野田大二
    • Organizer
      日本機械学会年次大会
    • Place of Presentation
      金沢大学
    • Related Report
      2012 Annual Research Report
  • [Presentation] Fabrication of High Aspect Ratio X-ray Grating Using Silicon Dry Etching Method2012

    • Author(s)
      Daiji Noda, Atsushi Tokuoka and Tadashi Hattori
    • Organizer
      International Workshop on X-ray and Neutron Phase Imaging with Gratings
    • Place of Presentation
      日本科学未来館(東京都)
    • Related Report
      2011 Research-status Report
  • [Presentation] Siドライエッチングを用いたタルボ干渉計用回折格子の作製2012

    • Author(s)
      徳岡篤,矢代航,野田大二,服部正
    • Organizer
      平成24年電気学会全国大会
    • Place of Presentation
      広島工業大学(広島県)
    • Related Report
      2011 Research-status Report
  • [Presentation] 熱酸化による透明ナノインプリント用金型の作製2011

    • Author(s)
      野田大二,徳岡篤,服部正
    • Organizer
      第28回「センサ・マイクロマシンと応用システム」シンポジウム
    • Place of Presentation
      タワーホール船掘
    • Year and Date
      2011-09-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Si 構造体への直接めっきによる高アスペクト比金属構造体の作製2011

    • Author(s)
      徳岡篤,野田大二,服部正
    • Organizer
      精密工学会 2011 年度関西地方定期学術講演会
    • Place of Presentation
      兵庫県立大学
    • Year and Date
      2011-06-30
    • Related Report
      2012 Final Research Report
  • [Presentation] Fabrication of high aspect ratio Au microstructure using direct electroplating on Si microstructure2011

    • Author(s)
      Atsushi Tokuoka, Daiji Noda and Tadashi Hattori
    • Organizer
      9th International Workshop on High-Aspect-Ratio Micro-Structure Technology
    • Place of Presentation
      Ambassador Hotel Hsinchu, Taiwan
    • Year and Date
      2011-06-14
    • Related Report
      2012 Final Research Report
  • [Presentation] Fabrication of high aspect ratio Au microstructure using direct electroplating on Si microstructure2011

    • Author(s)
      Atsushi Tokuoka, Daiji Noda and Tadashi Hattori
    • Organizer
      9th International Workshop on High-Aspect-Ratio Micro-Structure Technology
    • Place of Presentation
      Ambassador Hotel Hsinchu, Hsinchu, Taiwan
    • Related Report
      2011 Research-status Report
  • [Presentation] Si構造体への直接めっきによる高アスペクト比金属構造体の作製2011

    • Author(s)
      徳岡篤,野田大二,服部正
    • Organizer
      精密工学会2011年度関西地方定期学術講演会
    • Place of Presentation
      兵庫県立大学(兵庫県)
    • Related Report
      2011 Research-status Report
  • [Presentation] 熱酸化による透明ナノインプリント用金型の作製2011

    • Author(s)
      徳岡篤,野田大二,服部正
    • Organizer
      第28回「センサ・マイクロマシンと応用システム」シンポジウム
    • Place of Presentation
      タワーホール船掘(東京都)
    • Related Report
      2011 Research-status Report

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Published: 2011-08-05   Modified: 2019-07-29  

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