| Project/Area Number |
23760119
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Nagoya University (2012)
University of Hyogo (2011) |
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Principal Investigator |
NODA Daiji 名古屋大学, 工学研究科, 招へい教員 (00378267)
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
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| Keywords | ナノインプリント / 透明金型 / 熱酸化 / 光インプリント / 超微細構造 / 高アスペクト比加工 / マイクロマシン / MEMS |
|---|
| Research Abstract |
Recently, X-ray phase imaging with X-ray gratings has been studied. I propose the new low cost fabrication process using Si mold using ICP-RIE and nano-imprint techniques. After thermal oxidation, Si micro-mold patterns were obtained until the bottom of high aspect ratio silicon dioxide microstructures. And, I tried the resin forming using fabricated Si mold. In these results, I obtained good grating patterns with submicron width. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold.
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