| Project/Area Number |
23760130
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Design engineering/Machine functional elements/Tribology
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
AOKI Saiko 東京工業大学, 大学院・理工学研究科, 助教 (30463053)
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥3,510,000 (Direct Cost: ¥2,700,000、Indirect Cost: ¥810,000)
Fiscal Year 2012: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2011: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
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| Keywords | トライボロジー / 境界潤滑 / 吸着膜 / 表面形状 / 有機高分子 / 摩擦低減 / 高分子化合物 / 直交粗さ / 多点吸着 / 摩擦低減効果 / 官能基 / 誘電緩和 |
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| Research Abstract |
The present study is aimed at construction of friction-reducing mechanism by combining a multiple-point adsorbed film of an organic polymer and the micro-EHL effect caused by surface roughness. Polymethacrylate was adopted as a multiple-point adsorptive organic polymer in this study. Two types of friction measurements were conducted; the first was a cylinder-on-disk tribometer under a varying sliding speed at constant load and temperature, and the other was a 3 ball-on-disk tribometer under an elevated temperature at constant load and speed. Experimental results indicated that the polymers showed friction-reducing effect due to multiple-point adsorption with a number of the functional groups, and thus the most appropriate structure of the polymer was suggested to exert the friction-reducing effect. In addition, anisotropic surface roughness was introduced to the friction measurement using the cylinder-on-disk tribometer for clarifying the friction-reducing effect of the multiple-point adsorbed film from the polymer at transverse direction. The results implied that the friction-reducing effect could be explained not only by the micro-EHL effect caused at transverse direction of the anisotropic roughness but also by some other load-bearing effect, which depends on the formation state of the adsorbed film.
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